Patents by Inventor Rick W. Glew

Rick W. Glew has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for integrating optical devices in a single epitaxial growth step
    Patent number: 7060516
    Abstract: A method for integrating optical devices in a single growth step by utilizing a combination of Selective Area Growth and Etch (SAGE) is provided. An first device is formed between a set of oxide-masked regions, whilst a second device is formed in an adjacent planar region. By use of Selected Area Growth and Etch (SAGE), in which the growth between the oxide-masked regions is greater than the growth in the planar region, and in which the etch rate in the area between the oxide-masked regions is substantially the same as that in the planar region, the number of active quantum layers for the first device are formed between the oxide-masked regions, and a different number of layers for the second device is formed in the planar region.
    Type: Grant
    Filed: September 30, 2003
    Date of Patent: June 13, 2006
    Assignee: Bookham Technology, PLC
    Inventors: Rick W. Glew, Ian B. Betty, Jonathan Greenspan