Patents by Inventor Richard Schiek

Richard Schiek has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System for generating two-dimensional masks from a three-dimensional model using topological analysis
    Patent number: 7065736
    Abstract: A method of generating two-dimensional masks from a three-dimensional model comprises providing a three-dimensional model representing a micro-electro-mechanical structure for manufacture and a description of process mask requirements, reducing the three-dimensional model to a topological description of unique cross sections, and selecting candidate masks from the unique cross sections and the cross section topology. The method further can comprise reconciling the candidate masks based on the process mask requirements description to produce two-dimensional process masks.
    Type: Grant
    Filed: September 24, 2003
    Date of Patent: June 20, 2006
    Assignee: Sandia Corporation
    Inventor: Richard Schiek