Patents by Inventor Rikio Tomiyoshi
Rikio Tomiyoshi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8153996Abstract: A pattern forming apparatus using lithography technique includes a stage configured to allow a target object to be placed thereon; a plurality of columns configured to form patterns on the target object by using a charged particle beam while moving relatively to the stage; a pattern forming rule setting unit configured to set a pattern forming rule depending on a position of broken one of the plurality of columns; a region setting unit configured to set regions so that unbroken ones of the plurality of columns respectively form a pattern in one of the regions; a plurality of control circuits each configured to control any one of the plurality of columns different from others of the plurality of columns controlled by others of the plurality of control circuits; and a pattern forming data processing unit configured to perform a converting process on pattern forming data for the regions set to output a corresponding data generated by the converting process to the control circuit of a corresponding one of the unbType: GrantFiled: August 26, 2009Date of Patent: April 10, 2012Assignee: NuFlare Technology, Inc.Inventors: Takayuki Abe, Rikio Tomiyoshi, Hiroshi Nozue
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Publication number: 20100072403Abstract: A pattern forming apparatus using lithography technique includes a stage configured to allow a target object to be placed thereon; a plurality of columns configured to form patterns on the target object by using a charged particle beam while moving relatively to the stage; a pattern forming rule setting unit configured to set a pattern forming rule depending on a position of broken one of the plurality of columns; a region setting unit configured to set regions so that unbroken ones of the plurality of columns respectively form a pattern in one of the regions; a plurality of control circuits each configured to control any one of the plurality of columns different from others of the plurality of columns controlled by others of the plurality of control circuits; and a pattern forming data processing unit configured to perform a converting process on pattern forming data for the regions set to output a corresponding data generated by the converting process to the control circuit of a corresponding one of the unbType: ApplicationFiled: August 26, 2009Publication date: March 25, 2010Applicant: NuFlare Technology, Inc.Inventors: Takayuki ABE, Rikio TOMIYOSHI, Hiroshi NOZUE
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Patent number: 7526352Abstract: A semiconductor production system has a semiconductor manufacturing apparatus having an exposure unit, a control unit for controlling the exposure unit and a storage device; a semiconductor inspection apparatus having an observation unit, a control unit for controlling the observation unit and a storage device; and a storage device commonly used by the semiconductor manufacturing apparatus and the semiconductor inspection apparatus. The manufacturing apparatus, the inspection apparatus and the commonly used storage device are interconnected via a storage area network. With the semiconductor manufacturing apparatus and the storage device linked together via the storage area network, a large volume of image data or design data can be communicated at high speed, thus improving the system throughput.Type: GrantFiled: January 23, 2008Date of Patent: April 28, 2009Assignee: Hitachi, Ltd.Inventors: Hidemitsu Naya, Rikio Tomiyoshi, Shigeo Moriyama, Mutsumi Kikuchi, Kotaro Shimamura
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Publication number: 20080125903Abstract: A semiconductor production system has a semiconductor manufacturing apparatus having an exposure unit, a control unit for controlling the exposure unit and a storage device; a semiconductor inspection apparatus having an observation unit, a control unit for controlling the observation unit and a storage device; and a storage device commonly used by the semiconductor manufacturing apparatus and the semiconductor inspection apparatus. The manufacturing apparatus, the inspection apparatus and the commonly used storage device are interconnected via a storage area network. With the semiconductor manufacturing apparatus and the storage device linked together via the storage area network, a large volume of image data or design data can be communicated at high speed, thus improving the system throughput.Type: ApplicationFiled: January 23, 2008Publication date: May 29, 2008Inventors: Hidemitsu Naya, Rikio Tomiyoshi, Shigeo Moriyama, Mutsumi Kikuchi, Kotaro Shimamura
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Patent number: 7218985Abstract: A semiconductor manufacturing apparatus includes: a calculation unit having at least one computer for processing semiconductor design information; a control unit for controlling radiation of an electron in accordance with a processing result of the semiconductor design information; a writing unit for radiating an electron in accordance with instructions of the control unit; and at least one storage device. The semiconductor manufacturing apparatus permits a communication between the storage device, the calculation unit, the control unit, and the writing unit. The semiconductor manufacturing apparatus further includes a communication pass through which the storage device can be controlled.Type: GrantFiled: March 8, 2006Date of Patent: May 15, 2007Assignee: Hitachi High-Technologies CorporationInventors: Hidemitsu Naya, Koji Hashimoto, Masamichi Kawano, Rikio Tomiyoshi
