Abstract: Disclosed herein is a barrier layer comprising a polyvinyl amine-polyvinyl alcohol copolymer applied to a substrate as a water-soluble composition, wherein the polyvinyl amine-polyvinyl alcohol copolymer is formed by copolymerizing: (a) from 99 to 1 mol % of N-vinylformamide and (b) from 1 to 99 mol % of one or more vinyl Ci-Ci0 alkyl esters, and then hydrolyzing from 30 to 100 mol % of the formyl groups from the copolymerized units (a) to form amino groups and from 30 to 100 mol % of the Cj-Cio alkyl ester groups from the copolymerized units (b) to form hydroxyl groups, wherein the copolymer has a unimodal compositional distribution as evidenced by essentially one peak in a gel permeation gradient elution chromatographic analysis. A method of producing a barrier layer is also disclosed.

Abstract: A product comprising a cold water soluble film wherein: a) the film comprises a copolymer of vinyl alcohol (VOH) with a minor amount of 2-acrylamido-2-methyl propane sulfonic acid in free acid form or as a salt of the free acid (AMPS); and b) the film has a harsh chemical dissolution time of less than about 80 seconds measured by the harsh chemical dissolution test method after 8 weeks.

Abstract: In a method of preparing an aqueous dispersion selected from drilling fluids, hydraulic cement compositions, mineral pigment containing coatings, and papermaking furnishes or in a method of preparing a melt extrudate, the improvement comprising: a) producing a copolymer of vinyl alcohol (VOH) and 2-acrylamido-2-methyl propane sulfonic acid or a salt of such acid (AMPS) by steps including continuously feeding with agitation, vinyl acetate (VAM) and AMPS as comonomers, a free radical yielding polymerization initiator, and a solvent for said comonomers, initiator, and copolymer resulting from the copolymerization of said comonomers, maintaining the resulting reaction mass in said first reaction zone under polymerization conditions for a residence time sufficient for a major proportion of AMPS fed to said first reaction zone to polymerize, continuously feeding reaction mass from said first reaction zone with an additional supply of AMPS to a second reaction zone, maintaining the reaction mass in the second reacti

Abstract: A product comprising a cold water soluble film wherein: a) the film comprises a copolymer of vinyl alcohol (VOH) with a minor amount of 2-acrylamido-2-methyl propane sulfonic acid in free acid form or as a salt of the free acid (AMPS); and b) the film has a harsh chemical dissolution time of less than about 80 seconds measured by the harsh chemical dissolution test method after 8 weeks.

Abstract: A water-soluble film which comprises a saccharide component and a vinyl alcohol resin component, where the vinyl alcohol resin may include functional comonomer units such as sulfonic acid functional groups or salts thereof. Preferred are polyvinyl alcohol/2-methylacrylamido-2 methyl propane sulfonic acid resins (PVOH/AMPS) which may be purchased commercially with relatively higher or relatively lower characteristic viscosity. The films exhibit superior resistance to aggressive oxidizing chemicals and remain soluble in water after prolonged exposure thereto. The films are particularly useful for unit-dose packaging of chlorine-containing pool chemicals, such as trichloroisocyanuric acid.

Abstract: In a method of preparing an aqueous dispersion selected from drilling fluids, hydraulic cement compositions, mineral pigment containing coatings, and papermaking furnishes or in a method of preparing a melt extrudate, the improvement comprising: a) producing a copolymer of vinyl alcohol (VOH) and 2-acrylamido-2-methyl propane sulfonic acid or a salt of such acid (AMPS) by steps including continuously feeding with agitation, vinyl acetate (VAM) and AMPS as comonomers, a free radical yielding polymerization initiator, and a solvent for said comonomers, initiator, and copolymer resulting from the copolymerization of said comonomers, maintaining the resulting reaction mass in said first reaction zone under polymerization conditions for a residence time sufficient for a major proportion of AMPS fed to said first reaction zone to polymerize, continuously feeding reaction mass from said first reaction zone with an additional supply of AMPS to a second reaction zone, maintaining the reaction mass in the second rea

Abstract: A product comprising a cold water soluble film wherein: a) the film comprises a copolymer of vinyl alcohol (VOH) with a minor amount of 2-acrylamido-2-methyl propane sulfonic acid in free acid form or as a salt of the free acid (AMPS); and b) the film has a harsh chemical dissolution time of less than about 80 seconds measured by the harsh chemical dissolution test method after 8 weeks.

