Patents by Inventor Richard P. Chartoff

Richard P. Chartoff has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6423260
    Abstract: A method and apparatus for producing ordered parts by from non-ordered liquid crystal monomers. Liquid crystal monomers contain stiff, rod-like mesogenic segments which can be aligned by an external force such as shear, electric field or magnetic field, causing an anisotropy in properties. When cured in the aligned stated by photopolymerizing the aligned monomers the anisotropic structure is “locked in” resulting in materials with anisotropic physical and mechanical properties. The rigid structure of the mesogenic segments can result in cured networks with high glass transition temperatures if the spacer groups which connect the mesogenic core with the reactive end groups are kept short. Glass transition temperatures of postcured parts ranged from 75 to 148° C. depending on resin and processing conditions. A mechanical anisotropy on the order of two was measured for aligned samples.
    Type: Grant
    Filed: March 21, 2000
    Date of Patent: July 23, 2002
    Assignee: University of Dayton
    Inventors: Richard P. Chartoff, John W. Schultz, Jill S. Ullett
  • Patent number: 6380340
    Abstract: Rigid-rod monomers and polymers are provided for use in applications such as rapid prototyping, composites and adhesives. The monomers can be photocured through the end groups and then thermally post cured through the acetylene groups. The result is a highly crosslinked polymer having an effective glass transition temperature well above 200° C.
    Type: Grant
    Filed: October 16, 2000
    Date of Patent: April 30, 2002
    Assignee: University of Dayton
    Inventors: Richard P. Chartoff, Jayprakash C. Bhatt, Tat H. Tong
  • Patent number: 6369262
    Abstract: Rigid-rod monomers and polymers are provided for use in applications such as rapid prototyping, composites and adhesives. The monomers can be photocured through the end groups and then thermally post cured through the acetylene groups. The result is a highly crosslinked polymer having an effective glass transition temperature well above 200° C.
    Type: Grant
    Filed: March 10, 1999
    Date of Patent: April 9, 2002
    Assignee: University of Dayton
    Inventors: Richard P. Chartoff, Jayprakash C. Bhatt, Tat H. Tong
  • Patent number: 6117385
    Abstract: A method and apparatus for producing ordered parts by stereolithography from non-ordered liquid crystal monomers. Liquid crystal monomers contain stiff, rod-like mesogenic segments which can be aligned by an external force such as shear, electric field or magnetic field, causing an anisotropy in properties. When cured in the aligned stated by photopolymerizing the aligned monomers the anisotropic structure is "locked in" resulting in materials with anisotropic physical and mechanical properties. The rigid structure of the mesogenic segments can result in cured networks with high glass transition temperatures if the spacer groups which connect the mesogenic core with the reactive end groups are kept short. Glass transition temperatures of postcured parts ranged from 75 to 148.degree. C. depending on resin and processing conditions. A mechanical anisotropy on the order of two was measured for aligned samples.
    Type: Grant
    Filed: August 3, 1998
    Date of Patent: September 12, 2000
    Assignee: The University of Dayton
    Inventors: Richard P. Chartoff, John W. Schultz, Jill S. Ullett
  • Patent number: 4916202
    Abstract: The present invention provides an epoxy resin of the formula ##STR1## where A is selected from the group consisting of --C(CH.sub.3).sub.2 --, --C(CF.sub.3).sub.2 --, --S--, --SO.sub.2 --, --CH.sub.2 --, --CO--, --O--, and --C.sub.3 H.sub.6 --, and each B.sub.1, B.sub.2, B.sub.3, and B.sub.4 is independently selected from the group consisting of --H, --F, --Cl, --Br, --I, --CH.sub.2 CH.dbd.CH.sub.2, --CH.sub.3, --C.sub.2 H.sub.5, --C.sub.3 H.sub.7, and --C.sub.4 H.sub.9.The present invention also provides a curable composition comprising an epoxy resin of the foregoing formula (I) and an effective curing amount of a hardener for an epoxy resin. The moisture sensitivity of the cured castings and/or composites based on the epoxy resins is lower than known epoxy resin castings and/or composites that have comparable thermal stability, modulus, strength, processability, and toughness.
    Type: Grant
    Filed: September 17, 1987
    Date of Patent: April 10, 1990
    Assignee: University of Dayton
    Inventors: John M. Butler, Richard P. Chartoff, James A. Harvey
  • Patent number: 4904801
    Abstract: The present invention provides a process for producing aromatic ether bismaleimides of the Formula (II) ##STR1## wherein A is a divalent mononuclear or polynuclear aromatic linking group. The process provides good yields and can be scaled up readily to commerical size runs.The present invention also provides compositions containing at least about 80 weight % of the bismaleimide of Formula (II) above.
    Type: Grant
    Filed: December 8, 1988
    Date of Patent: February 27, 1990
    Assignee: University of Dayton
    Inventors: John M. Butler, Richard P. Chartoff, James A. Harvey
  • Patent number: 4855450
    Abstract: The present invention provides a process for producing aromatic ether bismaleimides of the Formula (II) ##STR1## wherein A is a divalent mononuclear or polynuclear aromatic linking group. The process provides good yields and can be scaled up readily to commercial size runs.The present invention also provides compositions containing at least about 80 weight % of the bismaleimide of Formula (II) above.
    Type: Grant
    Filed: December 22, 1987
    Date of Patent: August 8, 1989
    Assignee: University of Dayton
    Inventors: John M. Butler, Richard P. Chartoff, James A. Harvey