Patents by Inventor Richard Stutz

Richard Stutz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Non-volatile resistance switching memory
    Patent number: 7923263
    Abstract: A microelectronic device or non-volatile resistance switching memory comprising the switching material for storing digital information. A process includes a step of depositing the switching material by a CMOS deposition technique at a temperature lower than 400° C.
    Type: Grant
    Filed: August 13, 2009
    Date of Patent: April 12, 2011
    Assignee: International Business Machines Corporation
    Inventors: Rolf Allenspach, Johannes G. Bednorz, Gerhard Ingmar Meijer, Chung Hon Lam, Richard Stutz, Daniel Widmer
  • Non-volatile resistance switching memory
    Patent number: 7897957
    Abstract: A microelectronic device or non-volatile resistance switching memory comprising the switching material for storing digital information. A process includes a step of depositing the switching material by a CMOS deposition technique at a temperature lower than 400° C.
    Type: Grant
    Filed: August 14, 2009
    Date of Patent: March 1, 2011
    Assignee: International Business Machines Corporation
    Inventors: Rolf Allenspach, Johannes G. Bednorz, Gerhard Ingmar Meijer, Chung Hon Lam, Richard Stutz, Daniel Widmer
  • Non-volatile resistance switching memory
    Patent number: 7897411
    Abstract: Processes, apparatus and systems for depositing a switching material that is switchable between conductivity states and where the states are persistent. The invention further relates to a microelectronic device or non-volatile resistance switching memory comprising the switching material for storing digital information. A process includes a step of depositing the switching material by a CMOS deposition technique at a temperature lower than 400° C.
    Type: Grant
    Filed: April 14, 2005
    Date of Patent: March 1, 2011
    Assignee: International Business Machines Corporation
    Inventors: Rolf Allenspach, Johannes G. Bednorz, Gerhard Ingmar Meijer, Chung Hon Lam, Richard Stutz, Daniel Widmer
  • NON-VOLATILE RESISTANCE SWITCHING MEMORY
    Publication number: 20090308313
    Abstract: A microelectronic device or non-volatile resistance switching memory comprising the switching material for storing digital information. A process includes a step of depositing the switching material by a CMOS deposition technique at a temperature lower than 400° C.
    Type: Application
    Filed: August 13, 2009
    Publication date: December 17, 2009
    Applicant: International Business Machines Corporation
    Inventors: Rolf Allenspach, Johannes G. Bednorz, Gerhard Ingmar Meijer, Chung Hon Lam, Richard Stutz, Daniel Widmer
  • NON-VOLATILE RESISTANCE SWITCHING MEMORY
    Publication number: 20090305487
    Abstract: A microelectronic device or non-volatile resistance switching memory comprising the switching material for storing digital information. A process includes a step of depositing the switching material by a CMOS deposition technique at a temperature lower than 400° C.
    Type: Application
    Filed: August 14, 2009
    Publication date: December 10, 2009
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Rolf Allenspach, Johannes G. Bednorz, Gerhard Ingmar Meijer, Chung Hon Lam, Richard Stutz, Daniel Widmer
  • Non-volatile resistance switching memory
    Publication number: 20050260839
    Abstract: Processes, apparatus and systems for depositing a switching material that is switchable between conductivity states and where the states are persistent. The invention further relates to a microelectronic device or non-volatile resistance switching memory comprising the switching material for storing digital information. A process includes a step of depositing the switching material by a CMOS deposition technique at a temperature lower than 400° C.
    Type: Application
    Filed: April 14, 2005
    Publication date: November 24, 2005
    Applicant: International Business Machines Corporation
    Inventors: Rolf Allenspach, Johannes Bednorz, Gerhard Meijer, Chung Lam, Richard Stutz, Daniel Widmer
  • Method and apparatus for forming a chemical gradient on a substrate
    Publication number: 20050170095
    Abstract: The present invention provides a method of forming a chemical gradient on a substrate (12) comprising the steps of: providing a printing device (10) comprising a body for holding at least one active molecular ink within a body volume of the body, wherein the body comprises a contact surface (18) and the dimension of the body volume transverse to the contact surface (18) is variable; and contacting the printing device (10) with the substrate (12). The present invention also provides an apparatus for forming a chemical gradient.
    Type: Application
    Filed: December 3, 2004
    Publication date: August 4, 2005
    Applicant: International Business Machines Corporation
    Inventors: Heiko Wolf, Heinz Schmid, Richard Stutz, Tobias Balmer
  • Silicone elastomer stamp with hydrophilic surfaces and method of making same
    Patent number: 6596346
    Abstract: A method for fabricating silicone elastomer stamps with hydrophilic surfaces is provided. The concept of polymer grafting is used to produce the stamps. The stamps thus produced have the great advantage that grafting of a thin hydrophilic polymer on a hydrophobic PDMS surface can render PDMS stamps permanently hydrophilic. With such stamps it becomes possible to print aqueous or highly polar inks reproducibly over days and weeks.
    Type: Grant
    Filed: September 14, 2001
    Date of Patent: July 22, 2003
    Assignee: International Business Machines Corporation
    Inventors: Andre Bernard, Emmanuel Delamarche, Christian Donzel, Jöns G. Hilborn, Bruno Michel, Richard Stutz, Heiko Wolf
  • Silicone elastomer stamp with hydrophilic surfaces and method of making same
    Publication number: 20020098364
    Abstract: A method for fabricating silicone elastomer stamps with hydrophilic surfaces is provided. The concept of polymer grafting is used to produce the stamps. The stamps thus produced have the great advantage that grafting of a thin hydrophilic polymer on a hydrophobic PDMS surface can render PDMS stamps permanently hydrophilic. With such stamps it becomes possible to print aqueous or highly polar inks reproducibly over days and weeks.
    Type: Application
    Filed: September 14, 2001
    Publication date: July 25, 2002
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Andre Bernard, Emmanuel Delamarche, Christian Donzel, Jons Gunner Hilborn, Bruno Michel, Richard Stutz, Heiko Wolf