Patents by Inventor Robert Adam Shick

Robert Adam Shick has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polycyclic resist compositions with increased etch resistance
    Patent number: 6451499
    Abstract: Polycyclic polymers containing pendant aromatic moieties are disclosed. The polymers exhibit light transparency properties to deep UV wave lengths making them useful for high resolution photolithographic applications. These polymers are particularly useful in chemically amplified positive and negative tone resists.
    Type: Grant
    Filed: June 27, 2000
    Date of Patent: September 17, 2002
    Assignees: The B.F. Goodrich Company, International Business Machines Corp.
    Inventors: Saikumar Jayaraman, Brian Leslie Goodall, Larry Funderburk Rhodes, Robert Adam Shick, Richard Vicari, Robert David Allen, Juliann Opitz, Ratnam Sooriyakumaran, Thomas Wallow
  • Polycyclic resist compositions with increased etch resistance
    Patent number: 6147177
    Abstract: Polycyclic polymers containing pendant aromatic moieties are disclosed. The polymers exhibit light transparency properties to deep UV wave lengths making them useful for high resolution photolithographic applications. These polymers are particularly useful in chemically amplified positive and negative tone resists.
    Type: Grant
    Filed: February 19, 1999
    Date of Patent: November 14, 2000
    Assignees: The B. F. Goodrich Company, International Business Machines Corporation
    Inventors: Saikumar Jayaraman, Brian Leslie Goodall, Larry Funderburk Rhodes, Robert Adam Shick, Richard Vicari, Robert David Allen, Juliann Opitz, Ratnam Sooriyakumaran, Thomas Wallow