Patents by Inventor Robbert Edgar Leeuwen

Robbert Edgar Leeuwen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20050007572
    Abstract: A lithographic apparatus in which alignment marks on the substrate are inspected during the exposure of the substrate to optimize the exposure conditions.
    Type: Application
    Filed: May 26, 2004
    Publication date: January 13, 2005
    Inventors: Richard George, Cheng-Qun Gui, Pieter Willem Jager, Robbert Edgar Leeuwen, Jacobus Burghoom