Patents by Inventor Ripon Dey

Ripon Dey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12498643
    Abstract: A method for patterning a substrate involves depositing a layer of resist material on a surface of the substrate, lithographically patterning (electron beam exposing and then developing) the layer of the resist material to form a patterned resist layer having a pattern multi-faceted microscale structures with a depth profile that varies over an area of the layer of resist material, and using the patterned resist layer in an etching step to transfer the pattern of multi-faceted microscale structures from the patterned resist layer to the substrate.
    Type: Grant
    Filed: January 12, 2024
    Date of Patent: December 16, 2025
    Assignee: Authentix, Inc.
    Inventors: Milad Khoshnegar Shahrestani, Ripon Dey
  • Publication number: 20240241450
    Abstract: A method for patterning a substrate involves depositing a layer of resist material on a surface of the substrate, lithographically patterning (electron beam exposing and then developing) the layer of the resist material to form a patterned resist layer having a pattern multi-faceted microscale structures with a depth profile that varies over an area of the layer of resist material, and using the patterned resist layer in an etching step to transfer the pattern of multi-faceted microscale structures from the patterned resist layer to the substrate.
    Type: Application
    Filed: January 12, 2024
    Publication date: July 18, 2024
    Inventors: Milad Khoshnegar Shahrestani, Ripon Dey