Patents by Inventor Richard S. Ray
Richard S. Ray has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11062906Abstract: Compositions, systems, and methods are described for implanting silicon and/or silicon ions in a substrate, involving generation of silicon and/or silicon ions from corresponding silicon precursor compositions, and implantation of the silicon and/or silicon ions in the substrate.Type: GrantFiled: August 14, 2014Date of Patent: July 13, 2021Assignee: Entegris, Inc.Inventors: Ying Tang, Joseph D. Sweeney, Tianniu Chen, James J. Mayer, Richard S. Ray, Oleg Byl, Sharad N. Yedave, Robert Kaim
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Patent number: 10845006Abstract: A fluid supply package is described, which includes a fluid storage and dispensing vessel, and a fluid dispensing assembly coupled to the vessel and configured to enable discharge of fluid from the vessel under dispensing conditions, wherein the fluid supply package includes an informational augmentation device thereon, e.g., at least one of a quick read (QR) code and an RFID tag, for informational augmentation of the package. Process systems are described including process tools and one or more fluid supply packages of the foregoing type, wherein the process tool is configured for communicative interaction with the fluid supply package(s). Various communicative arrangements are described, which are usefully employed to enhance the efficiency and operation of process systems in which fluid supply packages of the foregoing type are employed.Type: GrantFiled: September 20, 2019Date of Patent: November 24, 2020Assignee: ENTEGRIS, INC.Inventors: Joseph D. Sweeney, Edward Edmiston Jones, Joseph Robert Despres, Richard S. Ray, Peter C. Van Buskirk, Edward A. Sturm, Christopher Scannell
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Publication number: 20200011482Abstract: A fluid supply package is described, which includes a fluid storage and dispensing vessel, and a fluid dispensing assembly coupled to the vessel and configured to enable discharge of fluid from the vessel under dispensing conditions, wherein the fluid supply package includes an informational augmentation device thereon, e.g., at least one of a quick read (QR) code and an RFID tag, for informational augmentation of the package. Process systems are described including process tools and one or more fluid supply packages of the foregoing type, wherein the process tool is configured for communicative interaction with the fluid supply package(s). Various communicative arrangements are described, which are usefully employed to enhance the efficiency and operation of process systems in which fluid supply packages of the foregoing type are employed.Type: ApplicationFiled: September 20, 2019Publication date: January 9, 2020Inventors: Joseph D. SWEENEY, Edward Edmiston JONES, Joseph Robert DESPRES, Richard S. RAY, Peter C. Van Buskirk, Edward A. STURM, Christopher SCANNELL
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Patent number: 10508773Abstract: A fluid supply package is described, which includes a fluid storage and dispensing vessel, and a fluid dispensing assembly coupled to the vessel and configured to enable discharge of fluid from the vessel under dispensing conditions, wherein the fluid supply package includes an informational augmentation device thereon, e.g., at least one of a quick read (QR) code and an RFID tag, for informational augmentation of the package. Process systems are described including process tools and one or more fluid supply packages of the foregoing type, wherein the process tool is configured for communicative interaction with the fluid supply package(s). Various communicative arrangements are described, which are usefully employed to enhance the efficiency and operation of process systems in which fluid supply packages of the foregoing type are employed.Type: GrantFiled: February 8, 2019Date of Patent: December 17, 2019Assignee: ENTEGRIS, INC.Inventors: Joseph D. Sweeney, Edward Edmiston Jones, Joseph Robert Despres, Richard S. Ray, Peter C. Van Buskirk, Edward A. Sturm, Christopher Scannell
