Abstract: A rubber bale including a modified conjugated diene-based polymer, and a surfactant having a hydrophilic-lipophilic balance (HLB) of 9.0 or less. A method for producing a rubber bale, including mixing a polymer solution containing a modified conjugated diene-based polymer dissolved in a solvent and a surfactant having a HLB of 9.0 or less to form a solution, and removing the solvent from the solution.

Abstract: Provided is a polymer composition containing (A) a modified conjugated diene-based polymer which includes a monomer unit derived from a conjugated diene compound and has a molecular weight distribution Mw/Mn of 1.50 to 3.00 and in which some or all of the molecules are modified, the molecular weight distribution being represented by a ratio of polystyrene-equivalent weight-average molecular weight Mw to number-average molecular weight Mn measured by gel permeation chromatography, and (B) a surfactant having HLB of 9.0 or less and having an oxypropylene group, the polymer composition further containing (C) an extender oil as an optional component, in which a total amount of the modified conjugated diene-based polymer (A), the surfactant (B) and the extender oil (C) is 95 mass % or more based on the entire composition.

Abstract: This polymer composition includes: a modified conjugated diene-based polymer having at least one nitrogen-containing functional group selected from the group consisting of a primary amino group, a secondary amino group, a tertiary amino group, a primary amino group having been protected or converted into an onium group, a secondary amino group having been protected or converted into an onium group, and a tertiary amino group having been converted into an onium group; and a functional-group-containing polymer having at least one functional group selected from the group consisting of an epoxy group, an acid anhydride structure, an oxazoline group, a hydroxyl group, a carboxyl group, and a sulfo group.

Abstract: A production process of a rubber composition containing a modified conjugated diene-based polymer, which can provide a rubber composition in which processability is excellent, and a filling agent, when contained, has favorable dispersibility therein. The production process of the rubber composition includes: a first step of kneading a modified conjugated diene-based polymer that is obtained by polymerizing a monomer containing a conjugated diene compound and has at least one nitrogen-containing functional group selected from a primary amino group, a secondary amino group, a tertiary amino group and groups in which these amino groups have been converted into an onium group, and a basic compound having an acid dissociation constant of 8.0 or more; and a second step of kneading the kneaded product obtained in the first step and a cross-linking agent.

Abstract: Provided is a composition for a fiber-reinforced resin, for producing a fiber-reinforced resin capable of providing a formed article excellent in mechanical strength (e.g., impact resistance and flexural strength). The composition for a fiber-reinforced resin includes a block polymer (A), and a polymer (B) including at least one functional group selected from the group consisting of an epoxy group, an oxazoline group, and an acid anhydride structure.

Abstract: The present invention has as its object the provision of a production process of a rubber composition containing a modified conjugated diene-based polymer, which can provide a rubber composition in which processability is excellent, and a filling agent, when contained, has favorable dispersibility therein. The production process of a rubber composition according to the present invention includes: a first step of kneading a modified conjugated diene-based polymer that is obtained by polymerizing a monomer containing a conjugated diene compound and has at least one nitrogen-containing functional group selected from the group consisting of a primary amino group, a secondary amino group, a tertiary amino group and groups in which these amino groups have been converted into an onium group, and a basic compound having an acid dissociation constant of 8.0 or more; and a second step of kneading the kneaded product obtained in the first step and a cross-linking agent.

Abstract: A polyurethane is produced by reacting a mixture including at least (A) a diisocyanate, (B) a polyol, and (C) a chain extender, the polyol (B) having the number average molecular weight of 400 to 5000, the chain extender (C) including (C1) a compound shown by the following general formula (1) and (C2) a compound shown by the following general formula (2), the compound (C1) and the compound (C2) having a number average molecular weight of less than 400, and a ratio “M1/(M1+M2)” calculated by using the number of moles (M1) of the compound (C1) and the number of moles (M2) of the compound (C2) being 0.25 to 0.9.

Abstract: A composition for forming a chemical mechanical polishing pad having polishing characteristics such as a high polishing rate, an excellent planarity of the polished object, and less scratches of the polished object. The composition includes (A) a polyurethane having a carbon-carbon double bond on a side chain and (B) a cross-linking agent. The polyurethane (A) is preferably a thermoplastic polyurethane (A?) obtained by mixing at least components (a11) to (a13) and component (a2) in a proportion satisfying the following conditions (1) and (2) and reacting them.

Abstract: A polyurethane is produced by reacting a mixture including at least (A) a diisocyanate, (B) a polyol, and (C) a chain extender, the polyol (B) having the number average molecular weight of 400 to 5000, the chain extender (C) including (C1) a compound shown by the following general formula (1) and (C2) a compound shown by the following general formula (2), the compound (C1) and the compound (C2) having a number average molecular weight of less than 400, and a ratio “M1/(M1+M2)” calculated by using the number of moles (M1) of the compound (C1) and the number of moles (M2) of the compound (C2) being 0.25 to 0.9.

Abstract: The present invention relates to polishing pads, including at least 60 to 99 parts by weight of a polymer matrix (A) having 1,2-polybutadiene; and 1 to 40 parts by weight of component (B) having a copolymer having a polyether block, where the total amount of the polishing pad is 100 parts by mass, polymer matrix (A) includes 1,2-polybutadiene in an amount of at least 60 parts by weight, relative to 100 parts by mass of the polishing pad, component (B) includes the copolymer having a polyether block in an amount of at most 40 parts by weight relative to 100 parts by mass of the polishing pad, and the polishing pads have a surface resistivity of 2.6×107 to 9.9×1013?.

Abstract: There is provided a method for producing a chemical mechanical polishing pad, the method comprising the steps of (1) producing a sheet-shaped polymer molded article and (2) irradiating the sheet-shaped polymer molded article with an electron beam within an irradiation dose of 10 to 400 kGy. A chemical mechanical polishing pad produced by the above method has advantages that it is excellent in removal rate and scratches and in-plane uniformity on a polished surface and that it shows a stable removal rate even when polishing a number of objects to be polished successively.

Abstract: Provided is a composition for forming a polishing layer of a chemical mechanical polishing pad having polishing characteristics such as a high polishing rate, an excellent planarity of the polished object and less scratches of the polished object. The above composition for forming a polishing layer of a chemical mechanical polishing pad comprises (A) a polyurethane having a carbon-carbon double bond on a side chain and (B) a cross-linking agent.

Abstract: There is provided a method for producing a chemical mechanical polishing pad, the method comprising the steps of (1) producing a sheet-shaped polymer molded article and (2) irradiating the sheet-shaped polymer molded article with an electron beam within an irradiation dose of 10 to 400 kGy. A chemical mechanical polishing pad produced by the above method has advantages that it is excellent in removal rate and scratches and in-plane uniformity on a polished surface and that it shows a stable removal rate even when polishing a number of objects to be polished successively.

Abstract: A chemical mechanical polishing pad which provides a high removal rate, can suppress the production of a scratch on the polished surface completely and can achieve high in-plane uniformity in the amount of polishing of the polished surface. The chemical mechanical polishing pad has a surface resistivity of its polishing layer of 1.0×107 to 9.9×1013?. The polishing layer is made of a composition containing (A) a polymer matrix component having a volume resistivity of 1.0×1013 to 9.9×1017 ?·cm and (B) a component having a volume resistivity of 1.0×106 to 9.9×1012 ?·cm.