Patents by Inventor Risa Utsunomiya
Risa Utsunomiya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10105683Abstract: A porous member includes a base member and carbon nanostructures. The base member includes a porous body having a porosity of more than or equal to 80%. The carbon nanostructures are formed on a surface of the base member, and have a width of less than or equal to 100 nm. A catalyst member includes a catalyst arranged on surfaces of the carbon nano structures.Type: GrantFiled: February 20, 2014Date of Patent: October 23, 2018Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.Inventors: Soichiro Okubo, Takeshi Hikata, Risa Utsunomiya, Teruaki Matsuba, Hitoshi Matsumoto, Yugo Higashi
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Patent number: 9493354Abstract: A method for manufacturing a carbon nanostructure according to the present invention includes a preparation step of preparing a base body, an oxidization step and a step of growing a carbon nanostructure. In the step of preparing a base body, a base body with at least a part of a contact portion or an integral portion of a catalyst member and a separation member having been oxidized is prepared. In the step of growing a carbon nanostructure, a carbon nanostructure is grown in a separation interface region between the catalyst member and the separation member. The step of growing a carbon nanostructure includes at least one of a step of locally supplying a source gas to a portion of the catalyst member facing the separation interface region where the carbon nanostructure is being grown, and a step of locally heating the separation interface region.Type: GrantFiled: January 28, 2014Date of Patent: November 15, 2016Assignee: Sumitomo Electric Industries, Ltd.Inventors: Takeshi Hikata, Soichiro Okubo, Risa Utsunomiya, Yugo Higashi, Jun-ichi Fujita, Katsuhisa Murakami
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Patent number: 9305711Abstract: A carbon nanostructure's geometry and electrical characteristics can be controlled. A method for processing a carbon nanostructure according to the present invention includes the steps of: preparing a carbon nanostructure (e.g., a carbon nanotube) (a CNT preparation step); and exposing the carbon nanotube to an energy beam (e.g., an electron beam) while vibrating the carbon nanotube (an exposure step). This facilitates modifying the carbon nanotube in length and electrical characteristics.Type: GrantFiled: March 8, 2012Date of Patent: April 5, 2016Assignees: SUMITOMO ELECTRIC INDUSTRIES, LTD., UNIVERSITY OF TSUKUBAInventors: Jun-ichi Fujita, Takeshi Hikata, Soichiro Okubo, Risa Utsunomiya, Teruaki Matsuba
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Patent number: 9236488Abstract: A thin film transistor is equipped with a silicon substrate, a channel layer, a source electrode and a drain electrode. The channel layer, the source electrode and the drain electrode are arranged on the main surface of the silicon substrate. The channel layer is composed of multiple carbon nanowall thin films, wherein the multiple carbon nanowall thin films are arranged in parallel to each other between the source electrode and the drain electrode, one end of each of the multiple carbon nanowall thin films is in contact with the source electrode, and the other end of each of the multiple carbon nanowall thin films is in contact with the drain electrode. An insulating film and a gate electrode are arranged on the rear surface side of the silicon substrate.Type: GrantFiled: August 23, 2012Date of Patent: January 12, 2016Assignees: CHUBU UNIVERSITY EDUCATIONAL FOUNDATION, NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY, OSAKA UNIVERSITY, NISSIN ELECTRIC CO., LTD.Inventors: Toshio Kawahara, Kazumasa Okamoto, Kazuhiko Matsumoto, Risa Utsunomiya, Teruaki Matsuba, Hitoshi Matsumoto
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Publication number: 20160002041Abstract: A method for manufacturing a carbon nanostructure according to the present invention includes a preparation step of preparing a base body, an oxidization step and a step of growing a carbon nanostructure. In the step of preparing a base body, a base body with at least a part of a contact portion or an integral portion of a catalyst member and a separation member having been oxidized is prepared. In the step of growing a carbon nanostructure, a carbon nanostructure is grown in a separation interface region between the catalyst member and the separation member. The step of growing a carbon nanostructure includes at least one of a step of locally supplying a source gas to a portion of the catalyst member facing the separation interface region where the carbon nanostructure is being grown, and a step of locally heating the separation interface region.Type: ApplicationFiled: January 28, 2014Publication date: January 7, 2016Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.Inventors: Takeshi HIKATA, Soichiro OKUBO, Risa UTSUNOMIYA, Yugo HIGASHI, Jun-ichi FUJITA, Katsuhisa MURAKAMI
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Publication number: 20150375210Abstract: A porous member includes a base member and carbon nanostructures. The base member includes a porous body having a porosity of more than or equal to 80%. The carbon nanostructures are formed on a surface of the base member, and have a width of less than or equal to 100 nm. A catalyst member includes a catalyst arranged on surfaces of the carbon nano structures.Type: ApplicationFiled: February 20, 2014Publication date: December 31, 2015Inventors: Soichiro OKUBO, Takeshi HIKATA, Risa UTSUNOMIYA, Teruaki MATSUBA, Hitoshi MATSUMOTO, Yugo HIGASHI
