Patents by Inventor Rita De Waele

Rita De Waele has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Composition and method for treating a semiconductor substrate
    Patent number: 7432233
    Abstract: The invention relates to a method for cleaning semiconductor surfaces to achieve to removal of all kinds of contamination (particulate, metallic and organic) in one cleaning step. The method employs a cleaning solution for treating semiconductor surfaces which is stable and provokes less or no metal precipitation on the semiconductor surface.
    Type: Grant
    Filed: December 16, 2004
    Date of Patent: October 7, 2008
    Assignee: Interuniversitair Microelektronica Centrum (IMEC)
    Inventors: Rita De Waele, Rita Vos
  • Composition and method for treating a semiconductor substrate
    Patent number: 7422019
    Abstract: The invention relates to a method for cleaning semiconductor surfaces to achieve to removal of all kinds of contamination (particulate, metallic and organic) in one cleaning step. The method employs a cleaning solution for treating semiconductor surfaces which is stable and provokes less or no metal precipitation on the semiconductor surface.
    Type: Grant
    Filed: June 27, 2006
    Date of Patent: September 9, 2008
    Assignee: Interuniversitair Microelektronica Centrum (IMEC) vzw
    Inventors: Rita De Waele, Rita Vos
  • Composition and method for treating a semiconductor substrate
    Publication number: 20060247142
    Abstract: The invention relates to a method for cleaning semiconductor surfaces to achieve to removal of all kinds of contamination (particulate, metallic and organic) in one cleaning step. The method employs a cleaning solution for treating semiconductor surfaces which is stable and provokes less or no metal precipitation on the semiconductor surface.
    Type: Application
    Filed: June 27, 2006
    Publication date: November 2, 2006
    Inventors: Rita De Waele, Rita Vos
  • Composition and method for treating a semiconductor substrate
    Publication number: 20050159323
    Abstract: The invention relates to a method for cleaning semiconductor surfaces to achieve to removal of all kinds of contamination (particulate, metallic and organic) in one cleaning step. The method employs a cleaning solution for treating semiconductor surfaces which is stable and provokes less or no metal precipitation on the semiconductor surface.
    Type: Application
    Filed: December 16, 2004
    Publication date: July 21, 2005
    Inventors: Rita De Waele, Rita Vos