Abstract: Systems and methods for probing a Raman signature of a sample with a resolution exceeding the diffraction limit are described. These systems, called GASSE (Gain Saturated Stimulated Emission) and iGASSE (interferometric GASSE), are detecting a Raman signal produced in a sample located at the focal spot of a Gaussian pump pulse. Two additional pulsed laser beams (Stokes beams), a central Stokes beam having a Gaussian beam profile and another Stokes beam having an annular beam profile, are also focused to the focal spot. The spatial and temporal phases of the laser pulses are adjusted to produce destructive interference over most of the temporal width of Stokes pulses, which causes emission from the central Stokes beam to narrow well below the diffraction limit. A two-dimensional image of the sample is produced by scanning the combined beams across the sample. The system may find applications in biomedical and semiconductor technology.

Abstract: Systems and methods for hyper-resolution beyond the diffraction limit of optical microscopes for applications in spectroscopy, absorption and lithographic photochemical patterning are described. These systems are based on interference of a pump pulse and a Stokes laser pulse which interfere to localize the population of an excited vibrational state in an area that is smaller than the scanning resolution of the microscope. Another (interfering) Stokes pulse has an annular shape at focus and destructively interferes with the the Stokes laser pulse. This destructive interference causes narrowing of the population distribution of the vibrational excited state well below the diffraction limit, which in turn localizes the population of the central electronic excited state by a separate actinic laser pulse having a lower energy than the ground state excitation energy of the molecule. A stepped photolithography system uses two photomasks to produce photoresist images capable of printing features smaller than 10 nm.

Abstract: Systems and methods for hyper-resolution beyond the diffraction limit of optical microscopes for applications in spectroscopy, absorption and lithographic photochemical patterning are described. These systems are based on interference of a pump pulse and a Stokes laser pulse which interfere to localize the population of an excited vibrational state in an area that is smaller than the scanning resolution of the microscope. Another (interfering) Stokes pulse has an annular shape at focus and destructively interferes with the the Stokes laser pulse. This destructive interference causes narrowing of the population distribution of the vibrational excited state well below the diffraction limit, which in turn localizes the population of the central electronic excited state by a separate actinic laser pulse having a lower energy than the ground state excitation energy of the molecule. A stepped photolithography system uses two photomasks to produce photoresist images capable of printing features smaller than 10 nm.

Abstract: Systems and methods for probing a Raman signature of a sample with a resolution exceeding the diffraction limit are described. These systems, called GASSE (Gain Saturated Stimulated Emission) and iGASSE (interferometric GASSE), are detecting a Raman signal produced in a sample located at the focal spot of a Gaussian pump pulse. Two additional pulsed laser beams (Stokes beams), a central Stokes beam having a Gaussian beam profile and another Stokes beam having an annular beam profile, are also focused to the focal spot. The spatial and temporal phases of the laser pulses are adjusted to produce destructive interference over most of the temporal width of Stokes pulses, which causes emission from the central Stokes beam to narrow well below the diffraction limit. A two-dimensional image of the sample is produced by scanning the combined beams across the sample. The system may find applications in biomedical and semiconductor technology.

Abstract: A combinatorial chemistry bead that includes an electromagnetic spectral emitter that radiates a distinct electromagnetic code for each bead that uniquely identifies each bead, a terminal apparatus for receiving the electromagnetic code from each bead, and a method for performing combinatorial synthesis using a bead that transmits a distinct electromagnetic code. The invention includes a large number of spectrally narrowed light emitting mechanisms for generating distinct optical codes.

Abstract: A combinatorial chemistry bead that includes an electromagnetic spectral emitter that radiates a distinct electromagnetic code for each bead that uniquely identifies each bead, a terminal apparatus for receiving the electromagnetic code from each bead, and a method for performing combinatorial synthesis using a bead that transmits a distinct electromagnetic code. The invention includes a large number of spectrally narrowed light emitting mechanisms for generating distinct optical codes.

Abstract: Disclosed herein is an X-ray lithography system having a long life target. The life of the conventional target in X-ray generating systems for use in X-ray lithography systems is increased by providing means by which a single laser pulse can be provided to the same spot a plurality of times. In addition, new target designs are provided which are mechanically moved to allow laser pulses to be provided to adjacent points over a large surface area. One type of target is a cylindrical drum which is helically rotated to allow the laser pulse to intersect at all points along the helix of the drum. A second type of long life target is a long continuous strip in which a strip is moved from a feed reel to a take-up reel. The strip may be within a cassette.

