Patents by Inventor Rinshi Sugino

Rinshi Sugino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5225355
    Abstract: A gettering treatment process comprises the step of irradiating an ultraviolet light onto an insulating layer (a silicon oxide thin layer formed by thermally oxidizing silicon), in a chlorine-containing gas atmosphere. The ultraviolet light excites and dissociates the chlorine-containing gas thereby to generate chlorine radicals which uniformly penetrate the insulating layer, and serve to trap metal impurities within the silicon oxide thin layer.
    Type: Grant
    Filed: March 17, 1992
    Date of Patent: July 6, 1993
    Assignee: Fujitsu Limited
    Inventors: Rinshi Sugino, Yasuo Nara, Takashi Ito
  • Patent number: 5221423
    Abstract: The surface of a semiconductor substrate is cleaned effectively by etching the surface by placing the substrate in a halogen containing atmosphere, irradiating the atmosphere and the semiconductor surface with ultraviolet rays, and wet solution cleaning of the formed reactant from the substrate surface.
    Type: Grant
    Filed: August 19, 1991
    Date of Patent: June 22, 1993
    Assignee: Fujitsu Limited
    Inventors: Rinshi Sugino, Takashi Ito
  • Patent number: 5178721
    Abstract: In a photo-excited dry cleaning with a halogen, a highly efficient radical generation can be obtained while selecting a cleaning gas or reaction gas pressure appropriate for removing contaminants from a substrate to be cleaned. This can be attained by controlling a light transmission distance or a distance from a window of a cleaning chamber through which a light enters the cleaning chamber to the substrate.
    Type: Grant
    Filed: August 8, 1991
    Date of Patent: January 12, 1993
    Assignee: Fujitsu Limited
    Inventor: Rinshi Sugino