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Publication number: 20190170302Abstract: A fluid supply package is described, which includes a fluid storage and dispensing vessel, and a fluid dispensing assembly coupled to the vessel and configured to enable discharge of fluid from the vessel under dispensing conditions, wherein the fluid supply package includes an informational augmentation device thereon, e.g., at least one of a quick read (QR) code and an RFID tag, for informational augmentation of the package. Process systems are described including process tools and one or more fluid supply packages of the foregoing type, wherein the process tool is configured for communicative interaction with the fluid supply package(s). Various communicative arrangements are described, which are usefully employed to enhance the efficiency and operation of process systems in which fluid supply packages of the foregoing type are employed.Type: ApplicationFiled: February 8, 2019Publication date: June 6, 2019Inventors: Joseph D. SWEENEY, Edward Edmiston JONES, Joseph Robert DESPRES, Richard S. RAY, Peter C. Van Buskirk, Edward A. STURM, Christopher SCANNELL
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Patent number: 10247363Abstract: A fluid supply package is described, which includes a fluid storage and dispensing vessel, and a fluid dispensing assembly coupled to the vessel and configured to enable discharge of fluid from the vessel under dispensing conditions, wherein the fluid supply package includes an informational augmentation device thereon, e.g., at least one of a quick read (QR) code and an RFID tag, for informational augmentation of the package. Process systems are described including process tools and one or more fluid supply packages of the foregoing type, wherein the process tool is configured for communicative interaction with the fluid supply package(s). Various communicative arrangements are described, which are usefully employed to enhance the efficiency and operation of process systems in which fluid supply packages of the foregoing type are employed.Type: GrantFiled: February 12, 2016Date of Patent: April 2, 2019Assignee: Entegris, Inc.Inventors: Joseph D. Sweeney, Edward E. Jones, Joseph R. Despres, Richard S. Ray, Peter C. Van Buskirk, Edward A. Sturm, Chris Scannell
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Publication number: 20180149315Abstract: Gas supply systems and methods are described for delivery of gas to gas-utilizing process tools, e.g., gas-utilizing tools for manufacturing of semiconductor products, flat-panel displays, solar panels, etc. The gas supply systems may comprise gas cabinets that are arranged with adsorbent-based and/or interiorly pressure-regulated gas supply vessels therein, and a gas mixing manifold is described, which may be disposed in the gas cabinet or operated in a standalone fashion. In one aspect, gas supply systems are described in which vessels susceptible to cooling involving diminution of gas supply pressure are processed after pressure-controlled termination of dispensing operation, for dispensing operation achieving utilization of gas remaining in the vessel after such termination.Type: ApplicationFiled: May 16, 2016Publication date: May 31, 2018Inventors: Joseph R. DESPRES, Barry Lewis CHAMBERS, Joseph D. Sweeney, Richard S. RAY, Steven E. BISHOP
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Publication number: 20180023765Abstract: A fluid supply package is described, which includes a fluid storage and dispensing vessel, and a fluid dispensing assembly coupled to the vessel and configured to enable discharge of fluid from the vessel under dispensing conditions, wherein the fluid supply package includes an informational augmentation device thereon, e.g., at least one of a quick read (QR) code and an RFID tag, for informational augmentation of the package. Process systems are described including process tools and one or more fluid supply packages of the foregoing type, wherein the process tool is configured for communicative interaction with the fluid supply package(s). Various communicative arrangements are described, which are usefully employed to enhance the efficiency and operation of process systems in which fluid supply packages of the foregoing type are employed.Type: ApplicationFiled: February 12, 2016Publication date: January 25, 2018Inventors: Joseph D. SWEENEY, Edward E. JONES, Joseph R. SPRES, Richard S. RAY, Peter C. VAN BUSKIRK, Edward A. STURM, Chris SCANNELL