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Patent number: 7177718Abstract: A semiconductor production system has storage devices for storage of all kinds of information including, but not limited to, the information concerning semiconductor design and information as to semiconductor manufacture along with information relating to semiconductor inspection processes, while representing as a class an instance added with meta data indicative of the role of the information in accordance with a logical expressive form. The system has a network for the storage device use, called the storage area network or “SAN”. The SAN is for interconnection between respective ones of the storage devices, semiconductor manufacturing apparatuses and a semiconductor inspection apparatus. The storage devices are seamlessly accessible from any one of the semiconductor manufacture apparatuses and the semiconductor inspection apparatus and also from a semiconductor design environment associated therewith.Type: GrantFiled: July 31, 2006Date of Patent: February 13, 2007Assignee: Hitachi High-Technologies CorporationInventors: Hidemitsu Naya, Rikio Tomiyoshi
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Publication number: 20070027569Abstract: A semiconductor production system has a semiconductor manufacturing apparatus having an exposure unit, a control unit for controlling the exposure unit and a storage device; a semiconductor inspection apparatus having an observation unit, a control unit for controlling the observation unit and a storage device; and a storage device commonly used by the semiconductor manufacturing apparatus and the semiconductor inspection apparatus. The manufacturing apparatus, the inspection apparatus and the commonly used storage device are interconnected via a storage area network. With the semiconductor manufacturing apparatus and the storage device linked together via the storage area network, a large volume of image data or design data can be communicated at high speed, thus improving the system throughput.Type: ApplicationFiled: October 5, 2006Publication date: February 1, 2007Inventors: Hidemitsu Naya, Rikio Tomiyoshi, Shigeo Moriyama, Mutsumi Kikuchi, Kotaro Shimamura
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Publication number: 20060265099Abstract: A semiconductor production system has storage devices for storage of all kinds of information including, but not limited to, the information concerning semiconductor design and information as to semiconductor manufacture along with information relating to semiconductor inspection processes, while representing as a class an instance added with meta data indicative of the role of the information in accordance with a logical expressive form. The system has a network for the storage device use, called the storage area network or “SAN”. The SAN is for interconnection between respective ones of the storage devices, semiconductor manufacturing apparatuses and a semiconductor inspection apparatus. The storage devices are seamlessly accessible from any one of the semiconductor manufacture apparatuses and the semiconductor inspection apparatus and also from a semiconductor design environment associated therewith.Type: ApplicationFiled: July 31, 2006Publication date: November 23, 2006Applicant: Hitachi High-Technologies CorporationInventors: Hidemitsu Naya, Rikio Tomiyoshi
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Patent number: 7099733Abstract: A semiconductor production system has storage devices for storage of all kinds of information including, but not limited to, the information concerning semiconductor design and information as to semiconductor manufacture along with information relating to semiconductor inspection processes, while representing as a class an instance added with meta data indicative of the role of the information in accordance with a logical expressive form. The system has a network for the storage device use, called the storage area network or “SAN”. The SAN is for interconnection between respective ones of the storage devices, semiconductor manufacturing apparatuses and a semiconductor inspection apparatus. The storage devices are seamlessly accessible from any one of the semiconductor manufacture apparatuses and the semiconductor inspection apparatus and also from a semiconductor design environment associated therewith.Type: GrantFiled: July 12, 2004Date of Patent: August 29, 2006Assignee: Hitachi High-Technologies CorporationInventors: Hidemitsu Naya, Rikio Tomiyoshi
