Patents by Inventor Richard S. Odneal

Richard S. Odneal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9617389
    Abstract: An stable ethylsilicate polymer having a dynamic viscosity of 10 centipoises (cps) to 1,000 cps at 25° C. and 50 wt % to 60 wt % silica (SiO2). The stable ethylsilicate polymer includes not greater than 1 wt % of TEOS monomer. The process of forming the ethylsilicate polymer includes a two step addition of catalysts. A hydrolysis catalyst is added initially, for example hydrochloric acid, and a second catalyst is added subsequently, such as phosphonitrilic chloride trimer. The ethylsilicate polymer is used to form MQ resins.
    Type: Grant
    Filed: January 3, 2011
    Date of Patent: April 11, 2017
    Assignee: Silbond Corporation
    Inventors: Walter L. Magee, Adam W. Emerson, Wallace G. Joslyn, Richard S. Odneal
  • Patent number: 8829144
    Abstract: An MQ resin including at least 30% SiO2, preferably at least 50 wt % SiO2, and having dynamic viscosity of 50 centipoises (cps) to 750 cps at 25° C. is produced from a stable ethylsilicate polymer. The ethylsilicate polymer includes not greater than 1 wt % of TEOS monomer. The ethylsilicate polymer is produced by a two step addition of catalysts wherein a hydrolysis catalyst, for example, hydrochloric acid is added initially and a second catalyst, such as phosphonitrilic chloride trimer, is added subsequently.
    Type: Grant
    Filed: January 3, 2011
    Date of Patent: September 9, 2014
    Assignee: Silbond Corporation
    Inventors: Walter L. Magee, Adam W. Emerson, Wallace G. Joslyn, Richard S. Odneal
  • Publication number: 20110184142
    Abstract: An MQ resin including at least 30% SiO2, preferably at least 50 wt % SiO2, and having dynamic viscosity of 50 centipoises (cps) to 750 cps at 25° C. is produced from a stable ethylsilicate polymer. The ethylsilicate polymer includes not greater than 1 wt % of TEOS monomer. The ethylsilicate polymer is produced by a two step addition of catalysts wherein a hydrolysis catalyst, for example, hydrochloric acid is added initially and a second catalyst, such as phosphonitrilic chloride trimer, is added subsequently.
    Type: Application
    Filed: January 3, 2011
    Publication date: July 28, 2011
    Inventors: Walter L. Magee, Adam W. Emerson, Wallace G. Joslyn, Richard S. Odneal
  • Publication number: 20110160429
    Abstract: An stable ethylsilicate polymer having a dynamic viscosity of 10 centipoises (cps) to 1,000 cps at 25° C. and 50 wt % to 60 wt % silica (SiO2). The stable ethylsilicate polymer includes not greater than 1 wt % of TEOS monomer. The process of forming the ethylsilicate polymer includes a two step addition of catalysts. A hydrolysis catalyst is added initially, for example hydrochloric acid, and a second catalyst is added subsequently, such as phosphonitrilic chloride trimer. The ethylsilicate polymer is used to form MQ resins.
    Type: Application
    Filed: January 3, 2011
    Publication date: June 30, 2011
    Inventors: Walter L. Magee, Adam W. Emerson, Wallace G. Joslyn, Richard S. Odneal
  • Patent number: 7884170
    Abstract: A stable MQ resin solution with over 50% SiO2 and having viscosity of 50 cps at 25° C. to about 750 cps at 25° C. and which is essential free of monomer is disclosed. The stable resin solution is made by a two step addition of catalysts wherein a hydrolysis catalysts, as for example, hydrochloric acid is added initially and a second catalysts such as Phosphonitrilic chloride trimer is added subsequently.
    Type: Grant
    Filed: June 10, 2008
    Date of Patent: February 8, 2011
    Assignee: Silbond Corporation
    Inventors: Walter L. Magee, Adam W. Emerson, Wallace G. Joslyn, Richard S. Odneal
  • Publication number: 20090306326
    Abstract: A stable MQ resin solution with over 50% SiO2 and having viscosity of 50 cps at 25° C. to about 750 cps at 25° C. and which is essential free of monomer is disclosed. The stable resin solution is made by a two step addition of catalysts wherein a hydrolysis catalysts, as for example, hydrochloric acid is added initially and a second catalysts such as Phosphonitrilic chloride trimer is added subsequently.
    Type: Application
    Filed: June 10, 2008
    Publication date: December 10, 2009
    Inventors: Walter L. Magee, Adam W. Emerson, Wallace G. Joslyn, Richard S. Odneal