Patents by Inventor Ricky Marsh
Ricky Marsh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230354502Abstract: A matchless plasma source is described. The matchless plasma source includes a controller that is coupled to a direct current (DC) voltage source of an agile DC rail to control a shape of an amplified square waveform that is generated at an output of a half-bridge transistor circuit. The matchless plasma source further includes the half-bridge transistor circuit used to generate the amplified square waveform to power an electrode, such as an antenna, of a plasma chamber. The matchless plasma source also includes a reactive circuit between the half-bridge transistor circuit and the electrode. The reactive circuit has a high-quality factor to negate a reactance of the electrode. There is no radio frequency (RF) match and an RF cable that couples the matchless plasma source to the electrode.Type: ApplicationFiled: June 23, 2023Publication date: November 2, 2023Inventors: Maolin Long, Yuhou Wang, Ricky Marsh, Alex Paterson
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Patent number: 11716805Abstract: A matchless plasma source is described. The matchless plasma source includes a controller that is coupled to a direct current (DC) voltage source of an agile DC rail to control a shape of an amplified square waveform that is generated at an output of a half-bridge transistor circuit. The matchless plasma source further includes the half-bridge transistor circuit used to generate the amplified square waveform to power an electrode, such as an antenna, of a plasma chamber. The matchless plasma source also includes a reactive circuit between the half-bridge transistor circuit and the electrode. The reactive circuit has a high-quality factor to negate a reactance of the electrode. There is no radio frequency (RF) match and an RF cable that couples the matchless plasma source to the electrode.Type: GrantFiled: December 21, 2021Date of Patent: August 1, 2023Assignee: Lam Research CorporationInventors: Maolin Long, Yuhou Wang, Ricky Marsh, Alex Paterson
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Publication number: 20220117074Abstract: A matchless plasma source is described. The matchless plasma source includes a controller that is coupled to a direct current (DC) voltage source of an agile DC rail to control a shape of an amplified square waveform that is generated at an output of a half-bridge transistor circuit. The matchless plasma source further includes the half-bridge transistor circuit used to generate the amplified square waveform to power an electrode, such as an antenna, of a plasma chamber. The matchless plasma source also includes a reactive circuit between the half-bridge transistor circuit and the electrode. The reactive circuit has a high-quality factor to negate a reactance of the electrode. There is no radio frequency (RF) match and an RF cable that couples the matchless plasma source to the electrode.Type: ApplicationFiled: December 21, 2021Publication date: April 14, 2022Inventors: Maolin Long, Yuhou Wang, Ricky Marsh, Alex Paterson
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Patent number: 11224116Abstract: A matchless plasma source is described. The matchless plasma source includes a controller that is coupled to a direct current (DC) voltage source of an agile DC rail to control a shape of an amplified square waveform that is generated at an output of a half-bridge transistor circuit. The matchless plasma source further includes the half-bridge transistor circuit used to generate the amplified square waveform to power an electrode, such as an antenna, of a plasma chamber. The matchless plasma source also includes a reactive circuit between the half-bridge transistor circuit and the electrode. The reactive circuit has a high-quality factor to negate a reactance of the electrode. There is no radio frequency (RF) match and an RF cable that couples the matchless plasma source to the electrode.Type: GrantFiled: April 20, 2020Date of Patent: January 11, 2022Assignee: Lam Research CorporationInventors: Maolin Long, Yuhou Wang, Ricky Marsh, Alex Paterson
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Publication number: 20200253034Abstract: A matchless plasma source is described. The matchless plasma source includes a controller that is coupled to a direct current (DC) voltage source of an agile DC rail to control a shape of an amplified square waveform that is generated at an output of a half-bridge transistor circuit. The matchless plasma source further includes the half-bridge transistor circuit used to generate the amplified square waveform to power an electrode, such as an antenna, of a plasma chamber. The matchless plasma source also includes a reactive circuit between the half-bridge transistor circuit and the electrode. The reactive circuit has a high-quality factor to negate a reactance of the electrode. There is no radio frequency (RF) match and an RF cable that couples the matchless plasma source to the electrode.Type: ApplicationFiled: April 20, 2020Publication date: August 6, 2020Inventors: Maolin Long, Yuhou Wang, Ricky Marsh, Alex Paterson
