Patents by Inventor Rieko Nakano

Rieko Nakano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9408812
    Abstract: Disclosed are: a coenzyme Q10 composition for oral ingestion which improves the bioabsorbability of coenzyme Q10 and enables efficient ingestion of coenzyme Q10 and which is highly safe, and a pharmaceutical preparation and a functional food containing the composition for oral ingestion. Combining coenzyme Q10 and a seed processed product has made it possible to provide a coenzyme Q10-containing composition for oral ingestion excellent in bioabsorbability, and a pharmaceutical preparation and a functional food containing the composition for oral ingestion.
    Type: Grant
    Filed: September 12, 2014
    Date of Patent: August 9, 2016
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Rieko Nakano, Midori Kikuchi, Kentarou Takano
  • Publication number: 20140377242
    Abstract: Disclosed are: a coenzyme Q10 composition for oral ingestion which improves the bioabsorbability of coenzyme Q10 and enables efficient ingestion of coenzyme Q10 and which is highly safe, and a pharmaceutical preparation and a functional food containing the composition for oral ingestion. Combining coenzyme Q10 and a seed processed product has made it possible to provide a coenzyme Q10-containing composition for oral ingestion excellent in bioabsorbability, and a pharmaceutical preparation and a functional food containing the composition for oral ingestion.
    Type: Application
    Filed: September 12, 2014
    Publication date: December 25, 2014
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Rieko NAKANO, Midori Kikuchi, Kentarou Takano
  • Patent number: 8466326
    Abstract: Disclosed are a production method for a ubiquinone powder for use in preparations, including Step 1 of compression molding a ubiquinone crystal powder at a linear molding pressure of from 0.6 to 2.5 tons/cm to obtain a compressed fragment; and Step 2 of grinding the compressed fragment obtained in Step 1 to obtain a powder; and a ubiquinone powder for use in preparations, which is obtained by the subject production method. According to the subject production method, it becomes possible to provide a ubiquinone powder for use in preparations for medicines and health foods, which has a high bulk density, a small angle of repose and excellent handling properties and fluidity, without using an additive such as an excipient, a binder and the like.
    Type: Grant
    Filed: March 29, 2010
    Date of Patent: June 18, 2013
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Takafumi Yoshimura, Rieko Nakano, Masayuki Furutani, Takeshi Uchiho
  • Publication number: 20120059194
    Abstract: Disclosed are a production method for a ubiquinone powder for use in preparations, including Step 1 of compression molding a ubiquinone crystal powder at a linear molding pressure of from 0.6 to 2.5 tons/cm to obtain a compressed fragment; and Step 2 of grinding the compressed fragment obtained in Step 1 to obtain a powder; and a ubiquinone powder for use in preparations, which is obtained by the subject production method. According to the subject production method, it becomes possible to provide a ubiquinone powder for use in preparations for medicines and health foods, which has a high bulk density, a small angle of repose and excellent handling properties and fluidity, without using an additive such as an excipient, a binder and the like.
    Type: Application
    Filed: March 29, 2010
    Publication date: March 8, 2012
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Takafumi Yoshimura, Rieko Nakano, Masayuki Furutani, Takeshi Uchiho
  • Publication number: 20110311504
    Abstract: Disclosed are: a coenzyme Q10 composition for oral ingestion which improves the bioabsorbability of coenzyme Q10 and enables efficient ingestion of coenzyme Q10 and which is highly safe, and a pharmaceutical preparation and a functional food containing the composition for oral ingestion. Combining coenzyme Q10 and a seed processed product has made it possible to provide a coenzyme Q10-containing composition for oral ingestion excellent in bioabsorbability, and a pharmaceutical preparation and a functional food containing the composition for oral ingestion.
    Type: Application
    Filed: February 26, 2010
    Publication date: December 22, 2011
    Applicant: MITSUBISHI GAS CHEMICAL, COMPANY, INC.
    Inventors: Rieko Nakano, Midori Kikuchi, Kentarou Takano
  • Patent number: 8022233
    Abstract: An efficient process for producing glycidyl 2-hydroxyisobutyrate useful as a reactive diluent is provided. When glycidyl 2-hydroxyisobutyrate is produced by reacting allyl 2-hydroxyisobutyrate with hydrogen peroxide, a solution in which allyl 2-hydroxyisobutyrate is dissolved in an aliphatic ester as a solvent is reacted with hydrogen peroxide in the presence of a crystalline titanosilicate catalyst. Thus, a production process of glycidyl 2-hydroxyisobutyrate, which is small in degradation of purity and yield due to generation of peroxides or the like, and products thereof are provided.
