Abstract: A process is disclosed for the application of a photosensitive liquid between the substrate and the photomask during contact printing. The substrate and photomask are aligned in a hinged relationship.

Abstract: Apparatus for registering and imagewise exposing to actinic radiation a sequence of similar sheet substrates employing liquid applicator means to allow a photomask to contact a photosensitive layer on the substrate through a liquid.

Abstract: Method for repetitive registering and imagewise exposing to actinic radiation a sheet substrate containing a photosensitive layer with use of a sequence of related photomasks. A liquid layer separates the photosensitive layer and each photomask during the exposure step.

Abstract: Method and apparatus for registering and imagewise exposing to actinic radiation a sequence of similar sheet substrates. A liquid layer separates the photosensitive layer and each photomask during the exposure step.

Abstract: Method for registering and imagewise exposing to actinic radiation a sequence of sheet substrates which are registerable to one another to produce a composite image.A liquid layer separates the photomask and photosensitive layer of the substrate during the exposure.

Abstract: An imaged element containing a polymeric relief or stencil image, in which the polymer contains crosslinkable moieties, is subjected to an image enlargement process by contacting the image with a solution containing a swelling agent for the image, and a crosslinking agent. The process is particularly useful in enlarging the half-tone image dot area of photopolymer litho masks wherein the half-tone image areas consist of hardened upper skins which rest on softer undervolumes having a lesser degree of polymerization or hardening.

Abstract: Process for modifying tacky surfaces, e.g., tacky layer on a photograph or other photochemically produced record, which comprises applying an admixture of particulate material and carrier particles and removing the excess particulate material and carrier particles. The ratio of average particle diameter of the carrier particles to average particle diameter of the particulate material is greater than 2 and the weight ratio of particulate material to carrier particles is less than 1. The degree of surface modification, e.g., light reflectivity, etc., can be controlled by the process.

Abstract: A process for forming a photoresist which comprises:(1) applying to a surface the surface of a solid unexposed photosensitive layer of thermoplastic photosoluble or photodesensitizable material, the other surface being adhered to a film support, then in either order(2) exposing the layer, and(3) stripping the support, and then(4) washing away the exposed areas of the layer.The surface bearing the resist can be etched, plated, or treated in other ways.