Patents by Inventor Ritesh P. Shah

Ritesh P. Shah has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6713391
    Abstract: The invention includes a non-magnetic physical vapor deposition target. The target has at least 30 atom percent total of one or more of Co, Ni, Ta, Ti, Pt, Mo and W, and at least 10 atom percent silicon. The target also has one phase and not more than 1% of any additional phases other than said one phase. In another aspect, the invention includes a non-magnetic physical vapor deposition target consisting essentially of Co and/or Ni, silicon, and one phase.
    Type: Grant
    Filed: October 25, 2001
    Date of Patent: March 30, 2004
    Assignee: Honeywell International Inc.
    Inventors: Wuwen Yi, Diana Morales, Chi Tse Wu, Ritesh P. Shah, Jeff A. Keller
  • Patent number: 6555250
    Abstract: The invention includes a method of forming a heat treated sputtering target assembly. A backing plate is diffusion bonded to a sputtering target to produce a sputtering target assembly. The sputtering target assembly is heat treated to precipitation harden the backing plate of the assembly. The heat treatment includes heating and quenching, with the quenching being performed by immersing the backing plate in a quenchant without submerging the sputtering target.
    Type: Grant
    Filed: May 12, 1999
    Date of Patent: April 29, 2003
    Assignee: Honeywell International Inc.
    Inventors: Ritesh P. Shah, David E. Steele, William R. Turner, Anthony F. Beier, Janine K. Kardokus, Susan D. Strothers
  • Publication number: 20020153248
    Abstract: Described is the production of a metal article with fine metallurgical structure and texture by a process that includes forging and rolling and control of the forging and rolling conditions. Also described is a metal article with a minimum of statically crystallized grain size and a uniform (100) cubic texture.
    Type: Application
    Filed: April 12, 2002
    Publication date: October 24, 2002
    Inventors: Ritesh P. Shah, Vladimir Segal
  • Publication number: 20020102849
    Abstract: The invention includes a non-magnetic physical vapor deposition target. The target has at least 30 atom percent total of one or more of Co, Ni, Ta, Ti, Pt, Mo and W, and at least 10 atom percent silicon. The target also has one phase and not more than 1% of any additional phases other than said one phase. In another aspect, the invention includes a non-magnetic physical vapor deposition target consisting essentially of Co and/or Ni, silicon, and one phase.
    Type: Application
    Filed: October 25, 2001
    Publication date: August 1, 2002
    Inventors: Wuwen Yi, Diana Morales, Chi Tse Wu, Ritesh P. Shah, Jeff A. Keller
  • Patent number: 6417105
    Abstract: Described is an in situ method for producing articles of metal aluminide or silicide by reactive sintering and vacuum hot pressing powders and products, such as sputtering targets, produced.
    Type: Grant
    Filed: May 24, 2000
    Date of Patent: July 9, 2002
    Assignee: Honeywell International Inc.
    Inventors: Ritesh P. Shah, Diana L. Morales, Jeffrey A. Keller
  • Publication number: 20020063056
    Abstract: Described is the production of a metal article with fine metallurgical structure and texture by a process that includes forging and rolling and control of the forging and rolling conditions. Also described is a metal article with a minimum of statically crystallized grain size and a uniform (100) cubic texture.
    Type: Application
    Filed: December 11, 2001
    Publication date: May 30, 2002
    Inventors: Ritesh P. Shah, Vladimir Segal
  • Publication number: 20020064949
    Abstract: Described is an in situ method for producing articles of metal aluminide or silicide by reactive sintering and vacuum hot pressing powders and products, such as sputtering targets, produced.
    Type: Application
    Filed: May 24, 2000
    Publication date: May 30, 2002
    Inventors: Ritesh P. Shah, Diana L. Morales, Jeffrey A. Keller
  • Patent number: 6348139
    Abstract: Described is the production of a metal article with fine metallurgical structure and texture by a process that includes forging and rolling and control of the forging and rolling conditions. Also described is a metal article with a minimum of statically crystallized grain size and a uniform (100) cubic texture.
    Type: Grant
    Filed: June 17, 1998
    Date of Patent: February 19, 2002
    Assignee: Honeywell International Inc.
    Inventors: Ritesh P. Shah, Vladimir Segal
  • Publication number: 20020003010
    Abstract: Described is a method of making a heat treated sputtering target and a sputtering target assembly with a prescripitation hardened backing plate diffusion hardened to a sputtering target.
    Type: Application
    Filed: May 12, 1999
    Publication date: January 10, 2002
    Inventors: RITESH P. SHAH, DAVID E. STEELE, WILLIAM R. TURNER, ANTHONY F. BEIER, JANINE K. KARDOKUS, SUSAN D. STROTHERS
  • Patent number: 6258719
    Abstract: Described is an in situ method for producing articles of metal aluminide or silicide by reactive sintering and vacuum hot pressing powders and products, such as sputtering targets, produced.
    Type: Grant
    Filed: July 1, 1998
    Date of Patent: July 10, 2001
    Assignee: Honeywell International Inc.
    Inventors: Ritesh P. Shah, Diana L. Morales, Jeffrey A. Keller