Abstract: Methods for producing an optical element having a cured layer with a concavo-convex structure are described. Such a method includes: forming a composition layer on a base material by using a composition containing a polymerizable compound and a photo initiator; forming a pattern formative layer by pressure-contacting a mold; and forming the cured layer having the concavo-convex structure by photo-curing the pattern formative layer, wherein the polymerizable compound contains (a) a urethane (meth)acrylate monomer, the composition contains 0.005 to 0.5 part by mass of the photo initiator with respect to 100 parts by mass of the polymerizable compound, and the cured layer has a film thickness of the concavo-convex structure within a range of 0.5 mm to 1 cm.

Abstract: Described is a composition comprising: a compound (A) having a substituent (a) being at least either one of an acryloyl group and a methacryloyl group, and a perfluoroalkylene group; and a compound (B) having a substituent (b) being either one of an acryloyl group and a methacryloyl group, and a substituent (c) being either one of an acryloyl group and a methacryloyl group.

Abstract: A suitable combination of a composition for formation of a resin mold with a pattern and a composition for formation of resin to which the pattern is transferred from the resin mold is found.

Abstract: A curable resin composition comprising: a fluorinated urethane(meth)acrylate represented by formula (1), wherein, R1, R2, R3 and R4 each independently represents a hydrogen atom or a methyl group, x and y each independently represents 1 or 2, and n represents an integer within the range of 1 to 10; R3 and R4 each independently represents the hydrogen atom when x and y are both 1; R3 represents the hydrogen atom and R4 represents the methyl group when x is 1 and y is 2; R3 represents the methyl group and R4 represents the hydrogen atom when x is 2 and y is 1; and R3 and R4 each independently represents the methyl group when x and y are both 2.

Abstract: Compositions are for formation of etch-resistant resins. Such resins are useful for manufacturing components or devices.

Abstract: Described is a resinous structure derived from fluorine-containing polymers useful as a mold having excellent dimensional stability.

Abstract: A suitable combination of a composition for formation of a resin mold with a pattern and a composition for formation of resin to which the pattern is transferred from the resin mold is found.

Abstract: Compositions are for formation of etch-resistant resins. Such resins are useful for manufacturing components or devices.

Abstract: Compositions that are especially suitable for optical components are disclosed.

Abstract: Described is a composition comprising: a compound (A) having a substituent (a) being at least either one of an acryloyl group and a methacryloyl group, and a perfluoroalkylene group; and a compound (B) having a substituent (b) being either one of an acryloyl group and a methacryloyl group, and a substituent (c) being either one of an acryloyl group and a methacryloyl group.

Abstract: A curable resin composition comprising: a fluorinated urethane(meth)acrylate represented by formula (1), wherein, R1, R2, R3 and R4 each independently represents a hydrogen atom or a methyl group, x and y each independently represents 1 or 2, and n represents an integer within the range of 1 to 10; R3 and R4 each independently represents the hydrogen atom when x and y are both 1; R3 represents the hydrogen atom and R4 represents the methyl group when x is 1 and y is 2; R3 represents the methyl group and R4 represents the hydrogen atom when x is 2 and y is 1; and R3 and R4 each independently represents the methyl group when x and y are both 2.

Abstract: Described is a resinous structure derived from fluorine-containing polymers useful as a mold having excellent dimensional stability.