Patents by Inventor Rita Marguerite Albin Lambertine Petit

Rita Marguerite Albin Lambertine Petit has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Measurement system, lithographic apparatus and device manufacturing method
    Patent number: 11009800
    Abstract: A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.
    Type: Grant
    Filed: January 26, 2017
    Date of Patent: May 18, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Han-Kwang Nienhuys, Güneş Nakiboğlu, Rita Marguerite Albin Lambertine Petit, Hermen Folken Pen, Remco Yuri Van De Moesdijk, Frank Johannes Jacobus Van Boxtel, Borgert Kruizinga
  • MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20200379360
    Abstract: A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.
    Type: Application
    Filed: January 26, 2017
    Publication date: December 3, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Han-Kwang Nienhuys, Gunes Nakiboglu, Rita Marguerite Albin Lambertine Petit, Hermen Folken Pen, Remco Yuri Van de Moesdijk, Frank Johannes Jacobus Van Boxtel, Borgert Kruizinga
  • Method for estimating at least one component placement position on a substrate as well as a device for carrying out such a method
    Patent number: 7474417
    Abstract: A method and a device are provided for estimating at least one component placement position on a substrate at which a component is to be placed. The component placement position is estimated on the basis of the position of at least one mark on the substrate. The statistical measurement inaccuracies of the marks are determined. Subsequently, the positional accuracy of the component placement position on the substrate is estimated on the basis of the measurement inaccuracies of the marks. Subsequently, the estimated positional accuracy of the component placement position is compared with a desired positional accuracy. Subsequently, a determination is made regarding whether the component is to be placed on the substrate with the estimated positional accuracy of the component placement position.
    Type: Grant
    Filed: February 11, 2005
    Date of Patent: January 6, 2009
    Assignee: Assembleon N.V.
    Inventors: Rita Marguerite Albin Lambertine Petit, Alain de Bock, Johannes Martinus Maria Verbakel
  • Method for estimating at least one component placement position on a substrate as well as a device for carrying out such a method
    Publication number: 20050216104
    Abstract: A method and a device are provided for estimating at least one component placement position on a substrate at which a component is to be placed. The component placement position is estimated on the basis of the position of at least one mark on the substrate. The statistical measurement inaccuracies of the marks are determined. Subsequently, the positional accuracy of the component placement position on the substrate is estimated on the basis of the measurement inaccuracies of the marks. Subsequently, the estimated positional accuracy of the component placement position is compared with a desired positional accuracy. Subsequently, a determination is made regarding whether the component is to be placed on the substrate with the estimated positional accuracy of the component placement position.
    Type: Application
    Filed: February 11, 2005
    Publication date: September 29, 2005
    Inventors: Rita Marguerite Albin Lambertine Petit, Alain de Bock, J.M.M. Verbakel