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Patent number: 9831063Abstract: Ion implantation compositions, systems and methods are described, for implantation of dopant species. Specific selenium dopant source compositions are described, as well as the use of co-flow gases to achieve advantages in implant system characteristics such as recipe transition, beam stability, source life, beam uniformity, beam current, and cost of ownership.Type: GrantFiled: March 3, 2014Date of Patent: November 28, 2017Assignee: ENTEGRIS, INC.Inventors: Oleg Byl, Joseph D. Sweeney, Ying Tang, Richard S. Ray
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Publication number: 20170330756Abstract: An ion implantation system and process, in which the performance and lifetime of the ion source of the ion implantation system are enhanced, by utilizing isotopically enriched dopant materials, or by utilizing dopant materials with supplemental gas(es) effective to provide such enhancement.Type: ApplicationFiled: July 31, 2017Publication date: November 16, 2017Inventors: Robert Kaim, Joseph D. Sweeney, Anthony M. Avila, Richard S. Ray
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Patent number: 9812291Abstract: Systems and processes for utilizing phosphorus fluoride in place of or in combination with, phosphine as a phosphorus dopant source composition, to reduce buildup of unwanted phosphorus deposits in ion implanter systems. The phosphorus fluoride may comprise PF3 and/or PF5. Phosphorus fluoride and phosphine may be co-flowed to the ion implanter, or each of such phosphorus dopant source materials can be alternatingly and sequentially flowed separately to the ion implanter, to achieve reduction in unwanted buildup of phosphorus solids in the implanter, relative to a corresponding process system utilizing only phosphine as the phosphorus dopant source material.Type: GrantFiled: February 14, 2013Date of Patent: November 7, 2017Assignee: ENTEGRIS, INC.Inventor: Richard S. Ray
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Patent number: 9754786Abstract: An ion implantation system and process, in which the performance and lifetime of the ion source of the ion implantation system are enhanced, by utilizing isotopically enriched dopant materials, or by utilizing dopant materials with supplemental gas(es) effective to provide such enhancement.Type: GrantFiled: April 21, 2015Date of Patent: September 5, 2017Assignee: ENTEGRIS, INC.Inventors: Robert Kaim, Joseph D. Sweeney, Anthony M. Avila, Richard S. Ray
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Patent number: 9685304Abstract: An isotopically-enriched, boron-containing compound comprising two or more boron atoms and at least one fluorine atom, wherein at least one of the boron atoms contains a desired isotope of boron in a concentration or ratio greater than a natural abundance concentration or ratio thereof. The compound may have a chemical formula of B2F4. Synthesis methods for such compounds, and ion implantation methods using such compounds, are described, as well as storage and dispensing vessels in which the isotopically-enriched, boron-containing compound is advantageously contained for subsequent dispensing use.Type: GrantFiled: September 22, 2015Date of Patent: June 20, 2017Assignee: Entegris, Inc.Inventors: Robert Kaim, Joseph D. Sweeney, Oleg Byl, Sharad N. Yedave, Edward E. Jones, Peng Zou, Ying Tang, Barry Lewis Chambers, Richard S. Ray
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Publication number: 20160211137Abstract: Compositions, systems, and methods are described for implanting silicon and/or silicon ions in a substrate, involving generation of silicon and/or silicon ions from corresponding silicon precursor compositions, and implantation of the silicon and/or silicon ions in the substrate.Type: ApplicationFiled: August 14, 2014Publication date: July 21, 2016Applicant: Entegris, Inc.Inventors: Ying Tang, Joseph D. Sweeney, Tianniu Chen, James J. Mayer, Richard S. Ray, Oleg Byl, Sharad N. Yedave, Robert Kaim
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Patent number: 9269582Abstract: An ion implantation method, in which a dopant source composition is ionized to form dopant ions, and the dopant ions are implanted in a substrate. The dopant source composition includes cluster phosphorus or cluster arsenic compounds, for achieving P- and/or As-doping, in the production of doped articles of manufacture, e.g., silicon wafers or precursor structures for manufacturing microelectronic devices.Type: GrantFiled: March 22, 2012Date of Patent: February 23, 2016Assignee: ENTEGRIS, INC.Inventors: Oleg Byl, Chongying Xu, William Hunks, Richard S. Ray