Abstract: A water-soluble film which comprises a saceharide component and a vinyl alcohol resin component, where the vinyl alcohol resin may include functional comonomer units such as sulfonic acid functional groups or salts thereof. Preferred are polyvinyl alcohol/2-methylacrylamido-2 methyl propane sulfonic acid resins (PVOH/AMPS) which may be purchased commercially with relatively higher or relatively lower characteristic viscosity. The films exhibit superior resistance to aggressive oxidizing chemicals and remain soluble in water after prolonged exposure thereto. The films are particularly useful for unit-dose packaging of chlorine-containing pool chemicals, such as trichloroisocyanuric acid.

Abstract: The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer.

Abstract: A separator film for an electric battery is provided to substantially eliminate electric contact between an anode component and a cathode component. The film includes a vinyl alcohol copolymer with functional comonomer units such as sulfonic acid functionalized units or salts thereof. The films are desirable for use in battery separators because they exhibit superior resistance to degeneration by oxidation, enabling the manufacture of batteries with improved conductivity, longer discharge times, and longer cycle lives.

Abstract: In an aerosol spray composition suitable for coating automobile exteriors, where the aerosol composition is pressurized in a container with propellant and includes water and a polyvinyl alcohol composition, the improvement being that said polyvinyl alcohol composition includes: a) from 50 to 99 wt % of a partially hydrolyzing first polyvinyl alcohol resin having a degree of hydrolysis in the range of from about 80 to about 90 percent; and (b) from 1 to 50 wt % of a second polyvinyl alcohol resin having an elevated degree of hydrolysis.

Abstract: A chemical delivery product for delivering an oxidizing chemical into an aqueous system is disclosed. For instance, in one embodiment, a substrate containing an oxidizing chemical, such as trichloroisocyanuric acid, is coated with a water soluble polymer in order to prevent the oxidizing chemical from degrading prior to use and in order to facilitate handling. In accordance with the present disclosure, a neutralizing agent is contacted with the substrate in order to prevent the substrate from degrading the water soluble coating. In an alternative embodiment, a package is formed from a water soluble film forming composition combined with a base.

Abstract: Disclosed herein is a process to produce a film comprising poly(vinyl alcohol), wherein the poly(vinyl alcohol) solution has been purified utilizing an ion exchange resin. An approximate 50 micrometer thick film produced from the purified aqueous poly(vinyl alcohol) solution has an APHA color value of 50 or less after the film has been heated at 150° C. for 60 minutes.

Abstract: A water-soluble film which comprises a saccharide component and a vinyl alcohol resin component, where the vinyl alcohol resin may include functional comonomer units such as sulfonic acid functional groups or salts thereof. The films exhibit superior resistance to aggressive oxidizing chemicals and remain soluble in water after prolonged exposure thereto. The films are particularly useful for unit-dose packaging of chlorine-containing pool chemicals, such as trichloroisocyanuric acid.

Abstract: In an aerosol spray composition suitable for coating automobile exteriors, where the aerosol composition is pressurized in a container with propellant and includes water and a polyvinyl alcohol composition, the improvement being that said polyvinyl alcohol composition includes: a) from 50 to 99 wt. % of a partially hydrolyzing first polyvinyl alcohol resin having a degree of hydrolysis in the range of from about 80 to about 90 percent; and (b) from 1 to 50 wt. % of a second polyvinyl alcohol resin having an elevated degree of hydrolysis.

Abstract: Disclosed herein is a process to produce a film comprising poly(vinyl alcohol), wherein the poly(vinyl alcohol) solution has been purified utilizing an ion exchange resin. An approximate 50 micrometer thick film produced from the purified aqueous poly(vinyl alcohol) solution has an APHA color value of 50 or less after the film has been heated at 150° C. for 60 minutes.

Abstract: Water-soluble films useful for packaging and encapsulating various products are provided. The packaged and encapsulated products are released when the film dissolves in water. The films incorporate copolymers of vinyl alcohol units and sulfonic acid units at molecular weights and monomer incorporation levels providing improved water solubility characteristics in the presence of certain compounds, especially borate containing compounds. The films are particularly useful for packaging detergent products and encapsulating detergent component such as enzymes.

Abstract: The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer. Additionally, the present invention relates to methods by which to post-treat such photoresist compositions in order to obtain one or more of: (1) a reduction in optical density of the polymer composition; and (2) a reduction in the amount of residual metal and/or monomer in the polymer composition.

Abstract: A product comprising a cold water soluble film wherein: a) the film comprises a copolymer of vinyl alcohol (VOH) with a minor amount of 2-acrylamido-2-methyl propane sulfonic acid in free acid form or as a salt of the free acid (AMPS); and b) the film has a harsh chemical dissolution time of less than about 80 seconds measured by the harsh chemical dissolution test method after 8 weeks.

Abstract: The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer. Additionally, the present invention relates to methods by which to post-treat such photoresist compositions in order to obtain one or more of: (1) a reduction in optical density of the polymer composition; and (2) a reduction in the amount of residual metal and/or monomer in the polymer composition.