Abstract: Disclosed are systems and methods for producing, and a composite including, a roasted aluminosilicate (e.g., halloysite). A uniform dispersion of an aluminosilicate can be obtained using roasted halloysite clay and subsequently combining it with a polymer in a melt mixing system to produce a composite.

Abstract: Disclosed are materials and processes for obtaining improved resistance to fire and flame for polymer composites, using a flame and fire retardant system comprising a tubular clay. Halloysite is an example of such a clay and it can be used either alone or in combination with other chemicals. The tubular clays are advantaged over common platy clays for this application in that they do not require large amounts of organic compatibilizers, which may degrade the properties of the composite or require tedious process steps. The tubular clay can function alone or synergistically with other flame retardants, particularly organic flame retardants.

Abstract: Disclosed herein is an aqueous dispersion and a method for making said dispersion, and more particularly, a dispersion that comprises a nanoclay such as a tubular clay (e.g. halloysite), a fluoropolymer and the requisite surfactants for dispersion stability. In various embodiments, and applications thereof to substrates and the like, the dispersion improves the manufacturability of articles that include coating fluoropolymer dispersions while retaining the unique properties of the fluoropolymer coating.

Abstract: Disclosed is a novel polymeric nanoparticle adhesive composite including a nanoparticle filler and method for the production thereof. More particularly, the disclosure describes the use of nanoparticle fillers, including a novel halloysite nanoparticle filler which utilizes generally cylindrical or tubular nanoparticles (e.g. rolled scroll-like shape). The filler is effectively employed in a polymer nanoparticle adhesive composite, containing the halloysite nanoparticle or other equivalent naturally occurring nanotubular filler, in which the advantages of the nanoparticle filler are provided (e.g., reinforcement, flame retardant, etc.) while maintaining or improving mechanical performance of the adhesive composite (e.g.

Abstract: The present invention relates to an antistatic article comprising a substrate or support having thereon at least one antistatic layer, wherein the antistatic layer comprises a conductive material having areas of patterned coverage.

Abstract: A thermal dye transfer assemblage comprising:(a) a dye-donor element comprising a support having thereon a dye layer comprising a dye dispersed in a polymeric binder, the dye being substituted with a reactive primary or secondary aliphatic amino group, and(b) a dye-receiving element comprising a support having thereon a dye image-receiving layer, the dye-receiving element being in a superposed relationship with the dye-donor element so that the dye layer is in contact with the dye image-receiving layer, the dye image-receiving layer comprising a polymer containing a pendant alkyl acrylamidoglycolate alkyl ether group.

Abstract: A dye-receiving element for thermal dye transfer includes a support having on one side thereof a dye image-receiving layer. Receiving elements of the invention are characterized in that the dye image-receiving layer or an overcoat layer thereon comprises a polyester comprising recurring dibasic acid derived units and diol derived units, at least 50 mole % of the dibasic acid derived units comprising dicarboxylic acid derived units containing an alicyclic ring within two carbon atoms of each carboxyl group of the corresponding dicarboxylic acid, and at least 30 mole % of the diol derived units containing an aromatic ring not immediately adjacent to each hydroxyl group of the corresponding diol or an alicyclic ring.

Abstract: A dye-receiving element for thermal dye transfer includes a support having on one side thereof a dye image-receiving layer. Receiving elements of the invention are characterized in that the dye image-receiving layer comprises a water dispersible polyester comprising recurring dibasic acid derived units and diol derived units, at least 50 mole % of the dibasic acid derived units comprising dicarboxylic acid derived units containing an alicyclic ring within two carbon atoms of each carboxyl group of the corresponding dicarboxylic acid, and at least 2.5 mole % of the dibasic acid derived units and diol derived units combined comprising ionic monomer derived units containing an ionic group.

Abstract: A dye-receiving element for thermal dye transfer includes a support having on one side thereof a dye image-receiving layer. Receiving elements of the invention are characterized in that the dye image-receiving layer comprises a miscible blend of an unmodified bisphenol-A polycarbonate having a number molecular weight of at least about 25,000 and a polyester comprising recurring dibasic acid derived units and diol derived units, at least 50 mole % of the dibasic acid derived units comprising dicarboxylic acid derived units containing an alicyclic ring within two carbon atoms of each carboxyl group of the corresponding dicarboxylic acid, and at least 30 mole % of the diol derived units containing an aromatic ring not immediately adjacent to each hydroxyl group of the corresponding diol or an alicyclic ring.

