Patents by Inventor Rie OGAWA

Rie OGAWA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180284039
    Abstract: Once the relative positions of an X-ray source and a detector are changed by a moving mechanism, a holding state changing mechanism changes the state where a sample is held by a sample holding portion in conjunction with the change such that a sample surface is arranged in an arc shape along the circumference of a focal circle. Accordingly, the sample surface can be along the circumference of the focal circle even when the size of the focal circle changes. As a result, the occurrence of an error in X-ray intensity can be prevented when an X-ray diffracted on the sample surface is detected by the detector, and accurate diffraction information can be obtained.
    Type: Application
    Filed: March 26, 2018
    Publication date: October 4, 2018
    Applicant: Shimadzu Corporation
    Inventor: Rie OGAWA