Patents by Inventor Richard R. Vandepoll

Richard R. Vandepoll has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5417897
    Abstract: A single mask is used to form a tapered nozzle in a polymer nozzle member using laser ablation. In one embodiment of the mask, clear portions of the mask, corresponding to the nozzle pattern to be formed, each incorporate a variable-density dot pattern, where the opaque dots act to partially shield the underlying polymer nozzle member from the laser energy. This partial shielding of the nozzle member under the dot pattern results in the nozzle member being ablated to less of a depth than where there is no shielding. By selecting the proper density of opaque dots around the peripheral portions of the mask openings, the central portion of each nozzle formed in the polymer nozzle member will be completely ablated through, and the peripheral portions of the nozzle will be only partially ablated through. By increasing the density of dots toward the periphery of each mask opening, the resulting nozzle may be formed to have any tapered shape. Other mask patterns are also described.
    Type: Grant
    Filed: March 19, 1994
    Date of Patent: May 23, 1995
    Assignee: Hewlett-Packard Company
    Inventors: Stuart D. Asakawa, Paul H. McClelland, Ellen R. Tappon, Richard R. Vandepoll, Kenneth E. Trueba, Chien-Hua Chen
  • Patent number: 5378137
    Abstract: A single mask is used to form a tapered nozzle in a polymer nozzle member using laser ablation. In one embodiment of the mask, clear portions of the mask, corresponding to the nozzle pattern to be formed, each incorporate a variable-density dot pattern, where the opaque dots act to partially shield the underlying polymer nozzle member from the laser energy. This partial shielding of the nozzle member under the dot pattern results in the nozzle member being ablated to less of a depth than where there is no shielding. By selecting the proper density of opaque dots around the peripheral portions of the mask openings, the central portion of each nozzle formed in the polymer nozzle member will be completely ablated through, and the peripheral portions of the nozzle will be only partially ablated through. By increasing the density of dots toward the periphery of each mask opening, the resulting nozzle may be formed to have any tapered shape. Other mask patterns are also described.
    Type: Grant
    Filed: May 10, 1993
    Date of Patent: January 3, 1995
    Assignee: Hewlett-Packard Company
    Inventors: Stuart D. Asakawa, Paul H. McClelland, Ellen R. Tappon, Richard R. Vandepoll, Kenneth E. Trueba, Chien-Hua Chen