Patents by Inventor Robert Bergstedt

Robert Bergstedt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080165337
    Abstract: A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.
    Type: Application
    Filed: October 30, 2007
    Publication date: July 10, 2008
    Applicant: Cymer, Inc.
    Inventors: Alexander I. Ershov, William N. Partlo, Daniel J.W. Brown, Igor V. Fomenkov, Robert A. Bergstedt, Ivan Lalovic
  • Publication number: 20080151944
    Abstract: A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic.
    Type: Application
    Filed: February 28, 2008
    Publication date: June 26, 2008
    Applicant: Cymer, Inc.
    Inventors: J. Martin Algots, Robert A. Bergstedt, Walter D. Gillespie, Vladimir A. Kulgeyko, William N. Partlo, German E. Rylov, Richard L. Sandstrom, Brian Strate, Timothy S. Dyer
  • Publication number: 20080144671
    Abstract: A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.
    Type: Application
    Filed: October 30, 2007
    Publication date: June 19, 2008
    Applicant: Cymer, Inc.
    Inventors: Alexander I. Ershov, William N. Partlo, Daniel J.W. Brown, Igor V. Fomenkov, Robert A. Bergstedt
  • Patent number: 7366219
    Abstract: A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light pu
    Type: Grant
    Filed: November 30, 2004
    Date of Patent: April 29, 2008
    Assignee: Cymer, Inc.
    Inventors: J. Martin Algots, Robert A. Bergstedt, Walter D. Gillespie, Vladimir A. Kulgeyko, William N. Partlo, German E. Rylov, Richard L. Sandstrom, Brian Strate, Timothy S. Dyer
  • Publication number: 20070002919
    Abstract: A line narrowed gas discharge laser system and method of operating same is disclosed which may comprise a dispersive center wavelength selective element; a beam expander comprising a plurality of refractive elements; a refractive element positioning mechanism positioning at least one of the refractive elements to modify an angle of incidence of a laser light beam on the dispersive center wavelength selection element; each of the dispersive center wavelength selection element and the beam expander being aligned with each other and with a housing containing at least the dispersive center wavelength selection element; a housing positioning mechanism positioning the housing with respect to an optical axis of the gas discharge laser system. The dispersive element may comprise a grating and the beam expander may comprise a plurality of prisms. The housing may contain the dispersive center wavelength selective element and the beam expander. The housing positioning element may comprise a position locking mechanism.
    Type: Application
    Filed: June 30, 2005
    Publication date: January 4, 2007
    Applicant: Cymer, Inc.
    Inventors: Raymond Cybulski, Robert Bergstedt, William Partlo, Richard Sandstrom, Gon Wang
  • Publication number: 20070001127
    Abstract: In a first aspect, a lithography apparatus may comprise a mask designed using optical proximity correction (OPC), a pulsed laser source, and an active bandwidth control system configured to increase the bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is below a predetermined bandwidth range and increase a bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is above the predetermined bandwidth range. In another aspect an active bandwidth control system may include an optic for altering a wavefront of a laser beam in a laser cavity of the laser source to selectively adjust an output laser bandwidth in response to the control signal. In yet another aspect, the bandwidth of a laser having a wavelength variation across an aperture may be actively controlled by an aperture blocking element that is moveable to adjust a size of the aperture.
    Type: Application
    Filed: June 30, 2005
    Publication date: January 4, 2007
    Applicant: Cymer, Inc.
    Inventors: Daniel Reiley, German Rylov, Robert Bergstedt
  • Publication number: 20060114957
    Abstract: A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light pu
    Type: Application
    Filed: November 30, 2004
    Publication date: June 1, 2006
    Inventors: J. Martin Algots, Robert Bergstedt, Walter Gillespie, Vladimir Kulgeyko, William Partlo, German Rylov, Richard Sandstrom, Brian Strate, Timothy Dyer
  • Patent number: 6154259
    Abstract: A display system includes blue, green, and red laser light sources and light shaping devices which receive the laser light from the laser light sources and shapes the light into a number of approximately identical beamlets. The beamlets are modulated individually and the modulated beamlets are combined. The combining results in an output of beamlets, each of which comprises three input beamlets of each of the colors red, green, and blue. The resultant beamlets can then be scanned onto a display screen.
    Type: Grant
    Filed: November 26, 1997
    Date of Patent: November 28, 2000
    Assignee: Photera Technologies, Inc.
    Inventors: David E. Hargis, Charles G. Fink, Robert A. Bergstedt, Graham W. Flint