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Patent number: 10638593Abstract: A matchless plasma source is described. The matchless plasma source includes a controller that is coupled to a direct current (DC) voltage source of an agile DC rail to control a shape of an amplified square waveform that is generated at an output of a half-bridge transistor circuit. The matchless plasma source further includes the half-bridge transistor circuit used to generate the amplified square waveform to power an electrode, such as an antenna, of a plasma chamber. The matchless plasma source also includes a reactive circuit between the half-bridge transistor circuit and the electrode. The reactive circuit has a high-quality factor to negate a reactance of the electrode. There is no radio frequency (RF) match and an RF cable that couples the matchless plasma source to the electrode.Type: GrantFiled: March 18, 2019Date of Patent: April 28, 2020Assignee: Lam Research CorporationInventors: Maolin Long, Yuhou Wang, Ricky Marsh, Alex Paterson
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Publication number: 20190215942Abstract: A matchless plasma source is described. The matchless plasma source includes a controller that is coupled to a direct current (DC) voltage source of an agile DC rail to control a shape of an amplified square waveform that is generated at an output of a half-bridge transistor circuit. The matchless plasma source further includes the half-bridge transistor circuit used to generate the amplified square waveform to power an electrode, such as an antenna, of a plasma chamber. The matchless plasma source also includes a reactive circuit between the half-bridge transistor circuit and the electrode. The reactive circuit has a high-quality factor to negate a reactance of the electrode. There is no radio frequency (RF) match and an RF cable that couples the matchless plasma source to the electrode.Type: ApplicationFiled: March 18, 2019Publication date: July 11, 2019Inventors: Maolin Long, Yuhou Wang, Ricky Marsh, Alex Paterson
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Publication number: 20190116656Abstract: A matchless plasma source is described. The matchless plasma source includes a controller that is coupled to a direct current (DC) voltage source of an agile DC rail to control a shape of an amplified square waveform that is generated at an output of a half-bridge transistor circuit. The matchless plasma source further includes the half-bridge transistor circuit used to generate the amplified square waveform to power an electrode, such as an antenna, of a plasma chamber. The matchless plasma source also includes a reactive circuit between the half-bridge transistor circuit and the electrode. The reactive circuit has a high-quality factor to negate a reactance of the electrode. There is no radio frequency (RF) match and an RF cable that couples the matchless plasma source to the electrode.Type: ApplicationFiled: October 18, 2017Publication date: April 18, 2019Inventors: Maolin Long, Yuhou Wang, Ricky Marsh, Alex Paterson
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Patent number: 10264663Abstract: A matchless plasma source is described. The matchless plasma source includes a controller that is coupled to a direct current (DC) voltage source of an agile DC rail to control a shape of an amplified square waveform that is generated at an output of a half-bridge transistor circuit. The matchless plasma source further includes the half-bridge transistor circuit used to generate the amplified square waveform to power an electrode, such as an antenna, of a plasma chamber. The matchless plasma source also includes a reactive circuit between the half-bridge transistor circuit and the electrode. The reactive circuit has a high-quality factor to negate a reactance of the electrode. There is no radio frequency (RF) match and an RF cable that couples the matchless plasma source to the electrode.Type: GrantFiled: October 18, 2017Date of Patent: April 16, 2019Assignee: Lam Research CorporationInventors: Maolin Long, Yuhou Wang, Ricky Marsh, Alex Paterson
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Patent number: 10056231Abstract: A match circuit includes the following: a power input circuit coupled to an RF source; an inner coil input circuit coupled between the power input circuit and an input terminal of an inner coil, the inner coil input circuit including an inductor and a capacitor coupled in series to the inductor, the inductor connecting to the power input circuit, and the capacitor connecting to the input terminal of the inner coil, a first node being defined between the power input circuit and the inner coil input circuit; an inner coil output circuit coupled between an output terminal of the inner coil and ground, the inner coil output circuit defining a direct pass-through connection to ground; an outer coil input circuit coupled between the first node and an input terminal of an outer coil; and an outer coil output circuit coupled between an output terminal of the outer coil and ground.Type: GrantFiled: April 28, 2015Date of Patent: August 21, 2018Assignee: Lam Research CorporationInventors: Maolin Long, Ricky Marsh, Alex Paterson