    Type: Grant
    Filed: June 30, 2006
    Date of Patent: September 20, 2011
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Rieko Nakano, Masaki Takemoto, Yoshikazu Shima
  • Publication number: 20090030163
    Abstract: An efficient process for producing glycidyl 2-hydroxyisobutyrate useful as a reactive diluent is provided. When glycidyl 2-hydroxyisobutyrate is produced by reacting allyl 2-hydroxyisobutyrate with hydrogen peroxide, a solution in which allyl 2-hydroxyisobutyrate is dissolved in an aliphatic ester as a solvent is reacted with hydrogen peroxide in the presence of a crystalline titanosilicate catalyst. Thus, a production process of glycidyl 2-hydroxyisobutyrate, which is small in degradation of purity and yield due to generation of peroxides or the like, and products thereof are provided.
    Type: Application
    Filed: June 30, 2006
    Publication date: January 29, 2009
    Applicant: Mitsubishi Gas Chemical Co. Inc.
    Inventors: Rieko Nakano, Masaki Takemoto, Yoshikazu Shima
  • Patent number: 6462005
    Abstract: A cleaning agent for use in the manufacture of a semiconductor device comprising an aqueous solution containing a quarternary ammonium salt and a fluoro compound, or an aqueous solution containing a quarternary ammonium salt and a fluoro compound, as well as an organic solvent selected from the group consisting of amides, lactones, nitriles, alcohols and esters. In the semiconductor device manufacturing process, after forming a mask with a photoresist, a wiring structure is formed by dry etching of a conductive layer, wherein a protecting deposition film has been formed on side walls of the conductive layer. Use of the cleaning agent enables the protecting deposition film to be removed in a highly reliable manner with the surface of the conductive layer being decontaminated and cleaned such that no corrosion of the conductive layer occurs.
    Type: Grant
    Filed: January 5, 1995
    Date of Patent: October 8, 2002
    Assignees: Texas Instruments Incorporated, Mitsubishi Gas Chemical Company, Inc.
    Inventors: Hideto Gotoh, Tetsuo Aoyama, Rieko Nakano, Hideki Fukuda
  • Patent number: 6124501
    Abstract: A process for preparing lactamide with a high conversion and a high selectivity without the deterioration of a catalytic activity in a short time, which comprises subjecting lactonitrile to a hydrating reaction in the presence of (A) a catalyst including an oxide of manganese as a main component, (B) an oxidizing agent and (C) hydrogen cyanide or hydrogen cyanide and a compound represented by the formula ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 are each a hydrogen atom, a C.sub.1 to C.sub.8 alkyl group, a C.sub.1 to C.sub.8 hyroxyalkyl group, a C.sub.1 to C.sub.8 aminoalkyl group or a C.sub.1 to C.sub.8 halogenoalkyl group.
    Type: Grant
    Filed: March 3, 1999
    Date of Patent: September 26, 2000
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Yuichi Sugano, Takafumi Abe, Rieko Nakano
  • Patent number: 5630904
    Abstract: Stripping and cleaning agent for removing dry-etching photoresist residues, and a method for forming an aluminum based line pattern using the stripping and cleaning agent. The stripping and cleaning agent contains (a) from 5 to 50% by weight of an organocarboxlic ammonium salt or an amine carboxylate, represented by the formula [R.sup.1 ]m[COONH.sub.p (R.sup.2)q]n, where R.sup.1 is hydrogen, or an alkyl or aryl group having from 1 to 18 carbon atoms; R.sup.2 is hydrogen, or an alkyl group having from 1 to 4 carbon atoms; m and n independently are integers of from 1 to 4, p is integer of from 1 to 4, q is integer of from 1 to 3, and p+q=4 and (b) from 0.5 to 15% by weight of a fluorine compound. The inventive method is advantageously applied to treating a dry-etched semiconductor substrate with the stripping and cleaning agent. The semiconductor substrate comprises a semiconductor wafer having thereon a conductive layer containing aluminum.
    Type: Grant
    Filed: March 27, 1995
    Date of Patent: May 20, 1997
    Assignees: Mitsubishi Gas Chemical Co., Inc., Sharp Kabushiki Kaisha
    Inventors: Tetsuo Aoyama, Rieko Nakano, Akira Ishihama, Koichiro Adachi
  • Patent number: 5436364
    Abstract: A process for producing dimethyl 2,6-naphthalene-dicarboxylate by reacting 2,6-naphthalene-dicarboxylic acid with methanol which comprises effecting the reaction at 200.degree. to 350.degree. C. in the presence of trimethyl trimellitate as an essential solvent and optionally, at least one solvent selected from methyl benzoate, methyl toluate and dimethyl o-phthalate preferably by at least two-stage continuous reaction method. The above process is capable of enhancing the rate of esterification reaction and producing purified objective product in high yield for a long period of time in a stable operation without causing any operational trouble such as corrosion and clogging the production equipment.
