Abstract: As provided herein, a dual- or quad-ridged broadband horn antenna may include a pair of conductive antenna elements arranged opposite one another for guiding an electromagnetic wave in a longitudinal direction through the horn antenna. In some cases, the pair of conductive antenna elements may include substantially convex inner surfaces and appropriately shaped outer surfaces. The convex inner surfaces may generally function to direct or guide the radiated energy without disturbing the intended radiation pattern. To maintain the intended radiation pattern, the broadband horn antenna may also include a pair of tapered extension elements, each coupled to an outer surface of a different one of the antenna elements at one end thereof. In some cases, a magnetic material may be arranged upon at least a portion of the antenna elements to restrict surface currents to flowing along the inner surfaces only.

Abstract: A press includes an upper platen and a heated lower platen that are selectably movable toward and away from each other. A vessel inserted between an upper platen and a heated lower platen is conformally but nondeformingly secured therebetween so that vessel surfaces in conformal contact with the upper platen and the lower platen remain substantially undeformed while the vessel is filled with a pressurized insulating foam material. A portion of the vessel that is heated to at least a predetermined temperature by the heated lower platen promotes uniform expansion and curing of the injected foam within the vessel, and additionally promotes bonding between the injected foam and the heated portion of the vessel.

Abstract: An apparatus for supercritical processing of multiple workpieces comprises a transfer module, first and second supercritical processing modules, and a robot. The transfer module includes an entrance. The first and second supercritical processing modules are coupled to the transfer module. The robot is preferably located with the transfer module. In operation, the robot transfers a first workpiece from the entrance of the transfer module to the first supercritical processing module. The robot then transfers a second workpiece from the entrance to the second supercritical processing module. After the workpieces have been processed, the robot returns the first and second workpieces to the entrance of the transfer module. Alternatively, the apparatus includes additional supercritical processing modules coupled to the transfer module.

Abstract: An apparatus for supercritical processing and non-supercritical processing of a workpiece comprises a transfer module, a supercritical processing module, a non-supercritical processing module, and a robot. The transfer module includes an entrance. The supercritical processing module and the non-supercritical processing module are coupled to the transfer module. The robot is preferably located within the transfer module. In operation, the robot transfers a workpiece from the entrance of the transfer module to the supercritical processing module. After supercritical processing, the robot then transfers workpiece from the supercritical processing module to the non-supercritical processing module. After the non-supercritical processing, the robot returns the workpiece to the entrance of the transfer module. Alternatively, the non-supercritical processing is performed before the supercritical processing.

Abstract: A high pressure chamber comprises a chamber housing, a platen, and a mechanical drive mechanism. The chamber housing comprises a first sealing surface. The platen comprises a region for holding the semiconductor substrate and a second sealing surface. The mechanical drive mechanism couples the platen to the chamber housing. In operation, the mechanical drive mechanism separates the platen from the chamber housing for loading of the semiconductor substrate. In further operation, the mechanical drive mechanism causes the second sealing surface of the platen and the first sealing surface of the chamber housing to form a high pressure processing chamber around the semiconductor substrate.

Abstract: Copolymers containing residues of at least one olefinic monomer and a method of making such copolymers including the steps of: (a) providing a pressurized stirred tank; (b) feeding monomer compositions to one or more stirred tank reactors, where at least one monomer composition includes one or more monomers according to structure (I): where R1 is linear or branched C1 to C4 alkyl and R2 is selected from methyl, linear, cyclic or branched C1 to C20 alkyl, alkenyl, aryl, alkaryl and aralkyl; (c) feeding an initiator composition to the STR; (d) maintaining in the STR hydraulically full; (e) maintaining the monomer compositions in (b) and the initiator compositions in (c) in the STR for a residence time sufficient to effect conversion of the monomers to a copolymer composition; and (f) discharging the copolymer composition.

Abstract: An apparatus for supercritical processing of multiple workpieces comprises a transfer module, first and second supercritical processing modules, and a robot. The transfer module includes an entrance. The first and second supercritical processing modules are coupled to the transfer module. The robot is preferably located with the transfer module. In operation, the robot transfers a first workpiece from the entrance of the transfer module to the first supercritical processing module. The robot then transfers a second workpiece from the entrance to the second supercritical processing module. After the workpieces have been processed, the robot returns the first and second workpieces to the entrance of the transfer module. Alternatively, the apparatus includes additional supercritical processing modules coupled to the transfer module.

