Abstract: A medical device includes a porous article of expanded polytetrafluoroethylene (ePTFE) having a microstructure of nodes interconnected by fibrils, and a coating including an antimicrobial material at the surface of the porous article, wherein the microstructure at a surface of the porous article is only partially coated with the antimicrobial material.

Abstract: An improved surgical implant, including dental implants, formed of Ti and its alloys and a process of its manufacture are disclosed. The improved surgical implant is designed to withstand fretting wear and abrasion occasioned by vibrating micromotion of the implant against the surrounding bone structure. Such micromotion has caused undesirable blackening in the surrounding tissue and has required premature replacement of the implant.

Abstract: A load-bearing plastic orthopaedic joint implant, formed aat least partially of UHMWPE or HDPE material, and a process of subjecting at least the load-bearing surface thereof to ion implantation so as to improve its surface characteristics are disclosed. Such improved surface characteristics result, inter alia, from the formation in the treated surfaces, of increased carbon to carbon bonds, diamond-like carbon chain scissions and wherein the implanted ions do not form precipitate chemical compounds with the plastic material.

Abstract: Improved methods for the treatment of spherical surfaces designed to improve their physical and chemical properties are disclosed. The methods include the provision of a fixture by which a plurality of spherical workpieces are presented to a treatment source in a way that their entire respective spherical surfaces are uniformly treated and to a uniform predetermined depth. The fixture is mounted for motion about two axes normal to each other. The methods include randomization of the motion about one of the two axes of motion by interrupting one of the two motions for a predetermined period of time. The treatment sources include: pulsed electron beam and light sources, plasma sources, reaction chambers for CVD or MOCVD, sputtering, sputter enhanced ion implantation sources and physical vapor deposition in conjunction with an ion beam source.

Abstract: An improved method and an apparatus for the ion implantation of spherical surfaces are disclosed. The method includes the provision of a revised fixture by which a plurality of spherical workpieces are presented to a large area ion beam in a way that their entire respective spherical surfaces are uniformly ion implanted to improve their surface characteristics. The fixture includes a disc mounted for motion about two axes normal to each other, a plurality of holes formed in a the disc loosely to accommodate therein a plurality of spherical workpieces, each of the plurality of holes formed with a spherical bottom and having a cleaning orifice, cooling means disposed on one side of the disc, a thermocouple operatively mounted in association with the disc, and a cover plate mounted on a second side of the disc and provided with a plurality of apertures concentric with the plurality of holes formed in the disc.

Abstract: An improved method and an apparatus for the ion implantation of spherical surfaces are disclosed. The method includes the provision of a revised fixture by which a plurality of spherical workpieces are presented to a large area ion beam in a way that their entire respective spherical surfaces are uniformly ion implanted to improve their surface characteristics. The fixture includes a disc mounted for motion about two axes normal to each other, a plurality of holes formed in a the disc loosely to accommodate therein a plurality of spherical workpieces, each of the plurality of holes formed with a spherical bottom and having a cleaning orifice, cooling means disposed on one side of the disc, a thermocouple operatively mounted in association with the disc, and a cover plate mounted on a second side of the disc and provided with a plurality of apertures concentric with the plurality of holes formed in the disc.

Abstract: An ion implantation process for plastics is disclosed which materially enhances their surface hardness and their resistance to chemical attack. The plastics include the polycarbonates, the acrylics and their combinations, and ultra high molecular weight polyethylenes. The plastics are ion implanted by energetic ions such as aluminum, magnesium, silicon, titanium, yttrium, fluorine and chlorine ions. Such ion implanted plastics, in their transparent form, find uses such as aircraft, spacecraft, auto transparencies, lenses for safety and eyeglasses and contact lenses, face and gas masks and the like. In their non-transparent form, the ion implanted plastics are useful as ball bearings, safety helmets, floor coverings, appliance and auto moldings and the like.