Patents by Inventor Rina Maeda

Rina Maeda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11957796
    Abstract: The present invention provides isolated nanosheets each of which includes a plurality of pseudo-polyrotaxanes and which are easily isolated without adhering to each other. The present invention provides an isolated nanosheet including a plurality of pseudo-polyrotaxanes each having one or more first cyclic molecules and a linear molecule included in a cavity or cavities of the first cyclic molecules in a skewered manner, wherein the linear molecules include, as part thereof, first linear molecules each having an ionizable group that ionizes in water or an aqueous solution.
    Type: Grant
    Filed: July 10, 2019
    Date of Patent: April 16, 2024
    Assignee: THE UNIVERSITY OF TOKYO
    Inventors: Kohzo Ito, Rina Maeda, Shuntaro Uenuma
  • Publication number: 20230123626
    Abstract: The present invention provides a crosslinked polymer composition exhibiting significantly improved elongation at break over conventional ones, and a polymer composition and a polyrotaxane, each of which can be used as a raw material of the crosslinked polymer composition. The polyrotaxane contains a linear molecule, a cyclic molecule, and a blocking group, wherein the cyclic molecule has a hydrosilyl group. The polymer composition contains the polyrotaxane and a polymer, wherein the polymer has a double bond on at least either a main chain or a side chain. The crosslinked polymer composition is produced by crosslinking of the polymer composition through chemical reaction between the hydrosilyl group of the cyclic molecule and the double bond of the polymer.
    Type: Application
    Filed: December 2, 2020
    Publication date: April 20, 2023
    Inventors: Takanori NAKAI, Naoki IWASE, Naoyuki AKAHORI, Hideyuki IMAI, Hidekazu KURIMOTO, Makoto ISHIDA, Kohzo ITO, Rina MAEDA, Shota ANDO, Katsunari INOUE
  • Publication number: 20210338597
    Abstract: The present invention provides isolated nanosheets each of which includes a plurality of pseudo-polyrotaxanes and which are easily isolated without adhering to each other. The present invention provides an isolated nanosheet including a plurality of pseudo-polyrotaxanes each having one or more first cyclic molecules and a linear molecule included in a cavity or cavities of the first cyclic molecules in a skewered manner, wherein the linear molecules include, as part thereof, first linear molecules each having an ionizable group that ionizes in water or an aqueous solution.
    Type: Application
    Filed: July 12, 2019
    Publication date: November 4, 2021
    Applicant: THE UNIVERSITY OF TOKYO
    Inventors: Kohzo ITO, Rina MAEDA, Shuntaro UENUMA
  • Publication number: 20210284758
    Abstract: Provided is a structure including a plurality of pseudo-polyrotaxanes and/or polyrotaxanes each including a chain polymer included in a cavity or cavities of one or more cyclic molecules in a skewered manner, at least part of the plurality of pseudo-polyrotaxanes and/or polyrotaxanes being arranged in series with each other.
    Type: Application
    Filed: February 18, 2021
    Publication date: September 16, 2021
    Inventors: Kohzo Ito, Rina Maeda, Shuntaro Uenuma, Kimika Endo
  • Patent number: 9541830
    Abstract: Block copolymers and methods of making patterns of organic thin films using the block copolymers. The block copolymers comprise a fluorinated block. Thin films of the block copolymers have microdomains that can be aligned. As a result the patterns of organic thin films having smaller dimensions than the pattern of incident deep-UV or e-beam radiation can be formed. For example, the block copolymers can be used in lithography, filtration, and templating applications.
    Type: Grant
    Filed: September 6, 2012
    Date of Patent: January 10, 2017
    Assignee: Cornell University
    Inventors: Christopher K. Ober, Rina Maeda, Nam-ho You, Teruaki Hayakawa
  • Publication number: 20140370442
    Abstract: Block copolymers and methods of making patterns of organic thin films using the block copolymers. The block copolymers comprise a fluorinated block. Thin films of the block copolymers have microdomains that can be aligned. As a result the patterns of organic thin films having smaller dimensions than the pattern of incident deep-UV or e-beam radiation can be formed. For example, the block copolymers can be used in lithography, filtration, and templating applications.
    Type: Application
    Filed: September 6, 2012
    Publication date: December 18, 2014
    Applicant: CORNELL UNIVERSITY
    Inventors: Christopher K. Ober, Rina Maeda, Nam-ho You, Teruaki Hayakawa