Patents by Inventor Robert B Moore
Robert B Moore has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240141492Abstract: Susceptor assemblies having a susceptor base with a plurality of pockets formed in a surface thereof are described. Each of the pockets has a pocket edge angle in the range of 30 to 75° and a pocket edge radius in the range of 0.40±0.05 mm to 1.20 mm±0.05 mm. The pockets have a raised central region and an outer region that is deeper than the raised central region, relative to the surface of the surface of the susceptor base.Type: ApplicationFiled: March 23, 2023Publication date: May 2, 2024Applicant: Applied Materials, Inc.Inventors: Prasanth Narayanan, Vijayabhaskara Venkatagiriyappa, Keiichi Tanaka, Ning Li, Robert B. Moore, Robert C. Linke, Mandyam Sriram, Mario D. Silvetti, Michael Racine, Tae Kwang Lee
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Patent number: 11899366Abstract: Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. A pedestal may be disposed within the processing volume and a first electrode may be coupled to the pedestal. A moveable stem may extend through the chamber body opposite the pedestal and a second electrode may be coupled to the moveable stem. In certain embodiments, a fluid containment ring may be coupled to the pedestal and a dielectric containment ring may be coupled to the second electrode.Type: GrantFiled: September 7, 2021Date of Patent: February 13, 2024Assignee: Applied Materials, Inc.Inventors: Viachslav Babayan, Douglas A. Buchberger, Jr., Qiwei Liang, Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff, Randy Harris, Robert B. Moore
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Patent number: 11840606Abstract: Described here are blocky PEEK copolymers and corresponding synthesis methods. It was surprisingly found that synthesis of blocky PEEK copolymers in a non-solvent environment with respect to PEEK produced blocky PEEK copolymers with high degrees of functionalization and crystallinity. The blocky PEEK copolymers had an increased blocky structure, relative to corresponding PEEK copolymer synthesized with other known methods. Moreover, membranes formed from the blocky PEEK polymers are particularly desirable in fuel cell applications. For example, the membranes formed from the blocky PEEK polymers had surprisingly large ion conductivities as well as significantly improved chemical and thermal resistance, at least in part, to the improved functionalization and crystallinity.Type: GrantFiled: December 15, 2021Date of Patent: December 12, 2023Assignees: SOLVAY SPECIALTY POLYMERS ITALY S.P.A., VIRGINIA TECH INTELLECTUAL PROPERTIES, INC.Inventors: Kelly D. Branham, David B. Roller, Stéphane Jeol, Marco Apostolo, Robert B. Moore, Lindsey Anderson, Samantha Talley, Xijing Yuan
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Patent number: 11776793Abstract: A plasma source assembly for use with a substrate processing chamber is described. The assembly includes a ceramic lower plate with a plurality of apertures formed therein. A method of processing a substrate in a substrate processing chamber including the plasma source assembly is also described.Type: GrantFiled: November 13, 2020Date of Patent: October 3, 2023Assignee: Applied Materials, Inc.Inventors: Robert B. Moore, Jared Ahmad Lee, Marc David Shull, Tsutomu Tanaka, Alexander V. Garachtchenko, Dmitry A. Dzilno
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Publication number: 20220157569Abstract: A plasma source assembly for use with a substrate processing chamber is described. The assembly includes a ceramic lower plate with a plurality of apertures formed therein. A method of processing a substrate in a substrate processing chamber including the plasma source assembly is also described.Type: ApplicationFiled: November 13, 2020Publication date: May 19, 2022Applicant: Applied Materials, Inc.Inventors: Robert B. Moore, Jared Ahmad Lee, Marc David Shull, Tsutomu Tanaka, Alexander V. Garachtchenko, Dmitry A. Dzilno
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Publication number: 20220127419Abstract: Described here are blocky PEEK copolymers and corresponding synthesis methods. It was surprisingly found that synthesis of blocky PEEK copolymers in a non-solvent environment with respect to PEEK produced blocky PEEK copolymers with high degrees of functionalization and crystallinity. The blocky PEEK copolymers had an increased blocky structure, relative to corresponding PEEK copolymer synthesized with other known methods. Moreover, membranes formed from the blocky PEEK polymers are particularly desirable in fuel cell applications. For example, the membranes formed from the blocky PEEK polymers had surprisingly large ion conductivities as well as significantly improved chemical and thermal resistance, at least in part, to the improved functionalization and crystallinity.Type: ApplicationFiled: December 15, 2021Publication date: April 28, 2022Applicants: SOLVAY SPECIALTY POLYMERS ITALY S.P.A., VIRGINIA TECH INTELLECTUAL PROPERTIES, INC.Inventors: Kelly D. Branham, David B. Roller, Stéphane Jeol, Marco Apostolo, Robert B. Moore, Lindsey Anderson, Samantha Talley, Xijing Yuan
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Publication number: 20220084796Abstract: A plasma source assembly for use with a substrate processing chamber is described. The assembly includes a spring which is disposed between electrodes and a dielectric ring.Type: ApplicationFiled: September 11, 2020Publication date: March 17, 2022Applicant: Applied Materials, Inc.Inventors: Quoc Truong, Dmitry A. Dzilno, Robert B. Moore