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Patent number: 9978565Abstract: In one embodiment, a plasma processing device may include a dielectric window, a vacuum chamber, an energy source, and at least one air amplifier. The dielectric window may include a plasma exposed surface and an air exposed surface. The vacuum chamber and the plasma exposed surface of the dielectric window can cooperate to enclose a plasma processing gas. The energy source can transmit electromagnetic energy through the dielectric window and form an elevated temperature region in the dielectric window. The at least one air amplifier can be in fluid communication with the dielectric window. The at least one air amplifier can operate at a back pressure of at least about 1 in-H2O and can provide at least about 30 cfm of air.Type: GrantFiled: November 9, 2011Date of Patent: May 22, 2018Assignee: Lam Research CorporationInventors: Jon McChesney, Saravanapriyan Sriraman, Ricky Marsh, Alex Paterson, John Holland
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Publication number: 20160163569Abstract: A Faraday shield and a plasma processing chamber incorporating the Faraday shield is are provided. The plasma chamber includes an electrostatic chuck for receiving a substrate, a dielectric window connected to a top portion of the chamber, the dielectric window disposed over the electrostatic chuck, and a Faraday shield. The Faraday shield is disposed inside of the chamber and defined between the electrostatic chuck and the dielectric window. The Faraday shield includes an inner zone having an inner radius range that includes a first and second plurality of slots and an outer zone having an outer radius range that includes a third plurality of slots. The inner zone is adjacent to the outer zone. The Faraday shield also includes a band ring separating the inner zone and the outer zone, such that the first and second plurality of slots do not connect with the third plurality of slots.Type: ApplicationFiled: February 11, 2016Publication date: June 9, 2016Inventors: Maolin Long, Alex Paterson, Ricky Marsh, Ying Wu, John Drewery
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Patent number: 9293353Abstract: A Faraday shield and a plasma processing chamber incorporating the Faraday shield is are provided. The plasma chamber includes an electrostatic chuck for receiving a substrate, a dielectric window connected to a top portion of the chamber, the dielectric window disposed over the electrostatic chuck, and a Faraday shield. The Faraday shield is disposed inside of the chamber and defined between the electrostatic chuck and the dielectric window. The Faraday shield includes an inner zone having an inner radius range that includes a first and second plurality of slots and an outer zone having an outer radius range that includes a third plurality of slots. The inner zone is adjacent to the outer zone. The Faraday shield also includes a band ring separating the inner zone and the outer zone, such that the first and second plurality of slots do not connect with the third plurality of slots.Type: GrantFiled: October 23, 2012Date of Patent: March 22, 2016Assignee: Lam Research CorporationInventors: Maolin Long, Alex Paterson, Ricky Marsh, Ying Wu, John Drewery
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Publication number: 20150235810Abstract: A match circuit includes the following: a power input circuit coupled to an RF source; an inner coil input circuit coupled between the power input circuit and an input terminal of an inner coil, the inner coil input circuit including an inductor and a capacitor coupled in series to the inductor, the inductor connecting to the power input circuit, and the capacitor connecting to the input terminal of the inner coil, a first node being defined between the power input circuit and the inner coil input circuit; an inner coil output circuit coupled between an output terminal of the inner coil and ground, the inner coil output circuit defining a direct pass-through connection to ground; an outer coil input circuit coupled between the first node and an input terminal of an outer coil; and an outer coil output circuit coupled between an output terminal of the outer coil and ground.Type: ApplicationFiled: April 28, 2015Publication date: August 20, 2015Inventors: Maolin Long, Ricky Marsh, Alex Paterson
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Patent number: 9059678Abstract: A match circuit includes the following: a power input circuit coupled to an RF source; an inner coil input circuit coupled between the power input circuit and an input terminal of an inner coil, the inner coil input circuit including an inductor and a capacitor coupled in series to the inductor, the inductor connecting to the power input circuit, and the capacitor connecting to the input terminal of the inner coil, a first node being defined between the power input circuit and the inner coil input circuit; an inner coil output circuit coupled between an output terminal of the inner coil and ground, the inner coil output circuit defining a direct pass-through connection to ground; an outer coil input circuit coupled between the first node and an input terminal of an outer coil; and an outer coil output circuit coupled between an output terminal of the outer coil and ground.Type: GrantFiled: January 25, 2013Date of Patent: June 16, 2015Assignee: Lam Research CorporationInventors: Maolin Long, Ricky Marsh, Alex Paterson