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Publication number: 20150221779Abstract: A thin film transistor is equipped with a silicon substrate, a channel layer, a source electrode and a drain electrode. The channel layer, the source electrode and the drain electrode are arranged on the main surface of the silicon substrate. The channel layer is composed of multiple carbon nanowall thin films, wherein the multiple carbon nanowall thin films are arranged in parallel to each other between the source electrode and the drain electrode, one end of each of the multiple carbon nanowall thin films is in contact with the source electrode, and the other end of each of the multiple carbon nanowall thin films is in contact with the drain electrode. An insulating film and a gate electrode are arranged on the rear surface side of the silicon substrate.Type: ApplicationFiled: August 23, 2012Publication date: August 6, 2015Applicants: CHUBU UNIVERSITY EDUCATIONAL FOUNDATION, NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY, OSAKA UNIVERSITY, NISSIN ELECTRIC CO., LTD.Inventors: Toshio Kawahara, Kazumasa Okamoto, Kazuhiko Matsumoto, Risa Utsunomiya, Teruaki Matsuba, Hitoshi Matsumoto
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Patent number: 9096434Abstract: There is provided a method for manufacturing a carbon nanostructure with reduced occurrence of a bend and the like. The method for manufacturing a carbon nanostructure according to the present invention includes the steps of: preparing a base body formed of a catalyst member including a catalyst and a separation member that are in contact with or integral with each other (preparation step); oxidizing at least a part of a contact portion or integral portion of the catalyst member and the separation member (oxidation step); bringing a carbon-containing source gas into contact with the catalyst member and/or the separation member (CNT growth step); and growing a carbon nanostructure (CNT growth step). In the CNT growth step, the carbon nanostructure is grown in a separation interface region between the catalyst member and the separation member, by heating the base body while separating the separation member from the catalyst member.Type: GrantFiled: May 2, 2013Date of Patent: August 4, 2015Assignees: Sumitomo Electric Industries, Ltd., Nissin Electric Co., Ltd.Inventors: Takeshi Hikata, Soichiro Okubo, Risa Utsunomiya, Yugo Higashi
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Publication number: 20140127472Abstract: A carbon nanowall array (10) is provided with a substrate (1) and carbon nanowalls (2-9). The substrate (1) is composed of silicon, and includes protruding portions (11) and recessed portions (12). The protruding portions (11) and recessed portions (12) are formed in the direction (DR1) on one surface of the substrate (1). The protruding portions (11) and recessed portions (12) are alternately formed in the direction (DR2) perpendicular to the direction (DR1). Each of the protruding portions (11) has a length of 0.1-0.5 ?m in the direction (DR2), and each of the recessed portions (12) has a length of 0.6-1.5 ?m in the direction (DR2). The height of each of the protruding portions (11) is 0.3-0.6 ?m. Respective carbon nanowalls (2-9) are formed in the length direction (i.e., the direction (DR1)) of the protruding portions (11) of the substrate (1), said carbon nanowalls being formed on the protruding portions (11).Type: ApplicationFiled: June 26, 2012Publication date: May 8, 2014Applicants: CHUBU UNIVERSITY EDUCATIONAL FOUNDATION, NISSIN ELECTRIC CO., LTD., OSAKA UNIVERSITY, NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITYInventors: Toshio Kawahara, Kazumasa Okamoto, Kazuhiko Matsumoto, Risa Utsunomiya, Teruaki Matsuba, Hitoshi Matsumoto
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Publication number: 20130342965Abstract: A carbon nanostructure's geometry and electrical characteristics can be controlled. A method for processing a carbon nanostructure according to the present invention includes the steps of: preparing a carbon nanostructure (e.g., a carbon nanotube) (a CNT preparation step); and exposing the carbon nanotube to an energy beam (e.g., an electron beam) while vibrating the carbon nanotube (an exposure step). This facilitates modifying the carbon nanotube in length and electrical characteristics.Type: ApplicationFiled: March 8, 2012Publication date: December 26, 2013Applicants: UNIVERSITY OF TSUKUBA, SUMITOMO ELECTRIC INDUSTRIES, LTD.Inventors: Jun-ichi Fujita, Takeshi Hikata, Soichiro Okubo, Risa Utsunomiya, Teruaki Matsuba
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Publication number: 20130302552Abstract: There is provided a method for manufacturing a carbon nanostructure with reduced occurrence of a bend and the like. The method for manufacturing a carbon nanostructure according to the present invention includes the steps of: preparing a base body formed of a catalyst member including a catalyst and a separation member that are in contact with or integral with each other (preparation step); oxidizing at least a part of a contact portion or integral portion of the catalyst member and the separation member (oxidation step); bringing a carbon-containing source gas into contact with the catalyst member and/or the separation member (CNT growth step); and growing a carbon nanostructure (CNT growth step). In the CNT growth step, the carbon nanostructure is grown in a separation interface region between the catalyst member and the separation member, by heating the base body while separating the separation member from the catalyst member.Type: ApplicationFiled: May 2, 2013Publication date: November 14, 2013Applicants: SUMITOMO ELECTRIC INDUSTRIES, LTD., NISSIN ELECTRIC CO., LTD.Inventors: Sumitomo Electric Industries, Ltd., Risa Utsunomiya, Yugo Higashi