Abstract: A copolyester is synthesized by reacting a dialkyl ester of an aromatic dicarboxylic acid (e.g., dimethyl terephthalate) with ethylene glycol, low molecular weight poly(ethylene glycol) and a salt of a sulfonic acid-substituted aromatic dicarboxylate (e.g., sodium sulfoisophthalic acid) simultaneously in a first stage reaction in the presence of a phosphite or phosphate stabilizer. The intermediate product of the first stage is further reacted in a second stage in the presence of a polycondensation catalyst to obtain a random copolyester of the desired molecular weight. The copolyester is extruded to form a film which, after orientation and heat setting, has excellent clarity and is useful as a photographic film support. Aqueous processing of the film relaxes any core set or curl.

Abstract: A method for producing high resolution patterned resist images having excellent etch resistance and superior thermal and dimensional stability comprises the steps of:(a) forming a planarizing layer resistant to silicon uptake on a substrate;(b) providing a positive-working photoresist composition containing --OH or --NH-- groups over the planarizing layer,(c) imagewise exposing the resist to activating radiation,(d) developing the exposed resist,(e) contacting the developed resist with a vapor comprising a silicon-containing compound to effect silylation thereof and thereby impart etch resistance, the silicon-containing compound having the structural formula: ##STR1## wherein: X.sup.1 and X.sup.2 are individually chloro or ##STR2## wherein R.sup.3 and R.sup.4 are individually H or alkyl; andR.sup.1 and R.sup.2 are individually H or alkyl; and(f) contacting the planarizing layer with an oxygen-containing plasma so as to preferentially remove portions thereof.

Abstract: A color filter array is disclosed containing interlaid sets of laterally displaced filters comprised of a polymeric matrix and at least one dye. At least one of the sets of filters is comprised of an anionic dye and a cationic polymeric mordant having crosslinking repeating units containing two quaternary ammonium mordanting moieties and a photogenerated ethylenic crosslinking moiety.

Abstract: A photographically negative-working patternable mordant composition is disclosed containing a photocrosslinkable polymer comprised of, for providing both mordanting and crosslinking sites, repeating units of the formula: ##STR1## wherein Ar is an aromatic linking group,R is a methylene group,R.sup.1 is independently in each occurrence a lower alkyl group,R.sup.2 is a divalent linking group,X is a photocrosslinking group, andZ is a charge balancing counter ion.The mordant composition can be coated on a support to form a photographic element.

Abstract: Positive-working photoresist elements are protected against reflection of activating radiation from the substrate by incorporation of certain butadienyl dyes in a photoresist layer, an anti-reflective layer or a planarizing layer. These dyes have superior resistance to thermal degradation or volatilization at temperatures of as high as 200.degree. C. or more. The dyes also exhibit good solubility in solvents commonly employed in processing semiconductor devices, thus permitting the dyes to be incorporated in photoresist elements in an amount sufficient to prevent resist image distortion caused by backscattered or reflected light.

Abstract: There are disclosed polymers, E-beam sensitive elements and resists obtained therefrom, that are more sensitive than 5.times.10.sup.-7 coulombs per cm.sup.2 when exposed to a 15 keV electron beam. The polymers are copolymers of either allyl or propargyl methacrylate and of an acrylate or methacrylate bearing an oxygen-containing heterocyclic ring.

Abstract: There are disclosed light-sensitive compounds and a composition comprising (a) such compounds and (b) a compound having at least one reactive site capable of stepwise photoreaction with the light-sensitive compounds. The light-sensitive compounds have the structural formula, ##STR1## wherein Z.sup.1 and Z.sup.2 are each independently the number of non-metallic atoms necessary to complete 1, 2, 3, or 4 unsaturated carbocyclic or heterocyclic rings of from 6 to 18 nuclear atoms;Z.sup.3 is either a carbon-to-carbon bond or vinylene;and X is a linking group.The composition can be applied to a variety of supports and photoreacted by exposure to activating radiation.

Abstract: There are disclosed a resist composition and imaging method wherein the development rate of the composition is improved by using a polyhalogenated heterocyclic sensitivity-enhancing agent.

Abstract: There are disclosed light-sensitive compounds and a composition comprising (a) such compounds and (b) a compound having at least one reactive site capable of stepwise photo-reaction with the light-sensitive compounds. The light-sensitive compounds have the structural formula, ##STR1## wherein Z.sup.1 and Z.sup.2 are each independently the number of non-metallic atoms necessary to complete 1, 2, 3, or 4 unsaturated carbocyclic or heterocyclic rings of from 6 to 18 nuclear atoms;Z.sup.3 is either a carbon-to-carbon bond or vinylene;and X is a linking group.The composition can be applied to a variety of supports and photoreacted by exposure to activating radiation.

Abstract: A photocrosslinkable polymer and imaging element containing said polymer are described wherein acid resistance is achieved by vinyl ester recurring units. A process for etching an element so prepared features exposure, development, and etching in an acid bath.