Patents by Inventor Rick Daignault

Rick Daignault has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for calibration of optical signals in semiconductor process systems
    Patent number: 10365212
    Abstract: The disclosure provides an optical calibration device for in-chamber calibration of optical signals associated with a processing chamber, a characterization system for plasma processing chambers, methods of characterizing plasma processing chambers, and a chamber characterizer. In one example, the optical calibration device includes: (1) an enclosure, (2) an optical source located within the enclosure and configured to provide a source light having a continuous spectrum, and (3) optical shaping elements located within the enclosure and configured to form the source light into a calibrating light that approximates a plasma emission during an operation within the processing chamber.
    Type: Grant
    Filed: November 2, 2017
    Date of Patent: July 30, 2019
    Assignee: Verity Instruments, Inc.
    Inventors: Andrew Weeks Kueny, Mike Whelan, Mark Anthony Meloni, John D. Corless, Rick Daignault, Sean Lynes
  • SYSTEM AND METHOD FOR CALIBRATION OF OPTICAL SIGNALS IN SEMICONDUCTOR PROCESS SYSTEMS
    Publication number: 20180136118
    Abstract: The disclosure provides an optical calibration device for in-chamber calibration of optical signals associated with a processing chamber, a characterization system for plasma processing chambers, methods of characterizing plasma processing chambers, and a chamber characterizer. In one example, the optical calibration device includes: (1) an enclosure, (2) an optical source located within the enclosure and configured to provide a source light having a continuous spectrum, and (3) optical shaping elements located within the enclosure and configured to form the source light into a calibrating light that approximates a plasma emission during an operation within the processing chamber.
    Type: Application
    Filed: November 2, 2017
    Publication date: May 17, 2018
    Inventors: Andrew Weeks Kueny, Mike Whelan, Mark Anthony Meloni, John D. Corless, Rick Daignault, Sean Lynes