Abstract: Described herein is an improved target for use in a pulsed induced plasma X-ray lithography system. The target is formed as a disk shaped base having a series of concentric grooves formed on the side thereof incident to the focused laser beam. A plurality of small holes are fabricated through the base to the facing wall of the groove against which the laser beam is focused and a film, of a polyimide or silicon nitride material, covers the hole. A thin layer of metal target material is then placed on the film aligned with each hole. The thickness of the metal is selected to be sufficient to allow the complete ablation of the material during the existence of the X-ray emitting plasma. In this manner, a minimal amount of debris, either in the form of molten droplets or evaporated metal material, will be generated.

Abstract: A step and repeat mechanism is used with an X-ray lithography system for moving a wafer to be exposed from position to position beneath the source of x-rays. The step and repeat mechanism includes, means for moving the wafer to be exposed with six degrees of freedom. Conventional drive motor means move the step and repeat mechanism, and wafer held thereby, in the X, Y and Z linear directions, as well as rotates, tip and tilt the wafer in the planar direction. In addition, the system includes, three fine Z motor assemblies for moving the wafer in fine increments in the Z direction, which motor assemblies are used to tip and tilt the plane of the wafer. Sensors are included for determining the plane of the mask and the plane of each of the various sections of wafer to be exposed, so that appropriate tip and tilt adjustments by the three fine Z motor assemblies can be made to cause the average plane of each section of the wafer to be exposed to be parallel to the plane of the mask.

Abstract: Described herein is an improved target for use in a pulsed induced plasma X-ray lithography system. The target is formed as a disk shaped base having a series of concentric grooves formed on the side thereof incident to the focused laser beam. A plurality of small holes are fabricated through the base to the facing wall of the groove against which the laser beam is focused and a film, of a polyimide or silicon nitride material, covers the hole. A thin layer of metal target material is then placed on the film aligned with each hole. The thickness of the metal is selected to be sufficient to allow the complete ablation of the material during the existence of the X-ray emitting plasma. In this manner, a minimal amount of debris, either in the form of molten droplets or evaporated metal material, will be generated.

Abstract: Described herein is an improved target for use in a pulsed induced plasma X-ray lithography system. The target is formed as a disk shaped base having a series of concentric grooves formed on the side thereof incident to the focused laser beam. A plurality of small holes are fabricated through the base to the facing wall of the groove against which the laser beam is focused and a film, of a polyimide or silicon nitride material, covers the hole. A thin layer of metal target material is then placed on the film aligned with each hole. The thickness of the metal is selected to be sufficient to allow the complete ablation of the material during the existence of the X-ray emitting plasma. In this manner, a minimal amount of debris, either in the form of molten droplets or evaporated metal material, will be generated.

Abstract: A device used to test the features of a mask used in a semiconductor lithographic machine. The device includes an array of charge couple devices and an array of pinholes positioned above the charge couple devices. The array of pinholes includes a small pinhole opening for each of the charge couple devices in that array and the size of each opening is dependent upon the resolution of the mask features desired to be inspected. The array of pinholes and the array of charge couple devices are moved in unison in discrete steps, related to the size of the pinhole openings, across an area of the mask related to the center to center spacing of the charge couple devices of the charge couple device array. By reading the data of each of the charge couple devices after each step, a comparison can be made against data previously obtained from a known good mask and a determination can be made whether the mask under test is acceptable or flawed.

Abstract: Disclosed herein is an X-ray lithography system having a long life target. The life of the conventional target in X-ray generating systems for use in X-ray lithography systems is increased by providing means by which a single laser pulse can be provided to the same spot a plurality of times. In addition, new target designs are provided which are mechanically moved to allow laser pulses to be provided to adjacent points over a large surface area. One type of target is a cylindrical drum which is helically rotated to allow the laser pulse to intersect at all points along the helix of the drum. A second type of long life target is a long continuous strip in which a strip is moved from a feed reel to a take-up reel. The strip may be within a cassette.