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Patent number: 11262662Abstract: Implementations described herein relate to a platform apparatus for post exposure processing. In one implementation, a platform apparatus includes a plumbing module and a process module. The process module further includes a central region having a robot disposed therein, and a plurality of process stations disposed about the central region and sharing the plumbing module. Each process station includes a process chamber and a post process chamber in a stacked arrangement. The process chamber includes a chamber body defining a process volume, a door coupled to the chamber body, a first electrode coupled to the door, and a power source communicatively coupled to the first electrode.Type: GrantFiled: October 2, 2020Date of Patent: March 1, 2022Assignee: Applied Materials, Inc.Inventors: Viachslav Babayan, Ludovic Godet, Kyle M. Hanson, Robert B. Moore
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Publication number: 20220004104Abstract: Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. A pedestal may be disposed within the processing volume and a first electrode may be coupled to the pedestal. A moveable stem may extend through the chamber body opposite the pedestal and a second electrode may be coupled to the moveable stem. In certain embodiments, a fluid containment ring may be coupled to the pedestal and a dielectric containment ring may be coupled to the second electrode.Type: ApplicationFiled: September 7, 2021Publication date: January 6, 2022Inventors: Viachslav BABAYAN, Douglas A. BUCHBERGER, JR., Qiwei LIANG, Ludovic GODET, Srinivas D. NEMANI, Daniel J. WOODRUFF, Randy HARRIS, Robert B. MOORE
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Patent number: 11112697Abstract: Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. A pedestal may be disposed within the processing volume and a first electrode may be coupled to the pedestal. A moveable stem may extend through the chamber body opposite the pedestal and a second electrode may be coupled to the moveable stem. In certain embodiments, a fluid containment ring may be coupled to the pedestal and a dielectric containment ring may be coupled to the second electrode.Type: GrantFiled: February 11, 2019Date of Patent: September 7, 2021Assignee: Applied Materials, Inc.Inventors: Viachslav Babayan, Douglas A. Buchberger, Jr., Qiwei Liang, Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff, Randy Harris, Robert B. Moore
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Publication number: 20210026257Abstract: Implementations described herein relate to apparatus for post exposure processing. More specifically, implementations described herein relate to field-guided post exposure process chambers and cool down/development chambers used on process platforms. In one implementation, a plurality of post exposure process chamber and cool/down development chamber pairs are positioned on a process platform in a stacked arrangement and utilize a shared plumbing module. In another implementation, a plurality of post exposure process chamber and cool down/development chambers are positioned on a process platform in a linear arrangement and each of the chambers utilize an individually dedicated plumbing module.Type: ApplicationFiled: October 2, 2020Publication date: January 28, 2021Inventors: Viachslav BABAYAN, Ludovic GODET, Kyle M. HANSON, Robert B. MOORE
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Patent number: 10845715Abstract: Implementations described herein relate to apparatus for post exposure processing. More specifically, implementations described herein relate to field-guided post exposure process chambers and cool down/development chambers used on process platforms. In one implementation, a plurality of post exposure process chamber and cool/down development chamber pairs are positioned on a process platform in a stacked arrangement and utilize a shared plumbing module. In another implementation, a plurality of post exposure process chamber and cool down/development chambers are positioned on a process platform in a linear arrangement and each of the chambers utilize an individually dedicated plumbing module.Type: GrantFiled: August 22, 2019Date of Patent: November 24, 2020Assignee: APPLIED MATERIALS, INC.Inventors: Viachslav Babayan, Ludovic Godet, Kyle M. Hanson, Robert B. Moore
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Patent number: 10837119Abstract: In a processing system for electroplating semiconductor wafers and similar substrates, the contact ring of the electroplating processor is removed from the rotor of the processor and replaced with a previously deplated contact ring. This allows the contact ring to be deplated in ring service module of the system, while the processor continues to operate. Wafer throughput is improved. The contact ring may be attached to a chuck for moving the contact ring between the processors and the ring service module, with the chuck quickly attachable and releasable to the rotor.Type: GrantFiled: June 20, 2018Date of Patent: November 17, 2020Assignee: APPLIED MATERIALS, INC.Inventors: Robert B. Moore, David Silvetti, Paul Wirth, Randy Harris, Daniel J. Woodruff, Gregory J. Wilson
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Patent number: 10766994Abstract: The present disclosure provides a method for reducing the aldehyde content in an amine catalyst by treating the amine catalyst with a treating agent selected from a non-cyclic amide substituted with an isocyanate reactive group, a guanidine substituted with an isocyanate reactive group, a polyether amine adducted with a urea compound or a guanidine compound, a free radical scavenger and a mixture thereof. The treated amine catalyst may then be used in the production of polyurethane materials which exhibit reduced aldehyde emissions.Type: GrantFiled: January 13, 2015Date of Patent: September 8, 2020Assignee: Huntsman Petrochemical LLCInventors: Ernest L. Rister, Jr., Haibo Zhao, Robert A. Grigsby, Jr., Robert B. Moore
