Patents by Inventor Richard P. Welty

Richard P. Welty has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5922478
    Abstract: An article is coated with a multi-layer coating comprising a nickel layer, a chrome layer, a refractory metal layer, preferably zirconium layer, a sandwich layer comprised of a plurality of alternating layers of a refractory metal compound and a refractory metal compound layer, preferably zirconium nitride layer, and a refractory metal oxide layer or a layer comprised of the reaction products of refractory metal, oxygen and nitrogen. The coating provides the color of polished brass to the article and also provides abrasion protection, corrosion protection, and improved acid resistance.
    Type: Grant
    Filed: April 30, 1997
    Date of Patent: July 13, 1999
    Assignee: Masco Corporation
    Inventors: Richard P. Welty, John H. Petersen, Patrick Jonte, Carl W. Trendelman
  • Patent number: 5840163
    Abstract: A rectangular vacuum-arc plasma source and associated apparatus for generating and directing a stream of plasma containing an ionized vapor of a cathode material toward a substrate by vacuum arc evaporation of a rectangular planar cathode mounted in a rectangular plasma duct. The rectangular duct conducts the plasma from the cathode to the substrate region, while intercepting the molten droplets of cathode material also generated by the arc. Magnets control the arc motion on the cathode surface while simultaneously generating the magnetic field which guides the plasma through the duct. Benefits of a filtered cathodic arc (fully ionized vapor stream, elimination of splattered droplets) are combined with the benefits of a rectangular source (uniform evaporation from the source and uniform deposition on the substrate using linear motion). The rectangular source may be extended indefinitely in length, thus allowing coating or ion implantation on large or long substrates.
    Type: Grant
    Filed: December 22, 1995
    Date of Patent: November 24, 1998
    Assignee: Vapor Technologies, Inc.
    Inventor: Richard P. Welty
  • Patent number: 5799549
    Abstract: Improved razors and razor blades and processes for producing razor blades or similar cutting tools with sharp and durable cutting edges, by hard-carbon coating of blades with amorphous diamond, preferably using a filtered cathodic arc plasma source. A coating of amorphous diamond having at least 40 percent sp3 carbon bonding, a hardness of at least 45 gigapascals and a modulus of at least 400 gigapascals is applied to the sharpened edge of a substrate. The substrate may be mechanically honed, and there is no interlayer between the substrate and the amorphous diamond coating. The coating imparts stiffness and rigidity to a thin blade while maintaining a high aspect ratio.
    Type: Grant
    Filed: March 27, 1997
    Date of Patent: September 1, 1998
    Assignee: The Gillette Company
    Inventors: Thomas G. Decker, Gregory P. Lundie, David L. Pappas, Richard P. Welty, C. Robert Parent
  • Patent number: 5480527
    Abstract: A rectangular vacuum-arc plasma source and associated apparatus for generating and directing a stream of plasma containing an ionized vapor of a cathode material toward a substrate by vacuum arc evaporation of a rectangular planar cathode mounted in a rectangular plasma duct. The rectangular duct conducts the plasma from the cathode to the substrate region, while intercepting the molten droplets of cathode material also generated by the arc. Magnets control the arc motion on the cathode surface while simultaneously generating the magnetic field which guides the plasma through the duct. Benefits of a filtered cathodic arc (fully ionized vapor stream, elimination of splattered droplets) are combined with the benefits of a rectangular source (uniform evaporation from the source and uniform deposition on the substrate using linear motion). The rectangular source may be extended indefinitely in length, thus allowing coating or ion implantation on large or long substrates.
    Type: Grant
    Filed: April 25, 1994
    Date of Patent: January 2, 1996
    Assignee: Vapor Technologies, Inc.
    Inventor: Richard P. Welty
  • Patent number: 5269898
    Abstract: An apparatus and method are described for depositing a coating onto a substrate using vacuum arc evaporation from a substantially cylindrical cathode. An axial magnetic field is disclosed to force the motion of the arc into an open helical trajectory on the cathode surface. Means are also provided for controlling the speed and direction of the arc along the cathode by varying the division of input current between the ends of the cathode. Improved uniformity of cathode erosion and coating thickness are thereby achieved, along with a reduction in the number and size of splattered droplets incorporated into the coating.
    Type: Grant
    Filed: December 17, 1991
    Date of Patent: December 14, 1993
    Assignee: Vapor Technologies, Inc.
    Inventor: Richard P. Welty
  • Patent number: 4892633
    Abstract: A superior method and magnetron sputtering cathode apparatus in which some of the flux lines forming the closed-loop magnetic tunnel are made to change their curvature from convex to slightly concave within a region of the tunnel intersecting the sputtering target volume, and over a substantial fraction of the tunnel width. The improved field shape reduces the tendency of the eroded area of the target to become narrower as erosion progresses, and thereby allows more complete consumption of the target.
    Type: Grant
    Filed: April 11, 1989
    Date of Patent: January 9, 1990
    Assignee: Vac-Tec Systems, Inc.
    Inventor: Richard P. Welty
  • Patent number: 4865708
    Abstract: A superior method and magnetron sputtering cathode apparatus in which some of the flux lines forming the closed-loop magnetic tunnel are made to change their curvature from convex to slightly concave within a region of the tunnel intersecting the sputtering target volume, and over a substantial fraction of the tunnel width. The improved field shape reduces the tendency of the eroded area of the target to become narrower as erosion progresses, and thereby allows more complete consumption of the target.
    Type: Grant
    Filed: November 14, 1988
    Date of Patent: September 12, 1989
    Assignee: Vac-Tec Systems, Inc.
    Inventor: Richard P. Welty
  • Patent number: 4814056
    Abstract: Apparatus for depositing a coating on at least one substrate where the coating includes at least two component materials where the relative percentages of the component materials with respect to each other varies through the thickness of the coating. The apparatus includes at least two deposition sources for respectively providing the two component materials, at least one mask having at least one aperture, the mask being disposed between at least one of said two deposition sources and the substrate, and a motion effecting mechanism for effecting relative motion between the substrate and the deposition sources to thus effect a predetermined variation of the relative percentages of the component materials as a function of at least the shape of the aperture in the mask.
    Type: Grant
    Filed: June 23, 1987
    Date of Patent: March 21, 1989
    Assignee: Vac-Tec Systems, Inc.
    Inventor: Richard P. Welty