Abstract: A high-velocity spray nozzle is used to physically embed conductive particles into the surface of a non-conductive substrate, thereby rendering it electrically conductive. In contrast to existing, chemically based alternatives, the method offers the use of a dry process with no chemical baths and associated environmental concerns; the ability to produce localized modifications, only in areas where actually required; the use of simple materials, such as air and powdered graphite; and a potential cost savings. Methods of modifying localized areas of the underlying substrate are also disclosed.

Abstract: A composite metallizing wire useful in thermal flame spraying, having a conductive metallic solid core wire strand and a coating consisting of solid lubricant particles (i.e., graphite, BN, Teflon) and wear-resistant particles (i.e., SiC, TiC, Cr.sub.3 C.sub.2) homogeneously suspended in a conductive metal (i.e., Ni, Fe, Cr, Mo, Ti) complementary to said solid core wire strand. The wire is used to produce a metal matrix composite coating, comprising providing a thermalizing through-flow chamber with an exit nozzle, the chamber having a gas flow-through of at least 100 ms.sup.-1, establishing a flame in said chamber, and feeding a composite coated wire into said flame to be melted and projected by the gas flow to a target, the wire being constructed as above.

Abstract: A thin film superconductor assembly is disclosed along with a method of fabricating same. The assembly comprises a self-supporting substrate defining at least a portion of a containment for a flow of cryogenic fluid, a dielectric layer adherent to a surface of the substrate, a thin film superconductor adherent to the dielectric layer and a moisture and oxygen impervious electrically insulating coating covering the thin film superconductor. A method of forming such thin film superconductor assembly, wherein the dielectric layer consists essentially of aluminum nitride, comprises growing the aluminum nitride dielectric layer integrally on the surface of the substrate.

Abstract: A thin film superconductor assembly is disclosed along with a method of fabricating same. The assembly comprises a self-supporting substrate defining at least a portion of a containment for a flow of cryogenic fluid, a dielectric layer adherent to a surface of the substrate, a thin film superconductor adherent to the dielectric layer and a moisture and oxygen impervious electrically insulating coating covering the thin film superconductor. A method of forming such thin film superconductor assembly, wherein the dielectric layer consists essentially of aluminum nitride, comprises growing the aluminum nitride dielectric layer integrally on the surface of the substrate.

Abstract: Method of toughening the structure of a diamond or diamond-like coated tool, by the steps of: (a) depositing, by low pressure CVD, a plurality of layers of separated diamond or diamond-like particles onto a nondiamond or nondiamond-like tool substrate (i.e., SiAlON, Si.sub.3 N.sub.4, SiC, Si, Ti, Co cemented WC, TiC, Ni-Mo cemented TiCN), the substrate being selected to facilitate diamond or diamond-like deposition and to retain its strength-related properties after such CVD; and (b) interposing a mechanically adherent, planarized binding material (i.e. transition metals, silicon, boron) between and on said layers of particles and across the separated particles of each particle layer, said binding material being substantially devoid of diamond graphitizing or dissolution agents. A barrier layer is deposited onto said tool substrate prior to step (a) to prevent the egress of chemicals capable of graphitizing diamond or diamond-like particles.

Abstract: Method of toughening the structure of a diamond or diamond-like coated tool, by the steps of: (a) depositing, by low pressure CVD, a plurality of layers of separated diamond or diamond-like particles onto a nondiamond or nondiamond-like tool substrate (i.e., SiAlON, Si.sub.3 N.sub.4, SiC, Si, Ti, Co cemented WC, TiC, Ni-Mo cemented TiCN), the substrate being selected to facilitate diamond or diamond-like deposition and to retain its strength-related properties after such CVD; and (b) interposing a mechanically adherent, planarized binding material (i.e. transition metals, silicon, boron) between and on said layers of particles and across the separated particles of each particle layer, said binding material being substantially devoid of diamond graphitizing or dissolution agents. A barrier layer is deposited onto said tool substrate prior to step (a) to prevent the egress of chemicals capable of graphitizing diamond or diamond-like particles.

Abstract: Method of making a composite coated article by the steps of: (a) initiating chemical vapor deposition of separated diamond or diamond-like particles onto a nondiamond or nondiamond-like substrate surface by use of low pressure metastable deposition of carbon in the presence of atomic hydrogen and at a temperature (i.e., 600.degree.-950.degree. C.) that favors the nucleation of such particles, the substrate being selected to retain its strength related properties after said chemical vapor deposition (ie., SiAlON, Si.sub.3 N.sub.4, SiC, Si, Ti, Co cemented WC, TiC, Ni-Mo cemented TiCN); (b) substantially suppressing nucleation of additional particles (heating to above about 1000.degree. C.) before formation of a contiguous film of said particles while permitting the existing particles to grow to a predetermined maximum crystal size consistent with separated crystals; and (c) depositing a mechanically tough, diamond and substrate-wetting metal binding material (i.e.