Patents by Inventor Ritsuko Fukuda

Ritsuko Fukuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6946234
    Abstract: A pattern can be precisely formed by irradiating, with an active energy beam, a positive sensitive resin composition according to this invention comprising a base polymer, an ether-bond-containing olefinic unsaturated compound and an acid-generating agent, where the base polymer is a copolymer comprising the structural units represented by formulas (1) to (3): where R1 and R3 are each independently hydrogen or methyl and R2 is C1-C6 straight or branched unsubstituted alkyl or C1-C6 straight or branched substituted alkyl, wherein a, b and c are 0.05 to 0.7, 0.15 to 0.8 and 0.01 to 0.5, respectively and a+b+c=1.
    Type: Grant
    Filed: July 28, 2003
    Date of Patent: September 20, 2005
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Genji Imai, Ritsuko Fukuda, Toshiro Takao, Keiichi Ikeda, Yoshihiro Yamamoto
  • Publication number: 20040081914
    Abstract: A pattern can be precisely formed by irradiating, with an active energy beam, a positive sensitive resin composition according to this invention comprising a base polymer, an ether-bond-containing olefinic unsaturated compound and an acid-generating agent, where the base polymer is a copolymer comprising the structural units represented by formulas (1) to (3): 1
    Type: Application
    Filed: July 28, 2003
    Publication date: April 29, 2004
    Applicant: Mitsui Chemicals, Inc.
    Inventors: Genji Imai, Ritsuko Fukuda, Toshiro Takao, Keiichi Ikeda, Yoshihiro Yamamoto
  • Patent number: 6630285
    Abstract: A pattern can be precisely formed by irradiating, with an active energy beam, a positive sensitive resin composition according to this invention comprising a base polymer, an ether-bond-containing olefinic unsaturated compound and an acid-generating agent, where the base polymer is a copolymer comprising the structural units represented by formulas (1) to (3): where R1 and R3 are each independently hydrogen or methyl and R2 is C1-C6 straight or branched unsubstituted alkyl or C1-C6 straight or branched substituted alkyl, wherein a, b and c are 0.05 to 0.7, 0.15 to 0.8 and 0.01 to 0.5, respectively and a+b+c=1.
    Type: Grant
    Filed: October 14, 1999
    Date of Patent: October 7, 2003
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Genji Imai, Ritsuko Fukuda, Toshiro Takao, Keiichi Ikeda, Yoshihiro Yamamoto
  • Patent number: 6433118
    Abstract: This invention discloses a copolymer comprising structural units represented by formulas (1) to (3): where R1 and R3 are each hydrogen or methyl and R2 is C1-C6 straight or branched unsubstituted alkyl or C1-C6 straight or branched substituted alkyl; wherein a, b and c are 0.05 to 0.7, 0.15 to 0.8 and 0.01 to 0.5, respectively and a+b+c=1.
    Type: Grant
    Filed: October 14, 1999
    Date of Patent: August 13, 2002
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Ritsuko Fukuda, Toshiro Takao, Keiichi Ikeda, Yoshihiro Yamamoto
  • Publication number: 20020012880
    Abstract: A pattern can be precisely formed by irradiating, with an active energy beam, a positive sensitive resin composition according to this invention comprising a base polymer, an ether-bond-containing olefinic unsaturated compound and an acid-generating agent, where the base polymer is a copolymer comprising the structural units represented by formulas (1) to (3): 1
    Type: Application
    Filed: October 14, 1999
    Publication date: January 31, 2002
    Inventors: GENJI IMAI, RITSUKO FUKUDA, TOSHIRO TAKAO, KEIICHI IKEDA, YOSHIHIRO YAMAMOTO
  • Patent number: 6281318
    Abstract: There are herein disclosed a poly{1-(1-alkoxyalkoxy)-4-(1-methylethenyl)benzene} having a narrow molecular weight distribution, for example, a poly{1-(1-alkoxyethoxy)-4-(1-methylethenyl)benzene} or a poly{1-(2-tetrahydrofuranyloxy)-4-(1-methylethenyl)benzene} which is useful as a chemical amplification type positive resist material; a preparation process of the polymer which comprises reacting industrially easily available 4-(1-methylethenyl)phenol with a vinyl ether to produce an alkoxyalkoxy compound, and then carrying out an anionic polymerization; and a preparation process of poly{4-(1-methylethenyl)phenol} having a narrow molecular weight distribution useful as a tease polymer for a chemical amplification type positive resist material which comprises reacting the above-mentioned polymer with a protonic acid in the presence of an organic solvent.
    Type: Grant
    Filed: February 27, 1998
    Date of Patent: August 28, 2001
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Yoshihiro Yamamoto, Toshiro Takao, Ritsuko Fukuda, Isao Hara