Patents by Inventor Rivka Sherman

Rivka Sherman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optical inspection apparatus for substrate defect detection
    Patent number: 7796807
    Abstract: A method and apparatus for inspecting the surface of articles, such as chips and wafers, for defects, includes a first phase of optically examining the complete surface of the article inspected at a relatively high speed and with a relatively low spatial resolution, and a second phase of optically examining with a relatively high spatial resolution only the suspected locations for the presence or absence of a defect therein.
    Type: Grant
    Filed: January 15, 2009
    Date of Patent: September 14, 2010
    Assignee: Applied Materials, Israel Ltd.
    Inventors: David Alumot, Gad Neumann, Rivka Sherman, Ehud Tirosh
  • OPTICAL INSPECTION APPARATUS FOR SUBSTRATE DEFECT DETECTION
    Publication number: 20090148033
    Abstract: A method and apparatus for inspecting the surface of articles, such as chips and wafers, for defects, includes a first phase of optically examining the complete surface of the article inspected at a relatively high speed and with a relatively low spatial resolution, and a second phase of optically examining with a relatively high spatial resolution only the suspected locations for the presence or absence of a defect therein.
    Type: Application
    Filed: January 15, 2009
    Publication date: June 11, 2009
    Inventors: David Alumot, Gad Neumann, Rivka Sherman, Ehud Tirosh
  • Optical inspection method for substrate defect detection
    Patent number: 7499583
    Abstract: A method and apparatus for inspecting the surface of articles, such as chips and wafers, for defects, includes a first phase of optically examining the complete surface of the article inspected at a relatively high speed and with a relatively low spatial resolution, and a second phase of optically examining with a relatively high spatial resolution only the suspected locations for the presence or absence of a defect therein.
    Type: Grant
    Filed: May 24, 2004
    Date of Patent: March 3, 2009
    Assignee: Applied Materials, Israel, Ltd.
    Inventors: David Alumot, Gad Neumann, Rivka Sherman, Ehud Tirosh
  • Optical inspection apparatus for substrate defect detection
    Patent number: 6952491
    Abstract: A method and apparatus for inspecting the surface of articles, such as chips and wafers, for defects, includes a first phase of optically examining the complete surface of the article inspected at a relatively high speed and with a relatively low spatial resolution, and a second phase of optically examining with a relatively high spatial resolution only the suspected locations for the presence or absence of a defect therein.
    Type: Grant
    Filed: January 19, 2001
    Date of Patent: October 4, 2005
    Assignee: Applied Materials, Inc.
    Inventors: David Alumot, Gad Neumann, Rivka Sherman, Ehud Tirosh
  • Optical inspection apparatus for substrate defect detection
    Publication number: 20040263834
    Abstract: A method and apparatus for inspecting the surface of articles, such as chips and wafers, for defects, includes a first phase of optically examining the complete surface of the article inspected at a relatively high speed and with a relatively low spatial resolution, and a second phase of optically examining with a relatively high spatial resolution only the suspected locations for the presence or absence of a defect therein.
    Type: Application
    Filed: May 24, 2004
    Publication date: December 30, 2004
    Applicant: APPLIED MATERIALS, INC.
    Inventors: David Alumot, Gad Neumann, Rivka Sherman, Ehud Tirosh
  • Optical inspection method for substrate defect detection
    Publication number: 20040218807
    Abstract: A method and apparatus for inspecting the surface of articles, such as chips and wafers, for defects, includes a first phase of optically examining the complete surface of the article inspected at a relatively high speed and with a relatively low spatial resolution, and a second phase of optically examining with a relatively high spatial resolution only the suspected locations for the presence or absence of a defect therein.
    Type: Application
    Filed: May 24, 2004
    Publication date: November 4, 2004
    Applicant: APPLIED MATERIALS, INC.
    Inventors: David Alumot, Gad Neumann, Rivka Sherman, Ehud Tirosh
  • Optical inspection apparatus for defect detection
    Publication number: 20020039436
    Abstract: A method and apparatus for inspecting the surface of articles, such as chips and wafers, for defects, includes a first phase of optically examining the complete surface of the article inspected at a relatively high speed and with a relatively low spatial resolution, and a second phase of optically examining with a relatively high spatial resolution only the suspected locations for the presence or absence of a defect therein.
    Type: Application
    Filed: January 19, 2001
    Publication date: April 4, 2002
    Inventors: David Alumot, Gad Neumann, Rivka Sherman, Ehud Tirosh
  • Substrate inspection method and apparatus
    Patent number: 6178257
    Abstract: A method and apparatus for inspecting the surface of articles, such as chips and wafers, for defects, includes a first phase of optically examining the complete surface of the article inspected at a relatively high speed and with a relatively low spatial resolution, and a second phase of optically examining with a relatively high spatial resolution only the suspected locations for the presence or absence of a defect therein.
    Type: Grant
    Filed: April 23, 1999
    Date of Patent: January 23, 2001
    Assignee: Applied Materials, Inc.
    Inventors: David Alumot, Gad Neumann, Rivka Sherman, Ehud Tirosh
  • Optical inspection method and apparatus
    Patent number: 5982921
    Abstract: A method and apparatus for inspecting the surface of articles, such as chips and wafers, for defects, includes a first phase of optically examining the complete surface of the article inspected at a relatively high speed and with a relatively low spatial resolution, and a second phase of optically examining with a relatively high spatial resolution only the suspected locations for the presence or absence of a defect therein.
    Type: Grant
    Filed: December 3, 1997
    Date of Patent: November 9, 1999
    Assignee: Applied Materials, Inc.
    Inventors: David Alumot, Gad Neumann, Rivka Sherman, Ehud Tirosh
  • Parenteral delivery of MAO A inhibitors
    Patent number: 5792799
    Abstract: Methods of treating Parkinson's disease in a human by administering an effective amount of at least one monoamine oxidase (MAO) A inhibitor by a nasal, intrapulmonary or parenteral routes are disclosed. Reversible or irreversible MAO A inhibitors, or non-selective MAO inhibitors, can be used, and more than one MAO A inhibitor can be administered concurrently. The MAO A inhibitor can be administered in conjunction with other drugs, such as MAO B inhibitors.
    Type: Grant
    Filed: October 10, 1996
    Date of Patent: August 11, 1998
    Assignee: Athena Neurosciences, Inc.
    Inventor: Rivka Sherman-Gold
  • Two-phase optical inspection method and apparatus for defect detection
    Patent number: 5699447
    Abstract: A method and apparatus for inspecting the surface of articles, such as chips and wafers, for defects, includes a first phase of optically examining the complete surface of the article inspected by scanning its complete surface at a relatively high speed and with an optical beam of relatively small diameter, particularly a laser beam, and a second phase of optically examining with a relatively high spatial resolution only the suspected locations for the presence or absence of a defect therein.
    Type: Grant
    Filed: November 12, 1991
    Date of Patent: December 16, 1997
    Assignee: Orbot Instruments Ltd.
    Inventors: David Alumot, Gad Neumann, Rivka Sherman, Ehud Tirosh