Patents by Inventor Robert A. Bunnell

Robert A. Bunnell has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Gasdynamically-controlled droplets as the target in a laser-plasma extreme ultraviolet light source
    Patent number: 6738452
    Abstract: A target material delivery system in the form of a nozzle (50) for an EUV radiation source (10). The nozzle (50) includes a target material supply line (66) having an orifice (68) through which droplets (76) of a liquid target material (64) are emitted, where the droplets (76) have a predetermined size, speed and spacing therebetween. The droplets (76) are mixed with a carrier gas (74) in a mixing chamber (54) enclosing the target material chamber (60) and the mixture of the droplets (76) and the carrier gas (74) enter a drift tube (56) from the mixing chamber (54). The droplets (76) are emitted into an accelerator chamber (124) from the drift tube (56) where the speed of the droplets (76) is increased to control the spacing therebetween. A vapor extractor (90) can be mounted to the accelerator chamber (124) or the drift tube (56) to remove the carrier gas (74) and target material vapor, which would otherwise adversely affect the EUV radiation generation.
    Type: Grant
    Filed: May 28, 2002
    Date of Patent: May 18, 2004
    Assignee: Northrop Grumman Corporation
    Inventors: Roy D. McGregor, Robert A. Bunnell, Michael B. Petach, Rocco A. Orsini
  • Gasdynamically-controlled droplets as the target in a laser-plasma extreme ultraviolet light source
    Publication number: 20030223546
    Abstract: A target material delivery system in the form of a nozzle (50) for an EUV radiation source (10). The nozzle (50) includes a target material supply line (66) having an orifice (68) through which droplets (76) of a liquid target material (64) are emitted, where the droplets (76) have a predetermined size, speed and spacing therebetween. The droplets (76) are mixed with a carrier gas (74) in a mixing chamber (54) enclosing the target material chamber (66) and the mixture of the droplets (76) and the carrier gas (74) enter a drift tube (56) from the mixing chamber (54). The droplets (76) are emitted into an accelerator chamber (124) from the drift tube (56) where the speed of the droplets (76) is increased to control the spacing therebetween. A vapor extractor (90) can be mounted to the accelerator chamber (124) or the drift tube (56) to remove the carrier gas (74) and target material vapor, which would otherwise adversely affect the EUV radiation generation.
    Type: Application
    Filed: May 28, 2002
    Publication date: December 4, 2003
    Inventors: Roy D. McGregor, Robert A. Bunnell, Michael B. Petach, Rocco A. Orsini