Patents by Inventor Richard W. Hsieh

Richard W. Hsieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus for distributing gas and liquid during concurrent gas/liquid backwash in filter underdrain flumes
    Patent number: 6312611
    Abstract: A concurrent backwash distribution apparatus for a filter having a filter tank and a plurality of underdrain laterals includes a baffle positioned in a common main conduit to define an auxiliary flume between the baffle and the underdrain laterals. The auxiliary flume is in fluid communication with the common main conduit and the underdrain laterals. The baffle has at least one flume liquid metering orifice preferably located near the bottom of the baffle so that it may be below a gas/liquid interface in the auxiliary flume during concurrent gas/liquid backwash operations. A flow distribution plate may be positioned between the auxiliary flume and the underdrain laterals, the flow distribution plate having at least one liquid metering orifice and at least one gas metering orifice. The baffle may take one of many forms. The baffle creates an adequate liquid pool in the common main conduit for low velocity flow of backwash liquid while at the same time providing uninhibited flow of backwash gas.
    Type: Grant
    Filed: January 29, 1998
    Date of Patent: November 6, 2001
    Assignee: The F.B. Leopold Co., Inc.
    Inventors: Eugene O. Bergman, Richard W. Hsieh, John Geibel
  • Apparatus for distributing gas and liquid during concurrent gas/liquid backwash in filter underdrain flumes
    Patent number: 6306310
    Abstract: A concurrent backwash distribution apparatus for a filter having a filter tank and a plurality of underdrain laterals includes a baffle positioned in a common main conduit to define an auxiliary flume between the baffle and the underdrain laterals. The auxiliary flume is in fluid communication with the common main conduit and the underdrain laterals. The baffle has at least one flume liquid metering orifice preferably located near the bottom of the baffle so that it may be below a gas/liquid interface in the auxiliary flume during concurrent gas/liquid backwash operations. A flow distribution plate may be positioned between the auxiliary flume and the underdrain laterals, the flow distribution plate having at least one liquid metering orifice and at least one gas metering orifice. The baffle may take one of many forms. The baffle creates an adequate liquid pool in the common main conduit for low velocity flow of backwash liquid while at the same time providing uninhibited flow of backwash gas.
    Type: Grant
    Filed: July 28, 2000
    Date of Patent: October 23, 2001
    Assignee: The F. B. Leopold Company, Inc.
    Inventors: Eugen O. Bergmann, Richard W. Hsieh, John Geibel