Patents by Inventor Rinu Abraham MANIYARA

Rinu Abraham MANIYARA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220380882
    Abstract: An article comprising: (i) a body, the body comprising a material and a transmittance greater than or equal to 90% throughout an electromagnetic radiation wavelength range of 250 nm to 800 nm; and (ii) cupric oxide (CuO) in direct contact with the material of the body, the cupric oxide (CuO) comprising a thickness that is less than or equal to 1.3 nm. Also disclosed is the article further comprising: an ultra-thin metal film disposed directly on the cupric oxide (CuO). The article demonstrates a transmittance greater than or equal to 65% throughout an electromagnetic radiation wavelength range of 300 nm to 1400 nm. The ultra-thin metal film can be silver (Ag), gold (Au), copper (Cu), or platinum (Pt). The ultra-thin metal film comprises a thickness within a range of 1 nm to 5 nm. The article at the ultra-thin metal film has a sheet resistance of less than or equal to 2100 ?/?. Additionally, a method of forming the article.
    Type: Application
    Filed: May 25, 2022
    Publication date: December 1, 2022
    Inventors: Rinu Abraham Maniyara, Daniel Martínez Cercós, Prantik Mazumder, Bruno Paulillo, Valerio Pruneri
  • Patent number: 10775693
    Abstract: The present invention is directed to compositions for photolithographic masks comprising a substrate and a coating having at least one electrical conducting layer comprising a nitride, a boride or a carbide, and methods of making the same.
    Type: Grant
    Filed: October 2, 2017
    Date of Patent: September 15, 2020
    Assignees: FUNDACIO INSTITUT DE CIENCIES FOTONIQUES, INSTITUCIO CATALANA DE RECERCA I ESTUDIS AVANCATS
    Inventors: Valerio Pruneri, Rinu Abraham Maniyara
  • Publication number: 20180157162
    Abstract: The present invention is directed to compositions for photolithographic masks comprising a substrate and a coating having at least one electrical conducting layer comprising a metal nitride of the formula MNy, wherein M is a metal and y is greater than zero and less than 1, and methods of making the same.
    Type: Application
    Filed: December 7, 2016
    Publication date: June 7, 2018
    Inventors: Valerio PRUNERI, Rinu Abraham MANIYARA
  • Publication number: 20180157160
    Abstract: The present invention is directed to compositions for photolithographic masks comprising a substrate and a coating having at least one electrical conducting layer comprising a nitride, a boride or a carbide, and methods of making the same.
    Type: Application
    Filed: October 2, 2017
    Publication date: June 7, 2018
    Inventors: Valerio PRUNERI, Rinu Abraham MANIYARA