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Publication number: 20160046849Abstract: Isotopically enriched silicon precursor compositions are disclosed, as useful in ion implantation to enhance performance of the ion implantation system, in relation to corresponding ion implantation lacking such isotopic enrichment of the silicon precursor composition. The silicon dopant composition includes at least one silicon compound that is isotopically enriched above natural abundance in at least one of 28Si, 29Si, and 30Si, and may include a supplemental gas including at least one of a co-species gas and a diluent gas. Dopant gas supply apparatus for providing such silicon dopant compositions to an ion implanter are described, as well as ion implantation systems including such dopant gas supply apparatus.Type: ApplicationFiled: October 27, 2015Publication date: February 18, 2016Applicant: ENTEGRIS, INC.Inventors: James J. Mayer, Richard S. Ray, Robert Kaim, Joseph D. Sweeney
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Publication number: 20160013018Abstract: An isotopically-enriched, boron-containing compound comprising two or more boron atoms and at least one fluorine atom, wherein at least one of the boron atoms contains a desired isotope of boron in a concentration or ratio greater than a natural abundance concentration or ratio thereof. The compound may have a chemical formula of B2F4. Synthesis methods for such compounds, and ion implantation methods using such compounds, are described, as well as storage and dispensing vessels in which the isotopically-enriched, boron-containing compound is advantageously contained for subsequent dispensing use.Type: ApplicationFiled: September 22, 2015Publication date: January 14, 2016Applicant: Entegris, Inc.Inventors: Robert Kaim, Joseph D. Sweeney, Oleg Byl, Sharad N. Yedave, Edward E. Jones, Peng Zou, Ying Tang, Barry Lewis Chambers, Richard S. Ray
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Publication number: 20150380212Abstract: Ion implantation compositions, systems and methods are described, for implantation of dopant species. Specific selenium dopant source compositions are described, as well as the use of co-flow gases to achieve advantages in implant system characteristics such as recipe transition, beam stability, source life, beam uniformity, beam current, and cost of ownership.Type: ApplicationFiled: March 3, 2014Publication date: December 31, 2015Applicant: Entegris, Inc.Inventors: Oleg Byl, Joseph D. Sweeney, Ying Tang, Richard S. Ray
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Patent number: 9171725Abstract: Isotopically enriched silicon precursor compositions are disclosed, as useful in ion implantation to enhance performance of the ion implantation system, in relation to corresponding ion implantation lacking such isotopic enrichment of the silicon precursor composition. The silicon dopant composition includes at least one silicon compound that is isotopically enriched above natural abundance in at least one of 28Si, 29Si, and 30Si, and may include a supplemental gas including at least one of a co-species gas and a diluent gas. Dopant gas supply apparatus for providing such silicon dopant compositions to an ion implanter are described, as well as ion implantation systems including such dopant gas supply apparatus.Type: GrantFiled: July 14, 2014Date of Patent: October 27, 2015Assignee: ENTEGRIS, INC.Inventors: James J. Mayer, Richard S. Ray, Robert Kaim, Joseph D. Sweeney
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Patent number: 9142387Abstract: An isotopically-enriched, boron-containing compound comprising two or more boron atoms and at least one fluorine atom, wherein at least one of the boron atoms contains a desired isotope of boron in a concentration or ratio greater than a natural abundance concentration or ratio thereof. The compound may have a chemical formula of B2F4. Synthesis methods for such compounds, and ion implantation methods using such compounds, are described, as well as storage and dispensing vessels in which the isotopically-enriched, boron-containing compound is advantageously contained for subsequent dispensing use.Type: GrantFiled: December 3, 2013Date of Patent: September 22, 2015Assignee: ENTEGRIS, INC.Inventors: Robert Kaim, Joseph D. Sweeney, Oleg Byl, Sharad N. Yedave, Edward E. Jones, Peng Zou, Ying Tang, Barry Lewis Chambers, Richard S. Ray