Abstract: A method for making an optical amplifier according to which a stack of the following layers is made by epitaxy: a first optical guiding layer; a first chemical attack barrier layer; a second optical guiding layer; a second chemical attack barrier layer; an active layer; a confinement layer; and a contact layer. Then at least one amplifier element followed by an optical guide located beneath this amplifier element are etched in these layers. The method can be applied to the making of optoelectronic devices such as modulators, change-over switches, distributors, etc.

Abstract: An opto-electronic device which monolithically integrates a laser emitter and an optical detector positioned in-line on a single waveguide, in which the laser emitter and detector operate at different wavelengths. Such an opto-electronic device may find particular application in various transmission or telecommunication systems.

Abstract: Disclosed is an optoelectronic device on a semi-insulator substrate, of the type comprising, stacked on one another, at least:- one substrate made of semi-insulator material,- one lower confinement layer with a first type of conductivity,- at least one active layer in strip form, and- an upper confinement layer with a second type of conductivity. In this device, the lower confinement layer covers one side of the semi-insulator substrate in passing beneath the active layer and coming to a stop substantially vertically to this active layer and the upper confinement layer covers the other side of the semi-insulator substrate in passing over the active layer and coming to a stop substantially vertically to this active layer. The disclosure can be applied notably to the fabrication of lasers.

Abstract: Disclosed is an optoelectronic device on a semi-insulator substrate, of the type comprising, stacked on one another, at least:one substrate made of semi-insulator material,one lower confinement layer with a first type of conductivity,at least one active layer in strip form, andan upper confinement layer with a second type of conductivity. In this device, the lower confinement layer covers one side of the semi-insulator substrate in passing beneath the active layer and coming to a stop substantially vertically to this active layer and the upper confinement layer covers the other side of the semi-insulator substrate in passing over the active layer and coming to a stop substantially vertically to this active layer. The disclosure can be applied notably to the fabrication of lasers.

Abstract: The method consists of the following successive steps: the deposition on a substrate, by epitaxy, of an optical confinement layer, formed by a first semiconducting material; the deposition, by epitaxy of an active layer, formed by a second semiconducting material; the deposition, by epitaxy, of a stop layer, formed by a third semiconducting material, with a thickness of between 0.005 and 0.02 microns; the deposition, by epitaxy, of a guide layer, formed by a fourth semiconducting material, with a thickness of between 0.01 and 0.

Abstract: A device for use as a laser includes a component (C) of semiconductor material formed on a substrate (1) having a different lattice parameter. The substrate (1) is covered with a silicon layer (2) which is in turn covered with a matching superlattice (3) on which the component (C) is formed. The device is more particularly applicable to a component formed on diamond.

Abstract: The invention concerns an optical guiding structure comprising, between two optical confinement layers, an optical guiding layer and an optical guiding element separated from each other by a layer for stopping chemical attack, to obtain by epitaxy methods and by chemical attack, a guiding element of which it is possible to precisely calibrate the thickness obtain surfaces of excellent quality and perform cutting out with sharpness, the invention being applicable to producing lasers and optical phase modulators.

Abstract: Disclosed is an optoelectronic device implanted on a silicon substrate and comprising, in particular, on this substrate, a set of matching layers on which there is made a first confinement layer based on indium phosphide, an active layer based on Ga.sub.x In.sub.1-x As.sub.1-y and a second active layer of indium phosphide.