Patents by Inventor Richard WINPENNY
Richard WINPENNY has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230266665Abstract: The present invention relates to a resist composition, especially for use in the production of electronic components via electron beam lithography. In addition to the usual base polymeric component (resist polymer), a secondary electron generator is included in resist compositions of the invention in order to promote secondary electron generation. This unique combination of components increases the exposure sensitivity of resists in a controlled fashion which facilitates the effective production of high-resolution patterned substrates (and consequential electronic components), but at much higher write speeds.Type: ApplicationFiled: September 26, 2022Publication date: August 24, 2023Applicant: The University of ManchesterInventors: Scott Lewis, Stephen Yeates, Richard Winpenny
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Patent number: 11487199Abstract: The present invention relates to a resist composition, especially for use in the production of electronic components via electron beam lithography. In addition to the usual base polymeric component (resist polymer), a secondary electron generator is included in resist compositions of the invention in order to promote secondary electron generation. This unique combination of components increases the exposure sensitivity of resists in a controlled fashion which facilitates the effective production of high-resolution patterned substrates (and consequential electronic components), but at much higher write speeds.Type: GrantFiled: February 27, 2020Date of Patent: November 1, 2022Assignee: The University of ManchesterInventors: Scott Lewis, Stephen Yeates, Richard Winpenny
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Publication number: 20220179319Abstract: The present invention relates to resist compostions, in particular to photoresists that can be used in photolithography, especially in the fabrication of integrated circuits and derivative products. The resist compositions of the invention include an anti-scattering component which has a significant amount of empty space, and thus fewer scattering centers, such that radiation-scattering events are more limited during exposure. Such anti-scattering effects can lead to improved resolutions by reducing the usual proximity effects associated with lithographic techniques, allowing the production of smaller, higher resolution microchips. Furthermore, certain embodiments involve anti-scattering components which are directly linked to the resist components, which can improve the overall lithographic chemistry to provide benefits both in terms of resolution and resist sensitivity.Type: ApplicationFiled: July 23, 2021Publication date: June 9, 2022Applicant: The University of ManchesterInventors: Scott Lewis, Richard Winpenny, Stephen Yeates, Antonio Fernandez
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Patent number: 11143961Abstract: The present invention relates to resist compostions, in particular to photoresists that can be used in photolithography, especially in the fabrication of integrated circuits and derivative products. The resist compositions of the invention include an anti-scattering component which has a significant amount of empty space, and thus fewer scattering centers, such that radiation-scattering events are more limited during exposure. Such anti-scattering effects can lead to improved resolutions by reducing the usual proximity effects associated with lithographic techniques, allowing the production of smaller, higher resolution microchips. Furthermore, certain embodiments involve anti-scattering components which are directly linked to the resist components, which can improve the overall lithographic chemistry to provide benefits both in terms of resolution and resist sensitivity.Type: GrantFiled: September 29, 2016Date of Patent: October 12, 2021Assignee: The University of ManchesterInventors: Scott Lewis, Richard Winpenny, Stephen Yeates, Antonio Fernandez
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Publication number: 20200201174Abstract: The present invention relates to a resist composition, especially for use in the production of electronic components via electron beam lithography. In addition to the usual base polymeric component (resist polymer), a secondary electron generator is included in resist compositions of the invention in order to promote secondary electron generation. This unique combination of components increases the exposure sensitivity of resists in a controlled fashion which facilitates the effective production of high-resolution patterned substrates (and consequential electronic components), but at much higher write speeds.Type: ApplicationFiled: February 27, 2020Publication date: June 25, 2020Applicant: The University of ManchesterInventors: Scott Lewis, Stephen Yeates, Richard Winpenny
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Patent number: 10613441Abstract: The present invention relates to an electron beam (eBeam) resist composition, particularly an (eBeam) resist composition for use in the fabrication of integrated circuits. Such resist compositions include an anti-scattering compound which minimises scattering and secondary electron generation, thus affording extremely high resolution lithography. Such high resolution lithography may be used directly upon silicon-based substrates to produce integrated circuits, or may alternatively be used to produce a lithographic mask (e.g. photomask) to facilitate high-resolution lithography.Type: GrantFiled: November 20, 2018Date of Patent: April 7, 2020Assignee: The University of ManchesterInventors: Scott Lewis, Richard Winpenny, Stephen Yeates
