Abstract: To provide a novel polymer capable of reducing sublimate during film formation and a composition comprising the same. The polymer (A) according to the present invention comprises at least one structural unit selected from the group consisting of Unit (a), Unit (b), Unit (c) and Unit (d) having certain structures, wherein, na, nb, nc and nd, which are the numbers of repetition respectively of Units (a), (b), (c) and (d), satisfy the following formulae: na+nb>0, nc?0 and nd?0.

Abstract: To provide a polysiloxane composition capable of suppressing the generation of voids when forming a siliceous film. A polysiloxane composition comprising a polysiloxane; a dicarboxylic acid having the first acid dissociation constant pKa1 of 4.0 or less and represented by the following formula (II): HOOC-L-COOH (II) (wherein, L is a single bond, a hydroxy-substituted or amino-substituted alkylene having 1 to 6 carbon atoms, a substituted or unsubstituted alkenylene having 2 to 4 carbon atoms, a substituted or unsubstituted alkynylene having 2 to 4 carbon atoms, or a substituted or unsubstituted arylene having 6 to 10 carbon atoms); and a solvent.

Abstract: To provide a siloxazane compound capable of shortening the time of a siliceous film producing process and a composition comprising the same. A siloxazane compound having a specific structure, wherein the ratio of the number of O atoms to the total number of O atoms and N atoms is 5% or more and 25% or less, and in the spectrum of the siloxazane compound obtained by 29Si-NMR in accordance with the inverse gate decoupling method, the ratio of the area of the peak detected in ?75 ppm to ?90 ppm is 4.0% or less to the area of the peak detected in ?25 ppm to ?55 ppm; and a composition comprising the same.

Abstract: To provide a siloxazane compound capable of shortening the time of a siliceous film producing process and a composition comprising the same. A siloxazane compound having a specific structure, wherein the ratio of the number of O atoms to the total number of O atoms and N atoms is 5% or more and 25% or less, and in the spectrum of the siloxazane compound obtained by 29Si-NMR in accordance with the inverse gate decoupling method, the ratio of the area of the peak detected in ?75 ppm to ?90 ppm is 4.0% or less to the area of the peak detected in ?25 ppm to ?55 ppm; and a composition comprising the same.