Patents by Inventor Rie Kato

Rie Kato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20260262013
    Abstract: An information processing system includes a server and a user terminal, wherein the server includes circuitry configured to cause the user terminal to display, on one screen, data from a satellite, the data being current position information of the satellite with respect to Earth and at least one of measurement data or video data.
    Type: Application
    Filed: February 27, 2026
    Publication date: September 3, 2026
    Inventors: Kosuke OGURA, Rie KATO, Keiichiro SHIMADA
  • Publication number: 20260261331
    Abstract: An information processing system includes a server and a user terminal, wherein the server includes circuitry configured to acquire data from a satellite, the data being at least one of measurement data or video data, transmit the data acquired from the satellite to the user terminal, acquire, from the user terminal, an instruction specifying one or more conditions, the one or more conditions being at least one of a measurement condition or a video-recording condition for the satellite, and transmit the instruction specifying the one or more conditions acquired from the user terminal to the satellite.
    Type: Application
    Filed: February 27, 2026
    Publication date: September 3, 2026
    Inventors: Keiichiro SHIMADA, Takashi IMAIZUMI, Masaru MORIZANE, Kosuke OGURA, Ryo MASUZAWA, Rie KATO, Kentaro MIURA, Hajime KUGE
  • Patent number: 5869390
    Abstract: Disclosed is a method of forming electrodes on diamond comprising the steps of: forming a mask pattern on diamond or diamond film; performing a treatment of the diamond surface by a plasma of inert gases; forming an electrode film on the whole surface of the specimen; and removing the mask, thereby forming a specified pattern of the electrodes. By this method, it is possible to form electrodes having high adhesion to diamond and diamond film for electronic devices.
    Type: Grant
    Filed: June 9, 1997
    Date of Patent: February 9, 1999
    Assignee: Kabushiki Kaisha Kobe Seiko Sho
    Inventors: Kozo Nishimura, Koji Kobashi, Shigeaki Miyauchi, Rie Kato, Hisashi Koyama, Kimitsugu Saito
  • Patent number: 5770467
    Abstract: Disclosed is a method of forming electrodes on diamond comprising the steps of: forming a mask pattern on diamond or diamond film; performing a treatment of the diamond surface by a plasma of inert gases; forming an electrode film on the whole surface of the specimen; and removing the mask, thereby forming a specified pattern of the electrodes. By this method, it is possible to form electrodes having high adhesion to diamond and diamond film for electronic devices.
    Type: Grant
    Filed: March 29, 1996
    Date of Patent: June 23, 1998
    Assignee: Kabushiki Kaisha Kobe Seiko Sho
    Inventors: Kozo Nishimura, Koji Kobashi, Shigeaki Miyauchi, Rie Kato, Hisashi Koyama, Kimitsugu Saito
  • Patent number: 5432357
    Abstract: A pair of electrodes 3 are first formed on a substrate. Subsequently, an undoped diamond film is selectively deposited between the above electrodes. A B-doped diamond film is then selectively formed on both the insulating diamond film and part of each electrode. The substrate may be contained in a container provided with an opening portion from which only the B-doped diamond film is exposed.
    Type: Grant
    Filed: July 25, 1994
    Date of Patent: July 11, 1995
    Assignee: Kabushiki Kaisha Kobe Seiko Sho
    Inventors: Rie Kato, Koji Kobashi
  • Patent number: 5358754
    Abstract: A method for forming diamond films by vapor phase synthesis comprising a process of forming the diamond films on a substrate by direct current discharge plasma, in an atmosphere of a reaction gas including a gas containing at least carbon and hydrogen, or in an atmosphere of a mixed gas containing at least a carbon-containing gas and a hydrogen gas, at a gas pressure between 0.1 and 5 Torr and a substrate temperature between 300.degree. and 1000.degree. C.
    Type: Grant
    Filed: July 6, 1992
    Date of Patent: October 25, 1994
    Assignee: Kabushiki Kaisha Kobe Seiko Sho
    Inventors: Koji Kobashi, Shigeaki Miyauchi, Kozo Nishimura, Kazuo Kumagai, Rie Kato
  • Patent number: D1139033
    Type: Grant
    Filed: August 22, 2025
    Date of Patent: August 4, 2026
    Assignee: Innovative Space Carrier Inc.
    Inventors: Kosuke Ogura, Rie Kato
  • Patent number: D1142117
    Type: Grant
    Filed: December 10, 2025
    Date of Patent: August 18, 2026
    Assignee: Innovative Space Carrier Inc.
    Inventors: Kosuke Ogura, Rie Kato, Keiichiro Shimada