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Patent number: 10599032Abstract: The present invention relates to a resist composition, especially for use in the production of electronic components via electron beam lithography. In addition to the usual base polymeric component (resist polymer), a secondary electron generator is included in resist compositions of the invention in order to promote secondary electron generation. This unique combination of components increases the exposure sensitivity of resists in a controlled fashion which facilitates the effective production of high-resolution patterned substrates (and consequential electronic components), but at much higher write speeds.Type: GrantFiled: March 24, 2015Date of Patent: March 24, 2020Assignee: The University of ManchesterInventors: Scott Lewis, Stephen Yeates, Richard Winpenny
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Publication number: 20190324370Abstract: The present invention relates to an electron beam (eBeam) resist composition, particularly an (eBeam) resist composition for use in the fabrication of integrated circuits. Such resist compositions include an anti-scattering compound which minimises scattering and secondary electron generation, thus affording extremely high resolution lithography. Such high resolution lithography may be used directly upon silicon-based substrates to produce integrated circuits, or may alternatively be used to produce a lithographic mask (e.g. photomask) to facilitate high-resolution lithography.Type: ApplicationFiled: November 20, 2018Publication date: October 24, 2019Applicant: The University of ManchesterInventors: Scott Lewis, Richard Winpenny, Stephen Yeates
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Patent number: 10234764Abstract: The present invention relates to an electron beam (eBeam) resist composition, particularly an (eBeam) resist composition for use in the fabrication of integrated circuits. Such resist compositions include an anti-scattering compound which minimizes scattering and secondary electron generation, thus affording extremely high resolution lithography. Such high resolution lithography may be used directly upon silicon-based substrates to produce integrated circuits, or may alternatively be used to produce a lithographic mask (e.g. photomask) to facilitate high-resolution lithography.Type: GrantFiled: July 30, 2015Date of Patent: March 19, 2019Assignee: The University of ManchesterInventors: Scott Lewis, Richard Winpenny, Stephen Yeates
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Kit, Composition and Method for Preparing a Specimen for Imaging and Method for Diagnosing a Disease
Publication number: 20180217033Abstract: The present invention relates to an imagable specimen sample, particularly an imagable histological sample for imaging via techniques such as scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The invention provides imaging preparation compositions, such as resin compositions, which can be embedded within a specimen sample and can also encapsulate the sample. The compositions contain either or both of a secondary electron generator and/or a self-healing component. The secondary electron generator enhances image quality by increasing the amount of secondary electron scattering. The self-healing component minimises specimen sample damage caused by the imaging technique.Type: ApplicationFiled: July 25, 2016Publication date: August 2, 2018Applicant: The University of ManchesterInventors: Stephen Yeates, Scott Lewis, Richard Winpenny -
Publication number: 20170235227Abstract: The present invention relates to an electron beam (eBeam) resist composition, particularly an (eBeam) resist composition for use in the fabrication of integrated circuits. Such resist compositions include an anti-scattering compound which minimises scattering and secondary electron generation, thus affording extremely high resolution lithography. Such high resolution lithography may be used directly upon silicon-based substrates to produce integrated circuits, or may alternatively be used to produce a lithographic mask (e.g. photomask) to facilitate high-resolution lithography.Type: ApplicationFiled: July 30, 2015Publication date: August 17, 2017Applicant: The University of ManchesterInventors: Scott Lewis, Richard Winpenny, Stephen Yeates
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Publication number: 20170123312Abstract: The present invention relates to a resist composition, especially for use in the production of electronic components via electron beam lithography. In addition to the usual base polymeric component (resist polymer), a secondary electron generator is included in resist compositions of the invention in order to promote secondary electron generation. This unique combination of components increases the exposure sensitivity of resists in a controlled fashion which facilitates the effective production of high-resolution patterned substrates (and consequential electronic components), but at much higher write speeds.Type: ApplicationFiled: March 24, 2015Publication date: May 4, 2017Applicant: The University of ManchesterInventors: Scott LEWIS, Stephen YEATES, Richard WINPENNY