Abstract: The deep red light-emitting magnesium fluorogermanate phosphor prepared by calcining a mixture comprising a fine magnesium oxide powder having a BET specific surface area in the range of 5-200 m2/g, a fluorine compound, a germanium compound and a manganese compound gives a light emission having a maximum peak of increased strength in the wavelength region of 640-680 nm upon excitation with a light having a wavelength of 400 nm.

Abstract: A solid light-emitting device comprising a light-emitting semiconductor element and a phosphor dispersed in a sealant, in which the phosphor is exited by the light emitted by the semiconductor element to emit a visible light of a wavelength differing from that of the light emitted by the semiconductor element and is a silicate phosphor or a phosphor having a hydroxyl group on its surface, and the sealant is a condensation product of a prepolymer produced by condensation of polydimethyl-siloxane having a silanol group at both ends and an oligomer of an alkoxide of a metal or a semimetal or its derivative.

Abstract: An acicular strontium carbonate fine powder having a mean length of 150 nm or less and a mean aspect ratio of 1.5 or more and containing acicular strontium carbonate particles having a length of 200 nm or more in an amount of 5% or less in terms of number of acicular particles is improved in its dispersibility in hydrophobic organic solvent by treating the acicular strontium carbonate fine powder with a combination of polycarboxylic acid having a side chain of a polyoxyalkylene group or its anhydride and amine having a polyoxyalkylene group and a hydrocarbyl group.

Abstract: A solid light-emitting device comprising a light-emitting semiconductor element and a phosphor dispersed in a sealant, in which the phosphor is exited by the light emitted by the semiconductor element to emit a visible light of a wavelength differing from that of the light emitted by the semiconductor element and is a silicate phosphor or a phosphor having a hydroxyl group on its surface, and the sealant is a condensation product of a prepolymer produced by condensation of polydimethyl-siloxane having a silanol group at both ends and an oligomer of an alkoxide of a metal or a semimetal or its derivative.

Abstract: A phosphor mixture comprising at least two phosphors A, B which give an emission spectrum having the maximum emission peak in the visible region, in which a wavelength of the maximum emission peak of the phosphor A differs from that of the maximum emission peak of the phosphor B by not more than 50 nm, and in which the maximum emission peak of the phosphor A has an emission intensity less than that of the phosphor B and the maximum emission peak of the phosphor A shows a half-width more than a half-width of that of the phosphor B gives an light emission having the maximum emission peak whose emission intensity is higher than that of the phosphor A and whose half-width is broader than that of the phosphor B.

Abstract: The deep red light-emitting magnesium fluorogermanate phosphor prepared by calcining a mixture comprising a fine magnesium oxide powder having a BET specific surface area in the range of 5-200 m2/g, a fluorine compound, a germanium compound and a manganese compound gives a light emission having a maximum peak of increased strength in the wavelength region of 640-680 nm upon excitation with a light having a wavelength of 400 nm.

Abstract: A photosensitive resin composition for an interlayer insulating film or a protective film of a substrate for circuit formation, which includes a polymer (a) having a structural unit shown by the formula (A) and a compound (b) which generates a radical when irradiated with active rays and has a structure shown by the following formula (B).

Abstract: A photosensitive resin composition for an interlayer insulating film or a protective film of a substrate for circuit formation, which includes a polymer (a) having a structural unit shown by the formula (A) and a compound (b) which generates a radical when irradiated with active rays and has a structure shown by the following formula (B).

Abstract: A photosensitive resin composition for an interlayer insulating film or a protective film of a substrate for circuit formation, which includes a polymer (a) having a structural unit shown by the formula (A) and a compound (b) which generates a radical when irradiated with active rays and has a structure shown by the following formula (B).

Abstract: To provide a photosensitive resin composition in which a hardened film obtained from the photosensitive resin composition has properties comparable to those of a film hardened at a high temperature, a method for manufacturing a patterned hardened film using the photosensitive resin composition, and an electronic part. The photosensitive resin composition includes (a) a polybenzoxazole precursor having a repeating unit represented by a general formula (I): wherein U and V represent a divalent organic group, and at least one of U and V is a group containing an aliphatic chain structure having 1 to 30 carbon atoms; (b) a photosensitizer; (c) a solvent; and (d) a crosslinking agent capable of causing crosslinking or polymerization by heating.

Abstract: A photosensitive resin composition for an interlayer insulating film or a protective film of a substrate for circuit formation, which includes a polymer (a) having a structural unit shown by the formula (A) and a compound (b) which generates a radical when irradiated with active rays and has a structure shown by the following formula (B).

Abstract: To provide a photosensitive resin composition in which a hardened film obtained from the photosensitive resin composition has properties comparable to those of a film hardened at a high temperature, a method for manufacturing a patterned hardened film using the photosensitive resin composition, and an electronic part. The photosensitive resin composition includes (a) a polybenzoxazole precursor having a repeating unit represented by a general formula (I): wherein U and V represent a divalent organic group, and at least one of U and V is a group containing an aliphatic chain structure having 1 to 30 carbon atoms; (b) a photosensitizer; (c) a solvent; and (d) a crosslinking agent capable of causing crosslinking or polymerization by heating.