    Type: Grant
    Filed: June 22, 1994
    Date of Patent: July 25, 1995
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Seiji Uchiyama, Hiroshi Machida, Rieko Nakano, Ryuji Hasemi
  • Patent number: 5106462
    Abstract: Process for producing a copper plated resin article by forming a uniform copper coating having excellent adhesive strength on a fiber-reinforced or unreinforced thermoplastic or thermosetting resin article having a heat deformation temperature higher than 165.degree. C. The resin article is heated along with a source of copper formate under a reduced pressure or in a non-oxidative atmosphere to a temperature in the range above 165.degree. C. but lower than the heat deformation temperature of the resin article. The process makes it possible to produce a resin article having formed thereon a copper layer having an excellent adhesive strength by a very simple manner, and the resin article thus obtained can be used in various industrial fields.
    Type: Grant
    Filed: November 7, 1989
    Date of Patent: April 21, 1992
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Takamasa Kawakami, Rieko Nakano, Kazuhiro Ando, Ryuji Fujiura
  • Patent number: 5094686
    Abstract: A process for producing a copper fine powder, which comprises thermally decomposing anhydrous copper formate in a solid phase in a non-oxidizing atmosphere at a temperature in the range of from 150.degree. to 300.degree. C., thereby yielding a copper fine powder having a primary particle diameter of from 0.2 to 1 .mu.m, a specific surface area of from 5 to 0.5 m.sup.2 /g and small agglomerating properties, said anhydrous copper formate being an anhydrous copper formate powder 90 wt % or more of which undergoes thermal decomposition within a temperature range of from 160.degree. to 200.degree. C. when the anhydrous copper formate powder is heated in a nitrogen or hydrogen gas atmosphere at a heating rate of 3.degree. C./min.
    Type: Grant
    Filed: September 11, 1990
    Date of Patent: March 10, 1992
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Takamasa Kawakami, Satoru Makinose, Kazuhiro Ando, Rieko Nakano
  • Patent number: 5093510
    Abstract: A process for producing copper formate, which comprises subjecting methyl formate to a liquid-phase hydrolysis reaction at a temperature from 60 to 85.degree. C. in the presence of copper carbonate.
    Type: Grant
    Filed: December 5, 1990
    Date of Patent: March 3, 1992
    Assignee: Mitsubishi Gas Chemical Co., Ltd.
    Inventors: Takamasa Kawakami, Ryuji Fujiura, Kazuhiro Ando, Rieko Nakano
  • Patent number: 4613490
    Abstract: Fine silicon nitride powders, fine silicon carbide powders, or fine powdery mixture of silicon nitride and silicon carbide are prepared by vapor phase reaction of an aminosilane compound, a cyanosilane compound, a silazane compound, an alkoxysilane compound or a siloxane compound and heat treatment of the resulting fine powders in a non-oxidizing gas atmosphere.
    Type: Grant
    Filed: May 2, 1985
    Date of Patent: September 23, 1986
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Takashi Suzuki, Takamasa Kawakami, Rieko Nakano, Takeshi Koyama, Kansei Izaki, Akira Mori, Masami Orisaku
  • Patent number: 4594330
    Abstract: Fine spherical amorphous powder represented by the general formula:SiCxNyHzwherein 0.1<x<2.0, 0.1<y<1.5 and 0<z<4, is prepared by vapor phase oxidation of organosilicon compound substantially free from halogen atoms and oxygen atoms. An ultimately crystalline, uniform and fine powder of silicon nitride and silicon carbide is prepared by heat treatment of the fine spherical amorphous powder. The powder and the crystalline uniform, and fine powder are used as raw materials for composite ceramics and as functional materials for solar cell.
    Type: Grant
    Filed: March 15, 1985
    Date of Patent: June 10, 1986
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Takashi Suzuki, Takamasa Kawakami, Takeshi Koyama, Masami Orisaku, Kansei Izaki, Rieko Nakano, Akira Mori
  • Patent number: 4465872
    Abstract: p-Cresol is produced in one step by direct oxidation of p-tolualdehyde with a peroxide in formic acid as a solvent while keeping 3 to 15% by weight of water in formic acid on the basis of formic acid and a reaction temperature in a range of 50.degree. to 150.degree. C.
    Type: Grant
    Filed: June 23, 1982
    Date of Patent: August 14, 1984
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Takashi Suzuki, Shoichiro Hashimoto, Masami Orisaku, Rieko Nakano
  • Patent number: 4444738
    Abstract: A process for producing a crystalline aluminosilicate which comprises hydrothermally reacting a starting mixture composed of a silicon compound, an aluminum compound, an alkali metal compound, a compound capable of releasing an organic cation in water, and water, characterized in that said starting mixture comprises at least two colloids having different silicon/aluminum atomic ratios, and that the hydrothermal reaction is carried out, as required, in the presence of a fluorine compound.
    Type: Grant
    Filed: November 23, 1981
    Date of Patent: April 24, 1984
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Takashi Suzuki, Shoichiro Hashimoto, Rieko Nakano