Patents by Inventor Robert B. Lynch
Robert B. Lynch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20150191616Abstract: Laser pyrolysis reactor designs and corresponding reactant inlet nozzles are described to provide desirable particle quenching that is particularly suitable for the synthesis of elemental silicon particles. In particular, the nozzles can have a design to encourage nucleation and quenching with inert gas based on a significant flow of inert gas surrounding the reactant precursor flow and with a large inert entrainment flow effectively surrounding the reactant precursor and quench gas flows. Improved silicon nanoparticle inks are described that has silicon nanoparticles without any surface modification with organic compounds. The silicon ink properties can be engineered for particular printing applications, such as inkjet printing, gravure printing or screen printing. Appropriate processing methods are described to provide flexibility for ink designs without surface modifying the silicon nanoparticles.Type: ApplicationFiled: March 20, 2015Publication date: July 9, 2015Inventors: Shivkumar Chiruvolu, Igor Altman, Bernard M. Frey, Weidong Li, Guojun Liu, Robert B. Lynch, Gina Elizabeth Pengra-Leung, Uma Srinivasan
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Patent number: 9006720Abstract: Laser pyrolysis reactor designs and corresponding reactant inlet nozzles are described to provide desirable particle quenching that is particularly suitable for the synthesis of elemental silicon particles. In particular, the nozzles can have a design to encourage nucleation and quenching with inert gas based on a significant flow of inert gas surrounding the reactant precursor flow and with a large inert entrainment flow effectively surrounding the reactant precursor and quench gas flows. Improved silicon nanoparticle inks are described that has silicon nanoparticles without any surface modification with organic compounds. The silicon ink properties can be engineered for particular printing applications, such as inkjet printing, gravure printing or screen printing. Appropriate processing methods are described to provide flexibility for ink designs without surface modifying the silicon nanoparticles.Type: GrantFiled: April 8, 2013Date of Patent: April 14, 2015Assignee: NanoGram CorporationInventors: Shivkumar Chiruvolu, Igor Altman, Bernard M. Frey, Weidong Li, Guojun Liu, Robert B. Lynch, Gina Elizabeth Pengra-Leung, Uma Srinivasan
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Patent number: 8895962Abstract: Laser pyrolysis reactor designs and corresponding reactant inlet nozzles are described to provide desirable particle quenching that is particularly suitable for the synthesis of elemental silicon particles. In particular, the nozzles can have a design to encourage nucleation and quenching with inert gas based on a significant flow of inert gas surrounding the reactant precursor flow and with a large inert entrainment flow effectively surrounding the reactant precursor and quench gas flows. Improved silicon nanoparticle inks are described that has silicon nanoparticles without any surface modification with organic compounds. The silicon ink properties can be engineered for particular printing applications, such as inkjet printing, gravure printing or screen printing. Appropriate processing methods are described to provide flexibility for ink designs without surface modifying the silicon nanoparticles.Type: GrantFiled: March 23, 2011Date of Patent: November 25, 2014Assignee: NanoGram CorporationInventors: Shivkumar Chiruvolu, Igor Altman, Bernard M. Frey, Weidong Li, Guojun Liu, Robert B. Lynch, Gina Elizabeth Pengra-Leung, Uma Srinivasan
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Publication number: 20120244060Abstract: Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.Type: ApplicationFiled: January 13, 2010Publication date: September 27, 2012Inventors: Xiangxin Bi, Nobuyuki Kambe, Craig R. Horne, James T. Gardner, Ronald J. Mosso, Shivkumar Chiruvolu, Sujeet Kumar, William E. McGovern, Pierre J. DeMascarel, Robert B. Lynch
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Publication number: 20120012032Abstract: Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.Type: ApplicationFiled: September 22, 2011Publication date: January 19, 2012Inventors: Xiangxin Bi, Nobuyuki Kambe, Craig R. Horne, James T. Gardner, Ronald J. Mosso, Shivkumar Chiruvolu, Sujeet Kumar, William E. McGovern, Pierre J. DeMascarel, Robert B. Lynch
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Publication number: 20110318905Abstract: Laser pyrolysis reactor designs and corresponding reactant inlet nozzles are described to provide desirable particle quenching that is particularly suitable for the synthesis of elemental silicon particles. In particular, the nozzles can have a design to encourage nucleation and quenching with inert gas based on a significant flow of inert gas surrounding the reactant precursor flow and with a large inert entrainment flow effectively surrounding the reactant precursor and quench gas flows. Improved silicon nanoparticle inks are described that has silicon nanoparticles without any surface modification with organic compounds. The silicon ink properties can be engineered for particular printing applications, such as inkjet printing, gravure printing or screen printing. Appropriate processing methods are described to provide flexibility for ink designs without surface modifying the silicon nanoparticles.Type: ApplicationFiled: March 23, 2011Publication date: December 29, 2011Inventors: Shivkumar Chiruvolu, Igor Altman, Bernard M. Frey, Weidong Li, Guojun Liu, Robert B. Lynch, Gina Elizabeth Pengra-Leung, Uma Srinivasan
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Publication number: 20100209328Abstract: Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.Type: ApplicationFiled: January 13, 2010Publication date: August 19, 2010Inventors: Xiangxin Bi, Nobuyuki Kambe, Craig R. Horne, James T. Gardner, Ronald J. Mosso, Shivkumar Chiruvolu, Sujeet Kumar, William E. McGovern, Pierre J. DeMascarel, Robert B. Lynch