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Publication number: 20060155414Abstract: A semiconductor manufacturing apparatus includes: a calculation unit having at least one computer for processing semiconductor design information; a control unit for controlling radiation of an electron in accordance with a processing result of the semiconductor design information; a writing unit for radiating an electron in accordance with instructions of the control unit; and at least one storage device. The semiconductor manufacturing apparatus permits a communication between the storage device, the calculation unit, the control unit, and the writing unit. The semiconductor manufacturing apparatus further includes a communication pass through which the storage device can be controlled.Type: ApplicationFiled: March 8, 2006Publication date: July 13, 2006Inventors: Hidemitsu Naya, Koji Hashimoto, Masamichi Kawano, Rikio Tomiyoshi
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Patent number: 7027888Abstract: A semiconductor manufacturing apparatus includes: a calculation unit having at least one computer for processing semiconductor design information; a control unit for controlling radiation of an electron in accordance with a processing result of the semiconductor design information; a writing unit for radiating an electron in accordance with instructions of the control unit; and at least one storage device. The semiconductor manufacturing apparatus permits a communication between the storage device, the calculation unit, the control unit, and the writing unit. The semiconductor manufacturing apparatus further includes a communication pass through which the storage device can be controlled.Type: GrantFiled: July 21, 2005Date of Patent: April 11, 2006Assignee: Hitachi High-Technologies CorporationInventors: Hidemitsu Naya, Koji Hashimoto, Masamichi Kawano, Rikio Tomiyoshi
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Publication number: 20060033050Abstract: In the case of drawing an oblique figure pattern, when drawing an oblique figure by using a slender rectangular beam, a problem occurs that edge roughness occurs at an oblique-side portion to deteriorate the drawing accuracy. The present invention solves the above problem and provides an electron-beam drawing apparatus and an electron-beam drawing method capable of accurately drawing even an oblique figure. A first rectangular aperture and a second parallelogrammatic aperture are used and a variable parallelogrammatic electron beam formed by two apertures is used to draw a desired pattern on the surface of a sample. Moreover, oblique-side-portion-contour decomposition means is used to draw an oblique-side portion by a variable parallelogram and the inside of an oblique side by a triangle and a quadrangle (rectangle).Type: ApplicationFiled: October 18, 2005Publication date: February 16, 2006Inventors: Kimiaki Ando, Haruo Yoda, Rikio Tomiyoshi, Masamichi Kawano
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Publication number: 20050270857Abstract: A semiconductor manufacturing apparatus includes: a calculation unit having at least one computer for processing semiconductor design information; a control unit for controlling radiation of an electron in accordance with a processing result of the semiconductor design information; a writing unit for radiating an electron in accordance with instructions of the control unit; and at least one storage device. The semiconductor manufacturing apparatus permits a communication between the storage device, the calculation unit, the control unit, and the writing unit. The semiconductor manufacturing apparatus further includes a communication pass through which the storage device can be controlled.Type: ApplicationFiled: July 21, 2005Publication date: December 8, 2005Inventors: Hidemitsu Naya, Koji Hashimoto, Masamichi Kawano, Rikio Tomiyoshi
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Patent number: 6941186Abstract: A semiconductor manufacturing apparatus includes: a calculation unit having at least one computer for processing semiconductor design information; a control unit for controlling radiation of an electron in accordance with a processing result of the semiconductor design information; a writing unit for radiating an electron in accordance with instructions of the control unit; and at least one storage device. The semiconductor manufacturing apparatus permits a communication between the storage device, the calculation unit, the control unit, and the writing unit. The semiconductor manufacturing apparatus further includes a communication pass through which the storage device can be controlled.Type: GrantFiled: July 23, 2003Date of Patent: September 6, 2005Assignee: Hitachi High-Technologies CorporationInventors: Hidemitsu Naya, Koji Hashimoto, Masamichi Kawano, Rikio Tomiyoshi
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Publication number: 20050119843Abstract: A semiconductor production system has a semiconductor manufacturing apparatus having an exposure unit, a control unit for controlling the exposure unit and a storage device; a semiconductor inspection apparatus having an observation unit, a control unit for controlling the observation unit and a storage device; and a storage device commonly used by the semiconductor manufacturing apparatus and the semiconductor inspection apparatus. The manufacturing apparatus, the inspection apparatus and the commonly used storage device are interconnected via a storage area network. With the semiconductor manufacturing apparatus and the storage device linked together via the storage area network, a large volume of image data or design data can be communicated at high speed, thus improving the system throughput.Type: ApplicationFiled: December 22, 2004Publication date: June 2, 2005Inventors: Hidemitsu Naya, Rikio Tomiyoshi, Shigeo Moriyama, Mutsumi Kikuchi, Kotaro Shimamura