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Publication number: 20190377272Abstract: Implementations described herein relate to apparatus for post exposure processing. More specifically, implementations described herein relate to field-guided post exposure process chambers and cool down/development chambers used on process platforms. In one implementation, a plurality of post exposure process chamber and cool/down development chamber pairs are positioned on a process platform in a stacked arrangement and utilize a shared plumbing module. In another implementation, a plurality of post exposure process chamber and cool down/development chambers are positioned on a process platform in a linear arrangement and each of the chambers utilize an individually dedicated plumbing module.Type: ApplicationFiled: August 22, 2019Publication date: December 12, 2019Inventors: Viachslav BABAYAN, Ludovic GODET, Kyle M. HANSON, Robert B. MOORE
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Patent number: 10474033Abstract: Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. A pedestal may be disposed within the processing volume and a first electrode may be coupled to the pedestal. A moveable stem may extend through the chamber body opposite the pedestal and a second electrode may be coupled to the moveable stem. In certain embodiments, a fluid containment ring may be coupled to the pedestal and a dielectric containment ring may be coupled to the second electrode.Type: GrantFiled: August 31, 2017Date of Patent: November 12, 2019Assignee: Applied Materials, Inc.Inventors: Viachslav Babayan, Douglas A. Buchberger, Jr., Qiwei Liang, Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff, Randy Harris, Robert B. Moore
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Publication number: 20190315919Abstract: Described here are blocky PEEK copolymers and corresponding synthesis methods. It was surprisingly found that synthesis of blocky PEEK copolymers in a non-solvent environment with respect to PEEK produced blocky PEEK copolymers with high degrees of functionalization and crystallinity. The blocky PEEK copolymers had an increased blocky structure, relative to corresponding PEEK copolymer synthesized with other known methods. Moreover, membranes formed from the blocky PEEK polymers are particularly desirable in fuel cell applications. For example, the membranes formed from the blocky PEEK polymers had surprisingly large ion conductivities as well as significantly improved chemical and thermal resistance, at least in part, to the improved functionalization and crystallinity.Type: ApplicationFiled: October 10, 2017Publication date: October 17, 2019Inventors: Kelly D. BRANHAM, David B. ROLLER, Stéphane JEOL, Marco APOSTOLO, Robert B. MOORE, Lindsey ANDERSON, Samantha TALLEY, Yuan XIJING
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Patent number: 10401742Abstract: Implementations described herein relate to apparatus for post exposure processing. More specifically, implementations described herein relate to field-guided post exposure process chambers and cool down/development chambers used on process platforms. In one implementation, a plurality of post exposure process chamber and cool/down development chamber pairs are positioned on a process platform in a stacked arrangement and utilize a shared plumbing module. In another implementation, a plurality of post exposure process chamber and cool down/development chambers are positioned on a process platform in a linear arrangement and each of the chambers utilize an individually dedicated plumbing module.Type: GrantFiled: April 6, 2018Date of Patent: September 3, 2019Assignee: APPLIED MATERIALS, INC.Inventors: Viachslav Babayan, Ludovic Godet, Kyle M. Hanson, Robert B. Moore
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Publication number: 20190187563Abstract: Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. A pedestal may be disposed within the processing volume and a first electrode may be coupled to the pedestal. A moveable stem may extend through the chamber body opposite the pedestal and a second electrode may be coupled to the moveable stem. In certain embodiments, a fluid containment ring may be coupled to the pedestal and a dielectric containment ring may be coupled to the second electrode.Type: ApplicationFiled: February 11, 2019Publication date: June 20, 2019Inventors: Viachslav BABAYAN, Douglas A. BUCHBERGER, JR., Qiwei LIANG, Ludovic GODET, Srinivas D. NEMANI, Daniel J. WOODRUFF, Randy HARRIS, Robert B. MOORE
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Patent number: 10203604Abstract: Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. A pedestal may be disposed within the processing volume and a first electrode may be coupled to the pedestal. A moveable stem may extend through the chamber body opposite the pedestal and a second electrode may be coupled to the moveable stem. In certain embodiments, a fluid containment ring may be coupled to the pedestal and a dielectric containment ring may be coupled to the second electrode.Type: GrantFiled: January 6, 2016Date of Patent: February 12, 2019Assignee: Applied Materials, Inc.Inventors: Viachslav Babayan, Douglas A. Buchberger, Jr., Qiwei Liang, Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff, Randy Harris, Robert B. Moore