Abstract: A method of forming metallic patterns on a dielectric surface such as a radome surface that has a compound curve which includes the steps of coating the radome with a metal and then with a photoresist. An electrical pattern is formed on the photographic emulsion of a thin membrane that is used as a photo mask. A water soluble adhesive, which is non degradable to the exposure and development of the photoresist and the etching of the conductive surface is applied to the metallic surface and the photo mask is pressed into position on the adhesive to conform to the curvature of the radome. The photo mask is removed and the electrical pattern is provided on the surface by conventional developing and etching techniques to provide a clear, well defined pattern even in arrays wherein the pattern segments are of small dimension.