Abstract: A macroparticle filter device for cathodic arc evaporation, to be placed between at least one arc evaporation source and at least one substrate exhibiting at least a surface to be coated with material evaporated from a cathode of the arc evaporation source in a vacuum coating chamber. The macroparticle filter device includes one or more filter components that can prevent macroparticles emitted by the cathode during cathodic arc evaporation to arrive the substrate surface to be coated. The at least one component is provided as one or more flexible sheets that block the lineal way of the macroparticles from the cathode to the substrate surface to be coated. Further a method for utilizing the macroparticle filter device is presented.

Abstract: The present invention concerns substrates coated with an Mo1-x-ySiXBY layer, said layer comprising the T2 phase, and a method for the production thereof.

Abstract: A hard coating containing at least one layer including chromium, aluminum, tantalum and nitrogen as main components and a chemical composition (AlaCrbTac)N in which the following conditions are satisfied: a=x, (1?c), b=(1?x)·(1?c), 0.60?x?0.70, and 0.01?c?0.5. The layer has an X-ray diffraction peak intensity ratio of I200/(I200+I111)?0.25. The application also relates to a reactive arc ion plating PVD process for making the hard coating.

Abstract: A macroparticle filter device for cathodic arc evaporation, to be placed between at least one arc evaporation source and at least one substrate exhibiting at least a surface to be coated with material evaporated from a cathode of the arc evaporation source in a vacuum coating chamber. The macroparticle filter device includes one or more filter components that can prevent macroparticles emitted by the cathode during cathodic arc evaporation to arrive the substrate surface to be coated. The at least one component is provided as one or more flexible sheets that block the lineal way of the macroparticles from the cathode to the substrate surface to be coated. Further a method for utilizing the macroparticle filter device is presented.

Abstract: The present invention relates to a method for coating AI-Cr-0 coatings with the help of a PVD-coating process. The PVD-coating process is performed with the help of Al and Cr comprising targets which are doped with Si. The doping of Si prevents the forming of oxide islands on the target during the reactive coating process.

Abstract: The present invention concerns substrates coated with an Mo1-x-ySixBy layer, said layer comprising the T2 phase, and a method for the production thereof.

Abstract: A hard coating containing at least one layer including chromium, aluminum, tantalum and nitrogen as main components and a chemical composition (AlaCrbTac)N in which the following conditions are satisfied: a=x, (1-c), b=(1-x)·(1-c), 0.60?x?0.70, and 0.01?c?0.5. The layer has an X-ray diffraction peak intensity ratio of 1200/(1200+I111)?0.25. The application also relates to a reactive arc ion plating PVD process for making the hard coating.

Abstract: A wear resistant coating system including a tantalum-containing multilayered film having n A layers and m B layers, where n and m are integral numbers larger than I, deposited alternating one on each other. The multilayered film exhibits crystalline cubic structure, and is characterized in that the B layers include tantalum and the A layers exhibit a higher defect density than the B layers.

Abstract: Arc vaporization of targets produced by means of powder metallurgy in Which the components are in the form of intermetallic compounds. The target is produced using a powder that contains a first and second intermetaallic compound and/or a first and second ceramic compound.

Abstract: A wear resistant coating system including a tantalum-containing multilayered film having n A layers and m B layers, where n and m are integral numbers larger than I, deposited alternating one on each other. The multilayered film exhibits crystalline cubic structure, and is characterized in that the B layers include tantalum and the A layers exhibit a higher defect density than the B layers.

Abstract: The present invention relates to a method for coating AI-Cr-0 coatings with the help of a PVD-coating process. The PVD-coating process is performed with the help of Al and Cr comprising targets which are doped with Si. The doping of Si prevents the forming of oxide islands on the target during the reactive coating process.