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Publication number: 20100190288Abstract: Thin semiconductor foils can be formed using light reactive deposition. These foils can have an average thickness of less than 100 microns. In some embodiments, the semiconductor foils can have a large surface area, such as greater than about 900 square centimeters. The foil can be free standing or releasably held on one surface. The semiconductor foil can comprise elemental silicon, elemental germanium, silicon carbide, doped forms thereof, alloys thereof or mixtures thereof. The foils can be formed using a release layer that can release the foil after its deposition. The foils can be patterned, cut and processed in other ways for the formation of devices. Suitable devices that can be formed form the foils include, for example, photovoltaic modules and display control circuits.Type: ApplicationFiled: March 31, 2010Publication date: July 29, 2010Inventors: Henry Hieslmair, Ronald J. Mosso, Robert B. Lynch, Shivkumar Chiruvolu, William E. McGovern, Craig R. Horne, Narayan Solayappan, Ronald M. Cornell
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Patent number: 7521097Abstract: Light reactive deposition can be adapted effectively for the deposition of one or more electrochemical cell components. In particular, electrodes, electrolytes, electrical interconnects can be deposited form a reactive flow. In some embodiments, the reactive flow comprises a reactant stream that intersects a light beam to drive a reaction within a light reactive zone to produce product that is deposited on a substrate. The approach is extremely versatile for the production of a range of compositions that are useful in electrochemical cells and fuel cell, in particular. The properties of the materials, including the density and porosity can be adjusted based on the deposition properties and any subsequent processing including, for example, heat treatments.Type: GrantFiled: May 27, 2004Date of Patent: April 21, 2009Assignee: NanoGram CorporationInventors: Craig R. Horne, William E. McGovern, Robert B. Lynch, Ronald J. Mosso
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Publication number: 20090095128Abstract: Light-driven flow reactors are configured with an aerosol delivery apparatus that is designed to improve the reactive process with respect to forming uniform product compositions at higher rates. In particular, the reactant delivery system can deliver an aerosol having an average droplet size of no more than about 50 microns, and in some embodiments 20 microns, and with less than 1 droplet in 10,000 having a diameter greater than 5 times the average droplet size. In some embodiments, the edge of the aerosol generator can be placed within about 6 centimeters of the edge of the light beam passing through the reaction chamber. The average aerosol velocity can be no more than about 5 meters per second. In some embodiments, the aerosol generator can comprise a non-circular opening and a gas permeable structure that is used to generate a mist that is delivered from the apparatus as an aerosol.Type: ApplicationFiled: September 18, 2008Publication date: April 16, 2009Inventors: Bernard M. Frey, Peter R. Buerki, Robert B. Lynch, Janet L. Wang, Gabriel Tran, Craig R. Horne, Dean M. Holunga, Igor Altman
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Publication number: 20090075083Abstract: Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.Type: ApplicationFiled: May 13, 2008Publication date: March 19, 2009Inventors: Xiangxin Bi, Nobuyuki Kambe, Craig R. Horne, James T. Gardner, Ronald J. Mosso, Shivkumar Chiruvolu, Sujeet Kumar, William E. McGovern, Pierre J. DeMascarel, Robert B. Lynch
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Publication number: 20090020411Abstract: Laser pyrolysis apparatuses can provide for the engineering of product inorganic particles in-flight through the use of jet inlets that introduce a composition, such as an inert gas or a surface modifying composition, at high velocity. Under strong mixing conditions, the inorganic particle flow can be manipulated while also reducing particle agglomeration. These strong mixing apparatuses have been found to be effective at forming high quality crystals with structures that inherently grow relatively slowly through the slowing of the quenching process to maintain the crystal development until a desired high degree of crystallinity is achieved. Also, the surface chemistry of the particles can be manipulated in the flow to engineer desired inorganic particle surface chemistry.Type: ApplicationFiled: March 14, 2008Publication date: January 22, 2009Inventors: Dean M. Holunga, William E. McGovern, Robert B. Lynch
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Patent number: 7384680Abstract: Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.Type: GrantFiled: July 15, 2002Date of Patent: June 10, 2008Assignee: NanoGram CorporationInventors: Xiangxin Bi, Nobuyuki Kambe, Craig R. Horne, James T. Gardner, Ronald J. Mosso, Shivkumar Chiruvolu, Sujeet Kumar, William E. McGovern, Pierre J. DeMascarel, Robert B. Lynch
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Publication number: 20070212510Abstract: Thin semiconductor foils can be formed using light reactive deposition. These foils can have an average thickness of less than 100 microns. In some embodiments, the semiconductor foils can have a large surface area, such as greater than about 900 square centimeters. The foil can be free standing or releasably held on one surface. The semiconductor foil can comprise elemental silicon, elemental germanium, silicon carbide, doped forms thereof, alloys thereof or mixtures thereof. The foils can be formed using a release layer that can release the foil after its deposition. The foils can be patterned, cut and processed in other ways for the formation of devices. Suitable devices that can be formed form the foils include, for example, photovoltaic modules and display control circuits.Type: ApplicationFiled: March 13, 2007Publication date: September 13, 2007Inventors: Henry Hieslmair, Ronald J. Mosso, Robert B. Lynch, Shivkumar Chiruvolu, William E. McGovern, Craig R. Horne, Narayan Solayappan, Ronald M. Cornell
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Publication number: 20030203205Abstract: Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.Type: ApplicationFiled: July 15, 2002Publication date: October 30, 2003Inventors: Xiangxin Bi, Nobuyuki Kambe, Craig R. Horne, James T. Gardner, Ronald J. Mosso, Shivkumar Chiruvolu, Sujeet Kumar, William E. McGovern, Pierre J. DeMascarel, Robert B. Lynch