Patents by Inventor Ritsuji Toba

Ritsuji Toba has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5139923
    Abstract: In conducting wiring by masking the portion other than the portion to be wired of a metallic laminate with a photoresist for plating and subjecting only the portion to be wired to pattern plating, the provision of a noble metal layer made of gold, platinum or the like, or a metallic layer made of a metal having a larger ionization tendency than that of a metal used in the pattern plating on the metallic layer constituting the undercoat of the photoresist for plating enables the peeling of the resist for plating to be prevented and excellent fine wiring to be conducted.
    Type: Grant
    Filed: January 3, 1991
    Date of Patent: August 18, 1992
    Assignee: Hitachi, Ltd.
    Inventors: Ritsuji Toba, Kanji Murakami, Mineo Kawamoto
  • Patent number: 5045353
    Abstract: A method for treating the interior surfaces of holes as well as the surfaces of a perforated workpiece by dipping it into treating liquid includes a step of causing treating liquid to flow at both ends of the holes in a direction perpendicular to these holes at different velocities. In order to create these liquid flows at different velocities, the workpiece is dipped in the liquid so that the holes extend substantially horizontally, and air bubble jets are alternately delivered along both ends of the holes, or fins are provided at locations adjacent both ends of the holes so as to extend outwardly upwardly at one side of the hole ends and extend outwardly downwardly at the other side of the hole ends, and these fins are moved upwardly and downwardly.
    Type: Grant
    Filed: September 27, 1989
    Date of Patent: September 3, 1991
    Assignee: Hitachi, Ltd.
    Inventors: Yuuzi Takada, Ritsuji Toba, Satoshi Yoshitomi, Nobuaki Ooki
  • Patent number: 5028513
    Abstract: The present invention provide a process for producing printed circuit boards which comprises the steps of(a) roughening a surface of a copper layer formed on an insulating board.(b) coating the roughened surface of copper layer with a photo-resist layer containing a sublimable copper-corrosion inhibitor, exposing the resist layer selectively to actinic rays according to a circuit pattern to form, and developing the resulting resist layer, thereby forming plating-resist coats on circuit-negative pattern portions of the copper layer,(c) heat-treating the plating-resist coats,(d) plating chemically the circuit-corresponding portion with copper,(e) removing the plating-resist coats, and(f) removing the copper layer except the circuit-corresponding portion thereof.
    Type: Grant
    Filed: April 13, 1989
    Date of Patent: July 2, 1991
    Assignees: Hitachi, Ltd., Hitachi Chemical Co., Ltd.
    Inventors: Kanji Murakami, Mineo Kawamoto, Akio Tadokoro, Haruo Akahoshi, Toshikazu Narahara, Ritsuji Toba, Toshiaki Ishimaru, Nobuyuki Hayashi, Motoyo Wajima
  • Patent number: 4865888
    Abstract: An electroless copper plating process for producing fine patterned wiring boards is improved by supplying very fine oxygen-containing gas bubbles through a porous alkali-resistant resin gas dispersing tube. An electroless copper plating apparatus having such a gas dispersing tube is also provided.
    Type: Grant
    Filed: June 13, 1988
    Date of Patent: September 12, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Haruo Akahoshi, Kanji Murakami, Mineo Kawamoto, Akio Takokoro, Ritsuji Toba, Toyofusa Yoshimura
  • Patent number: 4781943
    Abstract: A pretreatment process for removing air within through-holes of printed circuit boards before plating the through-holes is provided. Air within the through-holes of the printed circuit boards is replaced with a saturated vapor of a water-soluble liquid by dipping the printed circuit board into the boiled liquid and then the saturated vapor is dissolved in water or a water-soluble liquid to remove air.
    Type: Grant
    Filed: April 2, 1987
    Date of Patent: November 1, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Ritsuji Toba, Tsunehumi Mutoo
  • Patent number: 4642161
    Abstract: A method of bonding copper and a resin together is disclosed which comprises forming a copper oxide layer on the surface of copper to be bonded to a resin, reducing the copper oxide layer to metallic copper with a reducing solution, and bonding the metallic copper and the resin together. According to this method, a good acid resistance of the bonding interface and a sufficiently high bonding strength can be obtained.
    Type: Grant
    Filed: January 27, 1986
    Date of Patent: February 10, 1987
    Assignee: Hitachi, Ltd.
    Inventors: Haruo Akahoshi, Kanji Murakami, Motoyo Wajima, Kiyonori Kogawa, Ritsuji Toba, Takeshi Shimazaki