Abstract: A method for producing an acid generator including reacting a carboxylic acid represented by Formula (d0-1) having a pKa of 0.50 or more with at least one of a nitrogen-containing base compound and an onium compound to obtain an intermediate represented by Formula (d0-p), and subjecting the intermediate (d0-p) to an ion exchange reaction with a compound represented by Formula (c0) to obtain a compound represented by Formula (d0). In the formulae, X0 represents a bromine atom or an iodine atom, Rm represents a hydroxy group, nb1 represents an integer in a range of 1 to 5, 1?nb1+nb2?5 is satisfied, Yd represents a divalent linking group or a single bond, Mpm?+ represents an organic ammonium cation having a logPOW of 4.8 or less or an onium cation having a logPOW of 4.8 or less, X? represents a counter anion, and Mm+ represents an onium cation.

Abstract: A resist composition containing a resin component (A1) and a photodecomposable base (D0) represented by General Formula (d0) that generates a carboxylic acid having a pKa of 0.50 or more as a generated acid.

Abstract: A resist composition that contains a resin component having a constitutional unit containing an acid-dissociable group represented by General Formula (a01-r) below and contains an acid generator component containing a compound represented by General Formula (b0) below. In General Formula (a01-r), Ra01 and Ra02 represent a saturated aliphatic hydrocarbon group, Ra01 and Ra02 may be bonded to each other to form an alicyclic group. Ra03 to Ra05 represent an aliphatic hydrocarbon group and two or more of Ra03 to Ra05 may be bonded to each other to form an alicyclic group.

Abstract: A block copolymer including a first block consisting of a polymer having a repeating structure of a structural unit (u1) containing no silicon atom, and a second block consisting of a polymer having a repeating structure of a structural unit (u2) containing a silicon atom, the second block containing a block (b21) consisting of a polymer having a repeating structure of a structural unit (u21) represented by general formula (u2-1) shown below, and the volume ratio of the first block, based on all blocks constituting the block copolymer being 42 to 44 vol %: In which RP211 represents an alkyl group, a halogenated alkyl group, a hydrogen atom, or an organic group having a polar group; and RP212 is a group derived from a compound represented by formula SHRt1, wherein Rt1 represents a hydrocarbon group having 1 to 5 carbon atoms optionally having a substituent.

Abstract: A resist composition that contains a resin component having a constitutional unit represented by General Formula (a0-1) and a compound (B1) represented by General Formula (b0), in which Ra01 represents a hydrocarbon group; Ya02 represents a single bond or a divalent linking group; Ra02 represents a hydrogen atom, a hydroxy group, or a hydrocarbon group; Ar represents a benzene ring or a naphthalene ring; Ra01 and Ra02 may be bonded to each other to form a ring with a secondary carbon atom to which Ra01 and Ya02 are bonded, Ya02, a carbon atom of Ar, to which Ya02 is bonded, and a carbon atom of Ar, to which Ra02 is bonded; n01 represents an integer in a range of 1 to 6; Rb1 represents a fluorine atom or a trifluoromethyl group

Abstract: A resist composition that contains a resin component having a constitutional unit represented by General Formula (a0-1) and contains a photodecomposable base in which an acid dissociation constant of a conjugate acid is 4.

Abstract: A resist composition containing a resin component that exhibits changed solubility in a developing solution under action of acid and a photodecomposable base that controls the diffusion of the acid generated upon exposure, the resin component has a constitutional unit represented by General Formula (a0-1), and the photodecomposable base has an anion moiety and a cation moiety, where the energy of LUMO of the cation moiety is ?4.

Abstract: A block copolymer including a first block consisting of a polymer having a repeating structure of a structural unit (u1) containing no silicon atom, and a second block consisting of a polymer having a repeating structure of a structural unit (u2) containing a silicon atom, the second block containing a block (b21) consisting of a polymer having a repeating structure represented by general formula (u2-1), and a block (b22) consisting of a polymer having a repeating structure of a structural unit (u22) containing a silicon atom, and the block (b22) is positioned between the first block and the block (b21) (wherein RP211 represents an alkyl group, a halogenated alkyl group, a hydrogen atom, or an organic group having a polar group; and RP212 represents an organic group having a polar group).

Abstract: A resist composition which contains a resin component (A1) having a constitutional unit (a01) represented by General Formula (a01-1) and a constitutional unit (a02) represented by General Formula (a02-1), in which a content of an acid generator component (B) is 20 parts by mass or more and a content of a photodegradable base component (D1) is 5 parts by mass or more, in Formula (a01-1), Ra01 represents an aromatic hydrocarbon group which may have a substituent, Ra02 and Ra03 each independently represent a hydrocarbon group which may have a substituent, and Ra02 and Ra03 may be bonded to each other to form a ring, in Formula (a02-1), Wax0 represents a divalent aromatic hydrocarbon group

Abstract: A block copolymer including a first block and a second block, the first block consisting of a polymer (P1) having a repeating structure of a structural unit (u1) containing in a side chain thereof a hyperbranched structure containing a silicon atom.

Abstract: A resist composition including a base component (A) and an acid-generator component (B), the base component (A) including a resin component (A1) including a structural unit (a0) represented by formula (a0-1), the amount of the structural unit (a0) within the resin component (A1), based on the combined total (100 mol %) of all structural units constituting the resin component (A1) being 58 to 80 mol % (in the formula, Ra01 represents an aromatic hydrocarbon group; Ra02 and Ra03 each independently represents a hydrocarbon group, provided that Ra02 and Ra03 may be mutually bonded to form a ring

Abstract: A block copolymer including a first block consisting of a polymer having a repeating structure of a structural unit (u1) containing no silicon atom, and a second block consisting of a polymer having a repeating structure of a structural unit (u2) containing a silicon atom, the second block containing a block (b21) consisting of a polymer having a repeating structure of a structural unit (u21) represented by general formula (u2-1) shown below, and the volume ratio of the first block, based on all blocks constituting the block copolymer being 42 to 44 vol %: In which RP211 represents an alkyl group, a halogenated alkyl group, a hydrogen atom, or an organic group having a polar group; and RP212 is a group derived from a compound represented by formula SHRt1, wherein Rt1 represents a hydrocarbon group having 1 to 5 carbon atoms optionally having a substituent.

Abstract: A block copolymer including a first block consisting of a polymer having a repeating structure of a structural unit (u1) containing no silicon atom, and a second block consisting of a polymer having a repeating structure of a structural unit (u2) containing a silicon atom, the second block containing a block (b21) consisting of a polymer having a repeating structure represented by general formula (u2-1), and a block (b22) consisting of a polymer having a repeating structure of a structural unit (u22) containing a silicon atom, and the block (b22) is positioned between the first block and the block (b21) (wherein RP211 represents an alkyl group, a halogenated alkyl group, a hydrogen atom, or an organic group having a polar group; and RP212 represents an organic group having a polar group).

Abstract: A block copolymer including a first block and a second block, the first block consisting of a polymer (P1) having a repeating structure of a structural unit (u1) containing in a side chain thereof a hyperbranched structure containing a silicon atom.