Abstract: Nonvolatile, semiconductor random access memory cells comprising a static, RAM cell and a nonvolatile memory element which may be interconnected with the static random-access memory cell by capacitative coupling, such that the RAM cell contents may be directly copied to the nonvolatile element, and such that the nonvolatile memory cell contents will be copied to the RAM cell upon applying power to the RAM cell. The nonvolatile memory element may be a substrate-coupled floating gate cell incorporating self-regulated and asperity enhanced tunnel currents.

Abstract: Nonvolatile semiconductor electrically-alterable, floating-gate memory methods and devices which utilize substrate coupling for self-regulated, tunnel-current-shaping to provide improved device characteristics. The substrate coupling also facilitates the cell interconnection to other circuit elements.

Abstract: Nonvolatile, integrated metal-oxide semiconductor random access memory systems utilizing integrated floating gate circuit elements, and integrated means for the generation and control of high voltages in the provision of self-contained, nonvolatile electrically-alterable static RAM circuit systems.

Abstract: An MOS memory cell which includes a floating gate charged from the substrate by avalanche injection. Charge is removed from the floating gate to an erasing gate by tunneling. Sharp edges on the polycrystalline silicon floating gate provide an enhanced electric field to overcome the silicon/silicon oxide barrier, thus permitting charge to be transferred from the floating gate to the erasing gate.

Abstract: A triple layer polysilicon cell for use in an electrically erasable PROM or for a discretionary circuit connector is described. Tunneling is employed to transfer charge to a floating gate from a programming gate and also to transfer charge from the floating gate to an erasing gate. Through light doping steps, the first layer of polysilicon (programming gate) and a second layer of polysilicon (floating gate) include rough surfaces. These rough surfaces provide enhanced electric fields which allow tunneling through relatively thick oxides.

Abstract: A method for forming a narrow gap in a material in which a first masking layer and a second masking layer are disposed on a layer of material and are selectively removed to expose a portion of the surface of the material. A third masking layer is then disposed on the material. The first and third layers and the material are then selectively etched to form such narrow gap. The portions of the material separated by the gap may be used as MOS integrated circuit gates and a gate may also be formed in the gap by first depositing an insulating layer in the gap and then filling the gap with a conductive material.

Abstract: A double polycrystalline silicone gate memory device having a floating gate for storing charge and a control gate. The memory device may be used as a single device cell in a memory array. A double self-aligning method is used to form the source and drain regions while doping the gates. Through a predeposition step a lightly doped secondary source and drain regions are formed in alignment with the floating gate prior to the formation of the primary source and drain regions in alignment with the control gate.

Abstract: A double polycrystalline silicon gate memory device having a floating gate for storing charge and a control gate. The memory device may be used as a single device cell in a memory array. A double self-aligning method is used to form the source and drain regions while doping the gates. Through a predeposition step a lightly doped secondary source and drain regions are formed in alignment with the floating gate prior to the formation of the primary source and drain regions in alignment with the control gate.