Abstract: A decontamination device for a wafer container having a chamber for storing semiconductor wafers and inner surfaces surrounding such chamber is provided. The device includes a support/containment assembly for providing a substantially sealed containment compartment and a gas flow assembly, mounted on the support/containment means, for supplying and filtering a substantially continuous flow of circulation gas throughout the containment compartment. Additionally, the gas flow assembly periodically directs a flow of blow-off gas towards the inner surfaces of the wafer container whereby particles adhered to such surfaces will be released and entrained by the continuous flow of circulation gas. Manipulating assemblies, also mounted on the support/containment means manipulate the wafer container whereby such chamber is in communication with the containment compartment. The assemblies also position the gas flow assembly within the chamber of the container and in close proximity to its inner surfaces.