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Publication number: 20130186568Abstract: A Faraday shield and a plasma processing chamber incorporating the Faraday shield is are provided. The plasma chamber includes an electrostatic chuck for receiving a substrate, a dielectric window connected to a top portion of the chamber, the dielectric window disposed over the electrostatic chuck, and a Faraday shield. The Faraday shield is disposed inside of the chamber and defined between the electrostatic chuck and the dielectric window. The Faraday shield includes an inner zone having an inner radius range that includes a first and second plurality of slots and an outer zone having an outer radius range that includes a third plurality of slots. The inner zone is adjacent to the outer zone. The Faraday shield also includes a band ring separating the inner zone and the outer zone, such that the first and second plurality of slots do not connect with the third plurality of slots.Type: ApplicationFiled: October 23, 2012Publication date: July 25, 2013Inventors: Maolin Long, Alex Paterson, Ricky Marsh, Ying Wu, John Drewery
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Publication number: 20130135058Abstract: A match circuit includes the following: a power input circuit coupled to an RF source; an inner coil input circuit coupled between the power input circuit and an input terminal of an inner coil, the inner coil input circuit including an inductor and a capacitor coupled in series to the inductor, the inductor connecting to the power input circuit, and the capacitor connecting to the input terminal of the inner coil, a first node being defined between the power input circuit and the inner coil input circuit; an inner coil output circuit coupled between an output terminal of the inner coil and ground, the inner coil output circuit defining a direct pass-through connection to ground; an outer coil input circuit coupled between the first node and an input terminal of an outer coil; and an outer coil output circuit coupled between an output terminal of the outer coil and ground.Type: ApplicationFiled: January 25, 2013Publication date: May 30, 2013Inventors: Maolin Long, Ricky Marsh, Alex Paterson
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Publication number: 20130087283Abstract: In one embodiment, a plasma processing device may include a dielectric window, a vacuum chamber, an energy source, and at least one air amplifier. The dielectric window may include a plasma exposed surface and an air exposed surface. The vacuum chamber and the plasma exposed surface of the dielectric window can cooperate to enclose a plasma processing gas. The energy source can transmit electromagnetic energy through the dielectric window and form an elevated temperature region in the dielectric window. The at least one air amplifier can be in fluid communication with the dielectric window. The at least one air amplifier can operate at a back pressure of at least about 1 in-H2O and can provide at least about 30 cfm of air.Type: ApplicationFiled: November 9, 2011Publication date: April 11, 2013Applicant: LAM RESEARCH CORPORATIONInventors: Jon McChesney, Saravanapriyan Sriraman, Ricky Marsh, Alex Paterson, John Holland
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Patent number: 6553853Abstract: A probe for measuring properties of plasma includes a shell, a contact extending through the shell and having a first connecting portion positioned in the shell, and a connector guide attached to a second connecting portion, the second connecting portion being detachably coupled to the first connecting portion. In another embodiment, a probe for measuring properties of plasma includes a shell, a contact extending through the shell, wiring extending from the contact and along an interior of the shell, and a coolant inlet line for injecting coolant into the interior of the shell for cooling the wiring. A method for cooling wiring positioned in an interior of a probe includes providing a coolant inlet line for injecting coolant into the interior of the probe and inserting the coolant inlet line in the interior of the probe such that the coolant cools the wiring.Type: GrantFiled: January 25, 2002Date of Patent: April 29, 2003Assignee: Lam Research CorporationInventors: Ricky Marsh, Stanley Siu
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Publication number: 20020066323Abstract: A probe for measuring properties of plasma includes a shell, a contact extending through the shell and having a first connecting portion positioned in the shell, and a connector guide attached to a second connecting portion, the second connecting portion being detachably coupled to the first connecting portion. In another embodiment, a probe for measuring properties of plasma includes a shell, a contact extending through the shell, wiring extending from the contact and along an interior of the shell, and a coolant inlet line for injecting coolant into the interior of the shell for cooling the wiring. A method for cooling wiring positioned in an interior of a probe includes providing a coolant inlet line for injecting coolant into the interior of the probe and inserting the coolant inlet line in the interior of the probe such that the coolant cools the wiring.Type: ApplicationFiled: January 25, 2002Publication date: June 6, 2002Applicant: Lam Research CorporationInventors: Ricky Marsh, Stanley Siu