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Patent number: 6850854Abstract: A semiconductor production system has a semiconductor manufacturing apparatus having an exposure unit, a control unit for controlling the exposure unit and a storage device; a semiconductor inspection apparatus having an observation unit, a control unit for controlling the observation unit and a storage device; and a storage device commonly used by the semiconductor manufacturing apparatus and the semiconductor inspection apparatus. The manufacturing apparatus, the inspection apparatus and the commonly used storage device are interconnected via a storage area network. With the semiconductor manufacturing apparatus and the storage device linked together via the storage area network, a large volume of image data or design data can be communicated at high speed, thus improving the system throughput.Type: GrantFiled: May 27, 2003Date of Patent: February 1, 2005Assignee: Hitachi, Ltd.Inventors: Hidemitsu Naya, Rikio Tomiyoshi, Shigeo Moriyama, Mutsumi Kikuchi, Kotaro Shimamura
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Publication number: 20050015165Abstract: A semiconductor production system has storage devices for storage of all kinds of information including, but not limited to, the information concerning semiconductor design and information as to semiconductor manufacture along with information relating to semiconductor inspection processes, while representing as a class an instance added with meta data indicative of the role of the information in accordance with a logical expressive form. The system has a network for the storage device use, called the storage area network or “SAN”. The SAN is for interconnection between respective ones of the storage devices, semiconductor manufacturing apparatuses and a semiconductor inspection apparatus. The storage devices are seamlessly accessible from any one of the semiconductor manufacture apparatuses and the semiconductor inspection apparatus and also from a semiconductor design environment associated therewith.Type: ApplicationFiled: July 12, 2004Publication date: January 20, 2005Inventors: Hidemitsu Naya, Rikio Tomiyoshi
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Publication number: 20040178366Abstract: In the case of drawing an oblique figure pattern, when drawing an oblique figure by using a slender rectangular beam, a problem occurs that edge roughness occurs at an oblique-side portion to deteriorate the drawing accuracy. The present invention solves the above problem and provides an electron-beam drawing apparatus and an electron-beam drawing method capable of accurately drawing even an oblique figure.Type: ApplicationFiled: March 23, 2004Publication date: September 16, 2004Applicant: Hitachi, Ltd.Inventors: Kimiaki Ando, Haruo Yoda, Rikio Tomiyoshi, Masamichi Kawano
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Publication number: 20040125355Abstract: A semiconductor manufacturing apparatus includes: a calculation unit having at least one computer for processing semiconductor design information; a control unit for controlling radiation of an electron in accordance with a processing result of the semiconductor design information; a writing unit for radiating an electron in accordance with instructions of the control unit; and at least one storage device. The semiconductor manufacturing apparatus permits a communication between the storage device, the calculation unit, the control unit, and the writing unit. The semiconductor manufacturing apparatus further includes a communication pass through which the storage device can be controlled.Type: ApplicationFiled: July 23, 2003Publication date: July 1, 2004Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Hidemitsu Naya, Koji Hashimoto, Masamichi Kawano, Rikio Tomiyoshi
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Publication number: 20030220754Abstract: A semiconductor production system has a semiconductor manufacturing apparatus having an exposure unit, a control unit for controlling the exposure unit and a storage device; a semiconductor inspection apparatus having an observation unit, a control unit for controlling the observation unit and a storage device; and a storage device commonly used by the semiconductor manufacturing apparatus and the semiconductor inspection apparatus. The manufacturing apparatus, the inspection apparatus and the commonly used storage device are interconnected via a storage area network. With the semiconductor manufacturing apparatus and the storage device linked together via the storage area network, a large volume of image data or design data can be communicated at high speed, thus improving the system throughput.Type: ApplicationFiled: May 27, 2003Publication date: November 27, 2003Applicant: Hitachi, Ltd.Inventors: Hidemitsu Naya, Rikio Tomiyoshi, Shigeo Moriyama, Mutsumi Kikuchi, Kotaro Shimamura