Abstract: An apparatus for supercritical processing of multiple workpieces comprises a transfer module, first and second supercritical processing modules, and a robot. The transfer module includes an entrance. The first and second supercritical processing modules are coupled to the transfer module. The robot is preferably located with the transfer module. In operation, the robot transfers a first workpiece from the entrance of the transfer module to the first supercritical processing module. The robot then transfers a second workpiece from the entrance to the second supercritical processing module. After the workpieces have been processed, the robot returns the first and second workpieces to the entrance of the transfer module. Alternatively, the apparatus includes additional supercritical processing modules coupled to the transfer module.

Abstract: An apparatus for supercritical processing and non-supercritical processing of a workpiece comprises a transfer module, a supercritical processing module, a non-supercritical processing module, and a robot. The transfer module includes an entrance. The supercritical processing module and the non-supercritical processing module are coupled to the transfer module. The robot is preferably located within the transfer module. In operation, the robot transfers a workpiece from the entrance of the transfer module to the supercritical processing module. After supercritical processing, the robot then transfers workpiece from the supercritical processing module to the non-supercritical processing module. After the non-supercritical processing, the robot returns the workpiece to the entrance of the transfer module. Alternatively, the non-supercritical processing is performed before the supercritical processing.

Abstract: An apparatus for supercritical processing and non-supercritical processing of a workpiece comprises a transfer module, a supercritical processing module, a non-supercritical processing module, and a robot. The transfer module includes an entrance. The supercritical processing module and the non-supercritical processing module are coupled to the transfer module. The robot is preferably located within the transfer module. In operation, the robot transfers a workpiece from the entrance of the transfer module to the supercritical processing module. After supercritical processing, the robot then transfers workpiece from the supercritical processing module to the non-supercritical processing module. After the non-supercritical processing, the robot returns the workpiece to the entrance of the transfer module. Alternatively, the non-supercritical processing is performed before the supercritical processing.

Abstract: A rotary seal assembly for a rotary kiln having a hood and a rotary drum with an opening formed between the drum and the hood, and an end. The rotary seal assembly includes a flexible framework arrangement that attaches to the end. The rotary seal assembly includes a riding surface that engages the drum as the drum rotates and connects with the framework arrangement in response to the movement of the drum as the drum rotates end. The rotary seal assembly includes a seal that is supported by the riding surface and is in essentially 360 degree contact with the drum when it is rotating and seals the opening between the drum when it is rotating in the hood to prevent fluid flow into and out of the end. A method for sealing an opening formed between a drum and a hood. The method includes the steps of attaching a flexible framework arrangement to the hood.

Abstract: An apparatus for supercritical processing of multiple workpieces comprises a transfer module, first and second supercritical processing modules, and a robot. The transfer module includes an entrance. The first and second supercritical processing modules are coupled to the transfer module. The robot is preferably located with the transfer module. In operation, the robot transfers a first workpiece from the entrance of the transfer module to the first supercritical processing module. The robot then transfers a second workpiece from the entrance to the second supercritical processing module. After the workpieces have been processed, the robot returns the first and second workpieces to the entrance of the transfer module. Alternatively, the apparatus includes additional supercritical processing modules coupled to the transfer module.

Abstract: An apparatus for supercritical processing of multiple workpieces comprises a transfer module, first and second supercritical processing modules, and a robot. The transfer module includes an entrance. The first and second supercritical processing modules are coupled to the transfer module. The robot is preferably located with the transfer module. In operation, the robot transfers a first workpiece from the entrance of the transfer module to the first supercritical processing module. The robot then transfers a second workpiece from the entrance to the second supercritical processing module. After the workpieces have been processed, the robot returns the first and second workpieces to the entrance of the transfer module. Alternatively, the apparatus includes additional supercritical processing modules coupled to the transfer module.

Abstract: A high pressure chamber comprises a chamber housing, a platen, and a mechanical drive mechanism. The chamber housing comprises a first sealing surface. The platen comprises a region for holding the semiconductor substrate and a second sealing surface. The mechanical drive mechanism couples the platen to the chamber housing. In operation, the mechanical drive mechanism separates the platen from the chamber housing for loading of the semiconductor substrate. In further operation, the mechanical drive mechanism causes the second sealing surface of the platen and the first sealing surface of the chamber housing to form a high pressure processing chamber around the semiconductor substrate.

Abstract: An end office of a telephone system in which the end office is operated based on a zero loss plan which requires that the line side equipment be exclusive of any means for introducing loss into the receive paths established in the line side equipment for the subscriber locations served by the end office switch.